Daria Negri

Person

Nesher, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Scatterometry overlay metrology with orthogonal fine-pitch segmenta...
- Patent number 12,253,805
- Issue date Mar 18, 2025
- KLA Corporation
- Vladimir Levinski
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for measurement of misregistration and ameliora...
- Patent number 12,222,199
- Issue date Feb 11, 2025
- KLA Corporation
- Roie Volkovich
- G01 - MEASURING TESTING
Information Patent Grant
Systems and methods for correction of impact of wafer tilt on misre...
- Patent number 12,170,215
- Issue date Dec 17, 2024
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adaptive modeling misregistration measurement system and method
- Patent number 12,165,930
- Issue date Dec 10, 2024
- KLA Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for improved metrology for semiconductor device...
- Patent number 12,131,959
- Issue date Oct 29, 2024
- KLA Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Targets for diffraction-based overlay error metrology
- Patent number 12,105,414
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Annular apodizer for small target overlay measurement
- Patent number 12,105,431
- Issue date Oct 1, 2024
- KLA Corporation
- Itay Gdor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wavelet system and method for ameliorating misregistration and asym...
- Patent number 12,080,610
- Issue date Sep 3, 2024
- KLA Corporation
- Lilach Saltoun
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Imaging overlay with mutually coherent oblique illumination
- Patent number 12,032,300
- Issue date Jul 9, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 12,001,148
- Issue date Jun 4, 2024
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
Method of measuring misregistration in the manufacture of topograph...
- Patent number 11,880,141
- Issue date Jan 23, 2024
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
System and method for generating light
- Patent number 11,879,632
- Issue date Jan 23, 2024
- Technion Research & Development Foundation Limited
- Carmel Rotschild
- F21 - LIGHTING
Information Patent Grant
Systems and methods for metrology with layer-specific illumination...
- Patent number 11,852,590
- Issue date Dec 26, 2023
- KLA Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Scanning overlay metrology using overlay targets having multiple sp...
- Patent number 11,796,925
- Issue date Oct 24, 2023
- KLA Corporation
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Grant
Enhancing performance of overlay metrology
- Patent number 11,592,755
- Issue date Feb 28, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Grant
System and method for measuring misregistration of semiconductor de...
- Patent number 11,573,497
- Issue date Feb 7, 2023
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method of measuring misregistration in the manufacture of topograph...
- Patent number 11,281,112
- Issue date Mar 22, 2022
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Nano-structured non-polarizing beamsplitter
- Patent number 10,976,562
- Issue date Apr 13, 2021
- KLA Corporation
- Dmitry Gorelik
- G02 - OPTICS
Information Patent Grant
Process compatibility improvement by fill factor modulation
- Patent number 10,579,768
- Issue date Mar 3, 2020
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Systems and methods for metrology with layer-specific illumination...
- Patent number 10,444,161
- Issue date Oct 15, 2019
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology imaging targets having reflection-symmetric pairs of refl...
- Patent number 10,190,979
- Issue date Jan 29, 2019
- KLA-Tencor Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Spectral control system
- Patent number 9,921,050
- Issue date Mar 20, 2018
- KLA-Tencor Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Grant
Phase characterization of targets
- Patent number 9,581,430
- Issue date Feb 28, 2017
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Spectral control system
- Patent number 9,341,769
- Issue date May 17, 2016
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Optics symmetrization for metrology
- Patent number 9,164,397
- Issue date Oct 20, 2015
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods
- Patent number 9,080,971
- Issue date Jul 14, 2015
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Metrology systems and methods
- Patent number 8,873,054
- Issue date Oct 28, 2014
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Grant
Overlay metrology by pupil phase analysis
- Patent number 8,582,114
- Issue date Nov 12, 2013
- KLA-Tencor Corporation
- Amnon Manassen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology systems and methods
- Patent number 8,441,639
- Issue date May 14, 2013
- KLA-Tencor Corp.
- Daniel Kandel
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...
- Publication number 20240337952
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...
- Publication number 20240337953
- Publication date Oct 10, 2024
- KLA Corporation
- Itay Gdor
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES
- Publication number 20240337606
- Publication date Oct 10, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20240329543
- Publication date Oct 3, 2024
- KLA Corporation
- Andrew V. Hill
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR SUPPRESSION OF TOOL INDUCED SHIFT IN SCANNING...
- Publication number 20240167813
- Publication date May 23, 2024
- KLA Corporation
- Itay Gdor
- G01 - MEASURING TESTING
Information Patent Application
IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY
- Publication number 20240118606
- Publication date Apr 11, 2024
- KLA Corporation
- Itay GDOR
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY
- Publication number 20240068804
- Publication date Feb 29, 2024
- KLA Corporation
- Yuval Lubashevsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SCATTEROMETRY OVERLAY METROLOGY WITH ORTHOGONAL FINE-PITCH SEGMENTA...
- Publication number 20240053687
- Publication date Feb 15, 2024
- KLA Corporation
- Vladimir Levinski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20230400780
- Publication date Dec 14, 2023
- KLA Corporation
- Amnon Manassen
- H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information Patent Application
IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION
- Publication number 20230259040
- Publication date Aug 17, 2023
- Andrew V. Hill
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ANNULAR APODIZER FOR SMALL TARGET OVERLAY MEASUREMENT
- Publication number 20230236113
- Publication date Jul 27, 2023
- KLA Corporation
- Itay GDOR
- G01 - MEASURING TESTING
Information Patent Application
SCANNING OVERLAY METROLOGY USING OVERLAY TARGETS HAVING MULTIPLE SP...
- Publication number 20230213875
- Publication date Jul 6, 2023
- Yuval Lubashevsky
- G01 - MEASURING TESTING
Information Patent Application
SYSTEMS AND METHODS FOR CORRECTION OF IMPACT OF WAFER TILT ON MISRE...
- Publication number 20230197483
- Publication date Jun 22, 2023
- KLA Corporation
- Vladimir Levinski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADAPTIVE MODELING MISREGISTRATION MEASUREMENT SYSTEM AND METHOD
- Publication number 20220392809
- Publication date Dec 8, 2022
- KLA Corporation
- Amnon Manassen
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
SYSTEMS AND METHODS FOR IMPROVED METROLOGY FOR SEMICONDUCTOR DEVICE...
- Publication number 20220344218
- Publication date Oct 27, 2022
- KLA Corporation
- Liran Yerushalmi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENHANCING PERFORMANCE OF OVERLAY METROLOGY
- Publication number 20220317577
- Publication date Oct 6, 2022
- KLA Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
Systems and Methods for Measurement of Misregistration and Ameliora...
- Publication number 20220307824
- Publication date Sep 29, 2022
- KLA Corporation
- Roie Volkovich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF MEASURING MISREGISTRATION IN THE MANUFACTURE OF TOPOGRAPH...
- Publication number 20220171296
- Publication date Jun 2, 2022
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Wavelet System and Method for Ameliorating Misregistration and Asym...
- Publication number 20220020649
- Publication date Jan 20, 2022
- KLA Corporation
- Lilach Saltoun
- G01 - MEASURING TESTING
Information Patent Application
SYSTEM AND METHOD FOR GENERATING LIGHT
- Publication number 20210325019
- Publication date Oct 21, 2021
- Technion Research & Development Foundation Limited
- Carmel ROTSCHILD
- F21 - LIGHTING
Information Patent Application
METHOD OF MEASURING MISREGISTRATION IN THE MANUFACTURE OF TOPOGRAPH...
- Publication number 20210200104
- Publication date Jul 1, 2021
- KLA Corporation
- Daria Negri
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SYSTEM AND METHOD FOR MEASURING MISREGISTRATION OF SEMICONDUCTOR DE...
- Publication number 20210191279
- Publication date Jun 24, 2021
- KLA Corporation
- Daria Negri
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Nano-Structured Non-Polarizing Beamsplitter
- Publication number 20190107727
- Publication date Apr 11, 2019
- KLA-Tencor Corporation
- Dmitry Gorelik
- G02 - OPTICS
Information Patent Application
Systems and Methods for Metrology with Layer-Specific Illumination...
- Publication number 20180292326
- Publication date Oct 11, 2018
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Process Compatibility Improvement by Fill Factor Modulation
- Publication number 20180157784
- Publication date Jun 7, 2018
- KLA-Tencor Corporation
- Vladimir Levinski
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Spectral Control System
- Publication number 20160305766
- Publication date Oct 20, 2016
- KLA-Tencor Corporation
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
METROLOGY IMAGING TARGETS HAVING REFLECTION-SYMMETRIC PAIRS OF REFL...
- Publication number 20160084758
- Publication date Mar 24, 2016
- KLA-Tencor Corporation
- Amnon Manassen
- G01 - MEASURING TESTING
Information Patent Application
Metrology Systems and Methods
- Publication number 20150036142
- Publication date Feb 5, 2015
- KLA-Tencor Corporation
- Daniel Kandel
- G01 - MEASURING TESTING
Information Patent Application
Spectral Control System
- Publication number 20140168650
- Publication date Jun 19, 2014
- Amnon Manassen
- G02 - OPTICS
Information Patent Application
PHASE CHARACTERIZATION OF TARGETS
- Publication number 20140111791
- Publication date Apr 24, 2014
- Amnon Manassen
- G01 - MEASURING TESTING

Daria Negri

Person

Patents Grantslast 30 patents

Scatterometry overlay metrology with orthogonal fine-pitch segmenta...

Systems and methods for measurement of misregistration and ameliora...

Systems and methods for correction of impact of wafer tilt on misre...

Adaptive modeling misregistration measurement system and method

Systems and methods for improved metrology for semiconductor device...

Targets for diffraction-based overlay error metrology

Annular apodizer for small target overlay measurement

Wavelet system and method for ameliorating misregistration and asym...

Imaging overlay with mutually coherent oblique illumination

Enhancing performance of overlay metrology

Method of measuring misregistration in the manufacture of topograph...

System and method for generating light

Systems and methods for metrology with layer-specific illumination...

Scanning overlay metrology using overlay targets having multiple sp...

Enhancing performance of overlay metrology

System and method for measuring misregistration of semiconductor de...

Method of measuring misregistration in the manufacture of topograph...

Nano-structured non-polarizing beamsplitter

Process compatibility improvement by fill factor modulation

Systems and methods for metrology with layer-specific illumination...

Metrology imaging targets having reflection-symmetric pairs of refl...

Spectral control system

Phase characterization of targets

Spectral control system

Optics symmetrization for metrology

Metrology systems and methods

Metrology systems and methods

Overlay metrology by pupil phase analysis

Metrology systems and methods

Patents Applicationslast 30 patents

SYSTEM AND METHOD FOR DETERMINING OVERLAY MEASUREMENT OF A SCANNING...

SYSTEM AND METHOD FOR TRACKING REAL-TIME POSITION FOR SCANNING OVER...

PARALLEL SCANNING OVERLAY METROLOGY WITH OPTICAL META-SURFACES

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

SYSTEM AND METHOD FOR SUPPRESSION OF TOOL INDUCED SHIFT IN SCANNING...

IMPROVED TARGETS FOR DIFFRACTION-BASED OVERLAY ERROR METROLOGY

MULTI-PITCH GRID OVERLAY TARGET FOR SCANNING OVERLAY METROLOGY

SCATTEROMETRY OVERLAY METROLOGY WITH ORTHOGONAL FINE-PITCH SEGMENTA...

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

IMAGING OVERLAY WITH MUTUALLY COHERENT OBLIQUE ILLUMINATION

ANNULAR APODIZER FOR SMALL TARGET OVERLAY MEASUREMENT

SCANNING OVERLAY METROLOGY USING OVERLAY TARGETS HAVING MULTIPLE SP...

SYSTEMS AND METHODS FOR CORRECTION OF IMPACT OF WAFER TILT ON MISRE...

ADAPTIVE MODELING MISREGISTRATION MEASUREMENT SYSTEM AND METHOD

SYSTEMS AND METHODS FOR IMPROVED METROLOGY FOR SEMICONDUCTOR DEVICE...

ENHANCING PERFORMANCE OF OVERLAY METROLOGY

Systems and Methods for Measurement of Misregistration and Ameliora...

METHOD OF MEASURING MISREGISTRATION IN THE MANUFACTURE OF TOPOGRAPH...

Wavelet System and Method for Ameliorating Misregistration and Asym...

SYSTEM AND METHOD FOR GENERATING LIGHT

METHOD OF MEASURING MISREGISTRATION IN THE MANUFACTURE OF TOPOGRAPH...

SYSTEM AND METHOD FOR MEASURING MISREGISTRATION OF SEMICONDUCTOR DE...

Nano-Structured Non-Polarizing Beamsplitter

Systems and Methods for Metrology with Layer-Specific Illumination...

Process Compatibility Improvement by Fill Factor Modulation

Spectral Control System

METROLOGY IMAGING TARGETS HAVING REFLECTION-SYMMETRIC PAIRS OF REFL...

Metrology Systems and Methods

Spectral Control System

PHASE CHARACTERIZATION OF TARGETS