Darin Bivens

Person

San Mateo, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 8,568,553
- Issue date Oct 29, 2013
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for etching a transparent workpiece including backside endp...
- Patent number 8,012,366
- Issue date Sep 6, 2011
- Applied Materials, Inc.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mask etch plasma reactor with cathode providing a uniform distribut...
- Patent number 8,002,946
- Issue date Aug 23, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor for processing a workpiece and having a tunable cathode
- Patent number 7,967,930
- Issue date Jun 28, 2011
- Applied Materials, Inc.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask etching
- Patent number 7,964,818
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,943,005
- Issue date May 17, 2011
- Applied Materials, Inc.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for photomask plasma etching
- Patent number 7,909,961
- Issue date Mar 22, 2011
- Applied Materials, Inc.
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of processing a workpiece in a plasma reactor with dynamic a...
- Patent number 7,520,999
- Issue date Apr 21, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of processing a workpiece in a plasma reactor employing a dy...
- Patent number 7,504,041
- Issue date Mar 17, 2009
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with a dynamically adjustable plasma source power ap...
- Patent number 7,431,797
- Issue date Oct 7, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor with apparatus for dynamically adjusting the plasma...
- Patent number 7,419,551
- Issue date Sep 2, 2008
- Applied Materials, Inc.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
DC VOLTAGE CHARGING OF CATHODE FOR PLASMA STRIKING
- Publication number 20110236806
- Publication date Sep 29, 2011
- Applied Materials, Inc.
- ALAN HIROSHI OUYE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20110162797
- Publication date Jul 7, 2011
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...
- Publication number 20100276391
- Publication date Nov 4, 2010
- Applied Materials, Inc.
- MICHAEL N. GRIMBERGEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMAS...
- Publication number 20090325387
- Publication date Dec 31, 2009
- APPLIED MATERIALS, INC.
- Xiaoyi Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099431
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Ajay Kumar
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process for etching a transparent workpiece including backside endp...
- Publication number 20080099432
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Plasma reactor for processing a transparent workpiece with backside...
- Publication number 20080099437
- Publication date May 1, 2008
- Richard Lewington
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING
- Publication number 20080099426
- Publication date May 1, 2008
- Ajay Kumar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Mask etch plasma reactor with cathode providing a uniform distribut...
- Publication number 20080100222
- Publication date May 1, 2008
- APPLIED MATERIALS, INC.
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor for processing a workpiece and having a tunable cathode
- Publication number 20080100223
- Publication date May 1, 2008
- Richard Lewington
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PHOTOMASK ETCHING
- Publication number 20080101978
- Publication date May 1, 2008
- Elmira Ryabova
- C04 - CEMENTS CONCRETE ARTIFICIAL STONE CERAMICS REFRACTORIES
Information Patent Application
Plasma reactor with a dynamically adjustable plasma source power ap...
- Publication number 20070256787
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma reactor with apparatus for dynamically adjusting the plasma...
- Publication number 20070256784
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a workpiece in a plasma reactor with dynamic a...
- Publication number 20070257008
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of processing a workpiece in a plasma reactor employing a dy...
- Publication number 20070257009
- Publication date Nov 8, 2007
- APPLIED MATERIALS, INC.
- Madhavi R. Chandrachood
- H01 - BASIC ELECTRIC ELEMENTS

Darin Bivens

Person

Patents Grantslast 30 patents

Method and apparatus for photomask plasma etching

Process for etching a transparent workpiece including backside endp...

Mask etch plasma reactor with cathode providing a uniform distribut...

Plasma reactor for processing a workpiece and having a tunable cathode

Method and apparatus for photomask etching

Method and apparatus for photomask plasma etching

Method and apparatus for photomask plasma etching

Method of processing a workpiece in a plasma reactor with dynamic a...

Method of processing a workpiece in a plasma reactor employing a dy...

Plasma reactor with a dynamically adjustable plasma source power ap...

Plasma reactor with apparatus for dynamically adjusting the plasma...

Patents Applicationslast 30 patents

DC VOLTAGE CHARGING OF CATHODE FOR PLASMA STRIKING

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

INDUCTIVELY COUPLED PLASMA REACTOR HAVING RF PHASE CONTROL AND METH...

METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMAS...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Process for etching a transparent workpiece including backside endp...

Plasma reactor for processing a transparent workpiece with backside...

METHOD AND APPARATUS FOR PHOTOMASK PLASMA ETCHING

Mask etch plasma reactor with cathode providing a uniform distribut...

Plasma reactor for processing a workpiece and having a tunable cathode

METHOD AND APPARATUS FOR PHOTOMASK ETCHING

Plasma reactor with a dynamically adjustable plasma source power ap...

Plasma reactor with apparatus for dynamically adjusting the plasma...

Method of processing a workpiece in a plasma reactor with dynamic a...

Method of processing a workpiece in a plasma reactor employing a dy...