Dario L. Goldfarb

Person

Dobbs Ferry, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Litho-litho-etch (LLE) multi color resist
- Patent number 12,033,856
- Issue date Jul 9, 2024
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polymer brush adhesion promoter with UV cleavable linker
- Patent number 12,019,376
- Issue date Jun 25, 2024
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alternating copolymer chain scission photoresists
- Patent number 11,906,901
- Issue date Feb 20, 2024
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface treatment of titanium containing hardmasks
- Patent number 11,556,057
- Issue date Jan 17, 2023
- International Business Machines Corporation
- Ekmini A. De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Adhesion promoters
- Patent number 11,500,290
- Issue date Nov 15, 2022
- International Business Machines Corporation
- Dario Goldfarb
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Three-dimensional microelectronic package with embedded cooling cha...
- Patent number 11,462,512
- Issue date Oct 4, 2022
- International Business Machines Corporation
- Kamal K. Sikka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded hardmask interlayer for enhanced extreme ultraviolet perform...
- Patent number 11,367,617
- Issue date Jun 21, 2022
- International Business Machines Corporation
- Jennifer Church
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Metal brush layer for EUV patterning
- Patent number 11,307,496
- Issue date Apr 19, 2022
- International Business Machines Corporation
- Ekmini Anuja De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer brush adhesion promoter with UV cleavable linker
- Patent number 11,199,778
- Issue date Dec 14, 2021
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Patterning material film stack with metal-containing top coat for e...
- Patent number 11,177,130
- Issue date Nov 16, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor microcooler
- Patent number 11,056,418
- Issue date Jul 6, 2021
- International Business Machines Corporation
- Donald F. Canaperi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Semiconductor microcooler
- Patent number 11,049,789
- Issue date Jun 29, 2021
- International Business Machines Corporation
- Donald F. Canaperi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Patterning material film stack with metal-containing top coat for e...
- Patent number 11,037,786
- Issue date Jun 15, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Graded hardmask interlayer for enhanced extreme ultraviolet perform...
- Patent number 10,998,191
- Issue date May 4, 2021
- International Business Machines Corporation
- Jennifer Church
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,964,541
- Issue date Mar 30, 2021
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Three-dimensional microelectronic package with embedded cooling cha...
- Patent number 10,937,764
- Issue date Mar 2, 2021
- International Business Machines Corporation
- Kamal K. Sikka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Photoactive polymer brush materials and EUV patterning using the same
- Patent number 10,831,102
- Issue date Nov 10, 2020
- International Business Machines Corporation
- Ekmini A. De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Drying an extreme ultraviolet (EUV) pellicle
- Patent number 10,828,678
- Issue date Nov 10, 2020
- International Business Machines Corporation
- Dario L. Goldfarb
- B08 - CLEANING
Information Patent Grant
Embedded etch rate reference layer for enhanced etch time precision
- Patent number 10,748,823
- Issue date Aug 18, 2020
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase the lithographic process window of extreme ultra...
- Patent number 10,727,055
- Issue date Jul 28, 2020
- International Business Machines Corporation
- Nelson M. Felix
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface treatment of titanium containing hardmasks
- Patent number 10,678,135
- Issue date Jun 9, 2020
- International Business Machines Corporation
- Ekmini A. De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polymer brushes for extreme ultraviolet photolithography
- Patent number 10,656,523
- Issue date May 19, 2020
- International Business Machines Corporation
- Martin Glodde
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Drying an extreme ultraviolet (EUV) pellicle
- Patent number 10,569,307
- Issue date Feb 25, 2020
- International Business Machines Corporation
- Dario L. Goldfarb
- B08 - CLEANING
Information Patent Grant
Semiconductor microcooler
- Patent number 10,553,522
- Issue date Feb 4, 2020
- International Business Machines Corporation
- Donald F. Canaperi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Semiconductor microcooler
- Patent number 10,553,516
- Issue date Feb 4, 2020
- International Business Machines Corporation
- Donald F. Canaperi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to improve adhesion of photoresist on silicon substrate for...
- Patent number 10,553,432
- Issue date Feb 4, 2020
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper microcooler structure and fabrication
- Patent number 10,490,480
- Issue date Nov 26, 2019
- International Business Machines Corporation
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper microcooler structure and fabrication
- Patent number 10,490,481
- Issue date Nov 26, 2019
- International Business Machines Corporation
- Fee Li Lie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase the lithographic process window of extreme ultra...
- Patent number 10,388,521
- Issue date Aug 20, 2019
- International Business Machines Corporation
- Nelson M. Felix
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mechanical isolation control for an extreme ultraviolet (EUV) pellicle
- Patent number 10,386,716
- Issue date Aug 20, 2019
- International Business Machines Corporation
- Dario L. Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
METHOD OF MAKING EUV MASK WITH AN ABSORBER LAYER
- Publication number 20230280644
- Publication date Sep 7, 2023
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LITHO-LITHO-ETCH (LLE) MULTI COLOR RESIST
- Publication number 20230096374
- Publication date Mar 30, 2023
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ALTERNATING COPOLYMER CHAIN SCISSION PHOTORESISTS
- Publication number 20220390845
- Publication date Dec 8, 2022
- International Business Machines Corporation
- Dario Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER
- Publication number 20220043353
- Publication date Feb 10, 2022
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
RESIST UNDERLAYER SURFACE MODIFICATION
- Publication number 20220011670
- Publication date Jan 13, 2022
- International Business Machines Corporation
- Jing Guo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
GRADED HARDMASK INTERLAYER FOR ENHANCED EXTREME ULTRAVIOLET PERFORM...
- Publication number 20210202249
- Publication date Jul 1, 2021
- International Business Machines Corporation
- Jennifer Church
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METAL BRUSH LAYER FOR EUV PATTERNING
- Publication number 20210149298
- Publication date May 20, 2021
- International Business Machines Corporation
- Ekmini Anuja De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL MICROELECTRONIC PACKAGE WITH EMBEDDED COOLING CHA...
- Publication number 20210118854
- Publication date Apr 22, 2021
- International Business Machines Corporation
- Kamal K. Sikka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
THREE-DIMENSIONAL MICROELECTRONIC PACKAGE WITH EMBEDDED COOLING CHA...
- Publication number 20200294968
- Publication date Sep 17, 2020
- International Business Machines Corporation
- Kamal K. Sikka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER
- Publication number 20200292942
- Publication date Sep 17, 2020
- International Business Machines Corporation
- Jing Guo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Microcooler
- Publication number 20200161216
- Publication date May 21, 2020
- International Business Machines Corporation
- Donald F. Canaperi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
GRADED HARDMASK INTERLAYER FOR ENHANCED EXTREME ULTRAVIOLET PERFORM...
- Publication number 20200152460
- Publication date May 14, 2020
- International Business Machines Corporation
- Jennifer Church
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SPIN ON ADHESION PROMOTERS
- Publication number 20200150532
- Publication date May 14, 2020
- International Business Machines Corporation
- Dario GOLDFARB
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Microcooler
- Publication number 20200118904
- Publication date Apr 16, 2020
- International Business Machines Corporation
- Donald F. Canaperi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EMBEDDED ETCH RATE REFERENCE LAYER FOR ENHANCED ETCH TIME PRECISION
- Publication number 20200105628
- Publication date Apr 2, 2020
- International Business Machines Corporation
- Yann Mignot
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SURFACE TREATMENT OF TITANIUM CONTAINING HARDMASKS
- Publication number 20200105520
- Publication date Apr 2, 2020
- International Business Machines Corporation
- Ekmini A. De Silva
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20200090936
- Publication date Mar 19, 2020
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Semiconductor Microcooler
- Publication number 20200051886
- Publication date Feb 13, 2020
- Donald F. Canaperi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Microcooler
- Publication number 20200051896
- Publication date Feb 13, 2020
- International Business Machines Corporation
- Donald F. Canaperi
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
POLYMER BRUSHES FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY
- Publication number 20190285985
- Publication date Sep 19, 2019
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME
- Publication number 20190271913
- Publication date Sep 5, 2019
- International Business Machines Corporation
- Ekmini A. De Silva
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
PATTERNING MATERIAL FILM STACK WITH METAL-CONTAINING TOP COAT FOR E...
- Publication number 20190267234
- Publication date Aug 29, 2019
- International Business Machines Corporation
- Ekmini Anuja De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING MATERIAL FILM STACK WITH METAL-CONTAINING TOP COAT FOR E...
- Publication number 20190259601
- Publication date Aug 22, 2019
- International Business Machines Corporation
- Ekmini Anuja De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERNING MATERIAL FILM STACK WITH METAL-CONTAINING TOP COAT FOR E...
- Publication number 20190189428
- Publication date Jun 20, 2019
- International Business Machines Corporation
- Ekmini Anuja De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SURFACE TREATMENT OF TITANIUM CONTAINING HARDMASKS
- Publication number 20190189429
- Publication date Jun 20, 2019
- International Business Machines Corporation
- Ekmini A. De Silva
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
POLYMER BRUSHES FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY
- Publication number 20190064667
- Publication date Feb 28, 2019
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180337048
- Publication date Nov 22, 2018
- International Business Machines Corporation
- Martin Glodde
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...
- Publication number 20180233353
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Nelson M. Felix
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...
- Publication number 20180233362
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Martin Glodde
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...
- Publication number 20180233352
- Publication date Aug 16, 2018
- International Business Machines Corporation
- Nelson M. Felix
- H01 - BASIC ELECTRIC ELEMENTS

Dario L. Goldfarb

Person

Patents Grantslast 30 patents

Litho-litho-etch (LLE) multi color resist

Polymer brush adhesion promoter with UV cleavable linker

Alternating copolymer chain scission photoresists

Surface treatment of titanium containing hardmasks

Adhesion promoters

Three-dimensional microelectronic package with embedded cooling cha...

Graded hardmask interlayer for enhanced extreme ultraviolet perform...

Metal brush layer for EUV patterning

Polymer brush adhesion promoter with UV cleavable linker

Patterning material film stack with metal-containing top coat for e...

Semiconductor microcooler

Semiconductor microcooler

Patterning material film stack with metal-containing top coat for e...

Graded hardmask interlayer for enhanced extreme ultraviolet perform...

Method to improve adhesion of photoresist on silicon substrate for...

Three-dimensional microelectronic package with embedded cooling cha...

Photoactive polymer brush materials and EUV patterning using the same

Drying an extreme ultraviolet (EUV) pellicle

Embedded etch rate reference layer for enhanced etch time precision

Method to increase the lithographic process window of extreme ultra...

Surface treatment of titanium containing hardmasks

Polymer brushes for extreme ultraviolet photolithography

Drying an extreme ultraviolet (EUV) pellicle

Semiconductor microcooler

Semiconductor microcooler

Method to improve adhesion of photoresist on silicon substrate for...

Copper microcooler structure and fabrication

Copper microcooler structure and fabrication

Method to increase the lithographic process window of extreme ultra...

Mechanical isolation control for an extreme ultraviolet (EUV) pellicle

Patents Applicationslast 30 patents

METHOD OF MAKING EUV MASK WITH AN ABSORBER LAYER

LITHO-LITHO-ETCH (LLE) MULTI COLOR RESIST

ALTERNATING COPOLYMER CHAIN SCISSION PHOTORESISTS

POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER

RESIST UNDERLAYER SURFACE MODIFICATION

GRADED HARDMASK INTERLAYER FOR ENHANCED EXTREME ULTRAVIOLET PERFORM...

METAL BRUSH LAYER FOR EUV PATTERNING

THREE-DIMENSIONAL MICROELECTRONIC PACKAGE WITH EMBEDDED COOLING CHA...

THREE-DIMENSIONAL MICROELECTRONIC PACKAGE WITH EMBEDDED COOLING CHA...

POLYMER BRUSH ADHESION PROMOTER WITH UV CLEAVABLE LINKER

Semiconductor Microcooler

GRADED HARDMASK INTERLAYER FOR ENHANCED EXTREME ULTRAVIOLET PERFORM...

SPIN ON ADHESION PROMOTERS

Semiconductor Microcooler

EMBEDDED ETCH RATE REFERENCE LAYER FOR ENHANCED ETCH TIME PRECISION

SURFACE TREATMENT OF TITANIUM CONTAINING HARDMASKS

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

Semiconductor Microcooler

Semiconductor Microcooler

POLYMER BRUSHES FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY

PHOTOACTIVE POLYMER BRUSH MATERIALS AND EUV PATTERNING USING THE SAME

PATTERNING MATERIAL FILM STACK WITH METAL-CONTAINING TOP COAT FOR E...

PATTERNING MATERIAL FILM STACK WITH METAL-CONTAINING TOP COAT FOR E...

PATTERNING MATERIAL FILM STACK WITH METAL-CONTAINING TOP COAT FOR E...

SURFACE TREATMENT OF TITANIUM CONTAINING HARDMASKS

POLYMER BRUSHES FOR EXTREME ULTRAVIOLET PHOTOLITHOGRAPHY

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...

METHOD TO IMPROVE ADHESION OF PHOTORESIST ON SILICON SUBSTRATE FOR...

METHOD TO INCREASE THE LITHOGRAPHIC PROCESS WINDOW OF EXTREME ULTRA...