Daryl C. New

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Selective provision of a diblock copolymer material
- Patent number 7,625,694
- Issue date Dec 1, 2009
- Micron Technology, Inc.
- Eugene P. Marsh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching insulative materials, of forming electrical devi...
- Patent number 7,037,848
- Issue date May 2, 2006
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching insulative materials, of forming electrical devi...
- Patent number 6,753,262
- Issue date Jun 22, 2004
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structures formed using redeposition of an etchable l...
- Patent number 6,586,816
- Issue date Jul 1, 2003
- Micron Technology, Inc.
- Brent A. McClure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching insulative materials, of forming electrical devi...
- Patent number 6,528,429
- Issue date Mar 4, 2003
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of etching insulative materials, of forming electrical devi...
- Patent number 6,358,857
- Issue date Mar 19, 2002
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-patterned contact fill capacitor for dielectric etch protection
- Patent number 6,331,442
- Issue date Dec 18, 2001
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving alignment signal strength by reducing refractio...
- Patent number 6,297,124
- Issue date Oct 2, 2001
- Micron Technology, Inc.
- Daryl C. New
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Dielectric etch protection using a pre-patterned via-fill capacitor
- Patent number 6,133,108
- Issue date Oct 17, 2000
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving alignment signal strength by reducing refractio...
- Patent number 6,096,571
- Issue date Aug 1, 2000
- Micron Technology, Inc.
- Daryl C. New
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method of improving alignment signal strength by reducing refractio...
- Patent number 6,060,785
- Issue date May 9, 2000
- Micron Technology, Inc.
- Daryl C. New
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for forming a structure using redeposition of etchable layer
- Patent number 6,027,860
- Issue date Feb 22, 2000
- Micron Technology, Inc.
- Brent A. McClure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming capacitor while protecting dielectric from etchants
- Patent number 5,985,676
- Issue date Nov 16, 1999
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of improving alignment signal strength by reducing refractio...
- Patent number 5,933,743
- Issue date Aug 3, 1999
- Micron Technology, Inc.
- Daryl C. New
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for oxidation and crystallization of ferroelectric material
- Patent number 5,824,590
- Issue date Oct 20, 1998
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Pre-patterned contact fill capacitor for dielectric etch protection
- Patent number 5,801,916
- Issue date Sep 1, 1998
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for forming a structure using redeposition of etchable layer
- Patent number 5,792,593
- Issue date Aug 11, 1998
- Micron Technology, Inc.
- Brent A. McClure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interfacial etch of silica to improve adherence of noble metals
- Patent number 5,650,040
- Issue date Jul 22, 1997
- Micron Technology, Inc.
- Daryl Christopher New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Contact fill capacitor having a sidewall that connects the upper an...
- Patent number 5,631,804
- Issue date May 20, 1997
- Micron Technology, Inc.
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
Selective provision of a diblock copolymer material
- Publication number 20050250053
- Publication date Nov 10, 2005
- Eugene P. Marsh
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Methods of etching insulative materials, of forming electrical devi...
- Publication number 20040226912
- Publication date Nov 18, 2004
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching insulative materials, of forming electrical devi...
- Publication number 20030136665
- Publication date Jul 24, 2003
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURES FORMED USING REDEPOSITION OF AN ETCHABLE L...
- Publication number 20020130349
- Publication date Sep 19, 2002
- Brent A. McClure
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of etching insulative materials, of forming electrical devi...
- Publication number 20020025680
- Publication date Feb 28, 2002
- Daryl C. New
- H01 - BASIC ELECTRIC ELEMENTS

Daryl C. New

Person

Patents Grantslast 30 patents

Selective provision of a diblock copolymer material

Methods of etching insulative materials, of forming electrical devi...

Methods of etching insulative materials, of forming electrical devi...

Semiconductor structures formed using redeposition of an etchable l...

Methods of etching insulative materials, of forming electrical devi...

Methods of etching insulative materials, of forming electrical devi...

Pre-patterned contact fill capacitor for dielectric etch protection

Method of improving alignment signal strength by reducing refractio...

Dielectric etch protection using a pre-patterned via-fill capacitor

Method of improving alignment signal strength by reducing refractio...

Method of improving alignment signal strength by reducing refractio...

Method for forming a structure using redeposition of etchable layer

Method of forming capacitor while protecting dielectric from etchants

Method of improving alignment signal strength by reducing refractio...

Method for oxidation and crystallization of ferroelectric material

Pre-patterned contact fill capacitor for dielectric etch protection

Method for forming a structure using redeposition of etchable layer

Interfacial etch of silica to improve adherence of noble metals

Contact fill capacitor having a sidewall that connects the upper an...

Patents Applicationslast 30 patents

Selective provision of a diblock copolymer material

Methods of etching insulative materials, of forming electrical devi...

Methods of etching insulative materials, of forming electrical devi...

SEMICONDUCTOR STRUCTURES FORMED USING REDEPOSITION OF AN ETCHABLE L...

Methods of etching insulative materials, of forming electrical devi...