Dave HETZER

Person

Schenectady, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
High-precision dispense system with meniscus control
- Patent number 10,354,872
- Issue date Jul 16, 2019
- Tokyo Electron Limited
- Anton J. deVilliers
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
EUV resist sensitivity reduction
- Patent number 9,086,631
- Issue date Jul 21, 2015
- Tokyo Electron Limited
- Lior Huli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Track processing to remove organic films in directed self-assembly...
- Patent number 8,975,009
- Issue date Mar 10, 2015
- Tokyo Electron Limited
- Mark H. Somervell
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Double patterning with inline critical dimension slimming
- Patent number 8,940,475
- Issue date Jan 27, 2015
- Tokyo Electron Limited
- Shannon W. Dunn
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Sidewall image transfer pitch doubling and inline critical dimensio...
- Patent number 8,764,999
- Issue date Jul 1, 2014
- Tokyo Electron Limited
- Shannon W. Dunn
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Vapor treatment process for pattern smoothing and inline critical d...
- Patent number 8,647,817
- Issue date Feb 11, 2014
- Tokyo Electron Limited
- Shannon W. Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High normality solution for removing freeze material in lithographi...
- Patent number 8,389,206
- Issue date Mar 5, 2013
- Tokyo Electron Limited
- Shannon W. Dunn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID V...
- Publication number 20240421009
- Publication date Dec 19, 2024
- TOKYO ELECTRON LIMITED
- Michael Carcasi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High-Precision Dispense System With Meniscus Control
- Publication number 20180047563
- Publication date Feb 15, 2018
- TOKYO ELECTRON LIMITED
- Anton J. deVilliers
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
EUV RESIST SENSITIVITY REDUCTION
- Publication number 20140315135
- Publication date Oct 23, 2014
- LIOR HULI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
TRACK PROCESSING TO REMOVE ORGANIC FILMS IN DIRECTED SELF-ASSEMBLY...
- Publication number 20140273472
- Publication date Sep 18, 2014
- TOKYO ELECTRON LIMITED
- Mark H. Somervell
- B82 - NANO-TECHNOLOGY
Information Patent Application
VAPOR TREATMENT PROCESS FOR PATTERN SMOOTHING AND INLINE CRITICAL D...
- Publication number 20130171571
- Publication date Jul 4, 2013
- TOKYO ELECTRON LIMITED
- Shannon W. DUNN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SIDEWALL IMAGE TRANSFER PITCH DOUBLING AND INLINE CRITICAL DIMENSIO...
- Publication number 20120128935
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Shannon W. DUNN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DOUBLE PATTERNING WITH INLINE CRITICAL DIMENSION SLIMMING
- Publication number 20120128942
- Publication date May 24, 2012
- TOKYO ELECTRON LIMITED
- Shannon W. DUNN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High normality solution for removing freeze material in lithographi...
- Publication number 20110070545
- Publication date Mar 24, 2011
- TOKYO ELECTRON LIMITED
- Shannon W. DUNN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Dave HETZER

Person

Patents Grantslast 30 patents

High-precision dispense system with meniscus control

EUV resist sensitivity reduction

Track processing to remove organic films in directed self-assembly...

Double patterning with inline critical dimension slimming

Sidewall image transfer pitch doubling and inline critical dimensio...

Vapor treatment process for pattern smoothing and inline critical d...

High normality solution for removing freeze material in lithographi...

Patents Applicationslast 30 patents

SYSTEMS AND METHODS FOR DETERMINING A FLUID HEIGHT AND/OR A FLUID V...

High-Precision Dispense System With Meniscus Control

EUV RESIST SENSITIVITY REDUCTION

TRACK PROCESSING TO REMOVE ORGANIC FILMS IN DIRECTED SELF-ASSEMBLY...

VAPOR TREATMENT PROCESS FOR PATTERN SMOOTHING AND INLINE CRITICAL D...

SIDEWALL IMAGE TRANSFER PITCH DOUBLING AND INLINE CRITICAL DIMENSIO...

DOUBLE PATTERNING WITH INLINE CRITICAL DIMENSION SLIMMING

High normality solution for removing freeze material in lithographi...