Dave Jacob

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Plasma processing systems having multi-layer segmented electrodes a...
- Patent number 9,293,926
- Issue date Mar 22, 2016
- Lam Research Corporation
- Andreas Fischer
- B44 - DECORATIVE ARTS
Information Patent Grant
Showerhead electrode assembly for plasma processing apparatuses
- Patent number 8,080,107
- Issue date Dec 20, 2011
- Lam Research Corporation
- William S. Kennedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of making an electrode assembly for plasma processing apparatus
- Patent number 7,827,657
- Issue date Nov 9, 2010
- Lam Research Corporation
- William S. Kennedy
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Showerhead electrode assembly for plasma processing apparatuses
- Patent number 7,645,341
- Issue date Jan 12, 2010
- Lam Research Corporation
- William S. Kennedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Electrode assembly for plasma processing apparatus
- Patent number 7,543,547
- Issue date Jun 9, 2009
- Lam Research Corporation
- William S. Kennedy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods to minimize moisture condensation over a substrate in a rap...
- Patent number 6,750,155
- Issue date Jun 15, 2004
- Lam Research Corporation
- Harlan I. Halsey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Diffuser and rapid cycle chamber
- Patent number 6,663,025
- Issue date Dec 16, 2003
- Lam Research Corporation
- Harlan I. Halsey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus and method for creating an ultra-clean mini-environment t...
- Patent number 6,543,981
- Issue date Apr 8, 2003
- LAM Research Corp.
- Harlan I. Halsey
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer atmospheric transport module having a controlled mini-environ...
- Patent number 6,364,762
- Issue date Apr 2, 2002
- Lam Research Corporation
- Farro F. Kaveh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus method for determining the presence or absence of a wafer...
- Patent number 5,796,486
- Issue date Aug 18, 1998
- Lam Research Corporation
- David E. Jacob
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING SYSTEMS HAVING MULTI-LAYER SEGMENTED ELECTRODES A...
- Publication number 20140139049
- Publication date May 22, 2014
- LAM RESEARCH CORPORATION
- Andreas Fischer
- B44 - DECORATIVE ARTS
Information Patent Application
ELECTRODE ASSEMBLY FOR PLASMA PROCESSING APPARATUS
- Publication number 20090211085
- Publication date Aug 27, 2009
- LAM RESEARCH CORPORATION
- WILLIAM S. KENNEDY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Showerhead electrode assembly for plasma processing apparatuses
- Publication number 20050133160
- Publication date Jun 23, 2005
- William S. Kennedy
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rapid cycle chamber having a top vent with nitrogen purge
- Publication number 20040194268
- Publication date Oct 7, 2004
- Lam Research Corporation
- Harlan I. Halsey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Rapid cycle chamber having a top vent with nitrogen purge
- Publication number 20030172508
- Publication date Sep 18, 2003
- Lam Research Corporation
- Harlan I. Halsey
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Person

Patents Grantslast 30 patents

Plasma processing systems having multi-layer segmented electrodes a...

Showerhead electrode assembly for plasma processing apparatuses

Method of making an electrode assembly for plasma processing apparatus

Showerhead electrode assembly for plasma processing apparatuses

Electrode assembly for plasma processing apparatus

Methods to minimize moisture condensation over a substrate in a rap...

Diffuser and rapid cycle chamber

Apparatus and method for creating an ultra-clean mini-environment t...

Wafer atmospheric transport module having a controlled mini-environ...

Apparatus method for determining the presence or absence of a wafer...

Patents Applicationslast 30 patents

PLASMA PROCESSING SYSTEMS HAVING MULTI-LAYER SEGMENTED ELECTRODES A...

ELECTRODE ASSEMBLY FOR PLASMA PROCESSING APPARATUS

Showerhead electrode assembly for plasma processing apparatuses

Rapid cycle chamber having a top vent with nitrogen purge

Rapid cycle chamber having a top vent with nitrogen purge