Dave Trussell

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Wafer transport assembly with integrated buffers
- Patent number 11,764,086
- Issue date Sep 19, 2023
- Lam Research Corporation
- David Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer transport assembly with integrated buffers
- Patent number 11,393,705
- Issue date Jul 19, 2022
- Lam Research Corporation
- John E. Daugherty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Systems for removing and replacing consumable parts from a semicond...
- Patent number 11,112,773
- Issue date Sep 7, 2021
- Lam Research Corporation
- David D. Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active showerhead
- Patent number 10,804,079
- Issue date Oct 13, 2020
- Lam Research Corporation
- Mariusch Gregor
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer transport assembly with integrated buffers
- Patent number 10,790,174
- Issue date Sep 29, 2020
- Lam Research Corporation
- John Daugherty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Active showerhead
- Patent number 10,403,476
- Issue date Sep 3, 2019
- Lam Research Corporation
- Mariusch Gregor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Load lock interface and integrated post-processing module
- Patent number 10,304,707
- Issue date May 28, 2019
- Lam Research Corporation
- David Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer transport assembly with integrated buffers
- Patent number 10,014,196
- Issue date Jul 3, 2018
- Lam Research Corporation
- John Daugherty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Service tunnel for use on capital equipment in semiconductor manufa...
- Patent number 9,929,028
- Issue date Mar 27, 2018
- Lam Research Corporation
- David Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Service tunnel for use on capital equipment in semiconductor manufa...
- Patent number 9,502,275
- Issue date Nov 22, 2016
- Lam Research Corporation
- David Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling etch uniformity
- Patent number 8,674,255
- Issue date Mar 18, 2014
- Lam Research Corporation
- Eric Lenz
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Multi-part electrode for a semiconductor processing plasma reactor...
- Patent number 8,573,153
- Issue date Nov 5, 2013
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement rings having reduced polymer deposition characte...
- Patent number 8,500,952
- Issue date Aug 6, 2013
- Lam Research Corporation
- Rajinder Dhindsa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Apparatus and method for controlling plasma density profile
- Patent number 8,299,390
- Issue date Oct 30, 2012
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement rings having reduced polymer deposition characte...
- Patent number 8,262,922
- Issue date Sep 11, 2012
- Lam Research Corporation
- Rajinder Dhindsa
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Multi-part electrode for a semiconductor processing plasma reactor...
- Patent number 7,861,667
- Issue date Jan 4, 2011
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling plasma density profile
- Patent number 7,683,289
- Issue date Mar 23, 2010
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma confinement ring assemblies having reduced polymer depositio...
- Patent number 7,430,986
- Issue date Oct 7, 2008
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multiple frequency plasma processor method and apparatus
- Patent number 7,405,521
- Issue date Jul 29, 2008
- Lam Research Corporation
- Raj Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vacuum plasma processor including control in response to DC bias vo...
- Patent number 7,276,135
- Issue date Oct 2, 2007
- Lam Research Corporation
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processor with electrode responsive to multiple RF frequencies
- Patent number 7,169,256
- Issue date Jan 30, 2007
- Lam Research Corporation
- Raj Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing apparatus and method for confining an RF plasma u...
- Patent number 6,744,212
- Issue date Jun 1, 2004
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical vapor deposition system with a plasma chamber having separ...
- Patent number RE38097
- Issue date Apr 29, 2003
- Lam Research Corporation
- David Trussell
- 134 - Cleaning and liquid contact with solids
Information Patent Grant
Chemical vapor deposition system with a plasma chamber having separ...
- Patent number 5,988,187
- Issue date Nov 23, 1999
- Lam Research Corporation
- David Trussell
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of in-situ cleaning of a chuck within a plasma chamber
- Patent number 5,911,833
- Issue date Jun 15, 1999
- Lam Research Corporation
- Dean Denison
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
WAFER TRANSPORT ASSEMBLY WITH INTEGRATED BUFFERS
- Publication number 20220344183
- Publication date Oct 27, 2022
- LAM RESEARCH CORPORATION
- David TRUSSELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TRANSPORT ASSEMBLY WITH INTEGRATED BUFFERS
- Publication number 20210005485
- Publication date Jan 7, 2021
- LAM RESEARCH CORPORATION
- John E. Daugherty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE SHOWERHEAD
- Publication number 20190371573
- Publication date Dec 5, 2019
- LAM RESEARCH CORPORATION
- Mariusch Gregor
- G01 - MEASURING TESTING
Information Patent Application
Wafer Transport Assembly With Integrated Buffers
- Publication number 20180233387
- Publication date Aug 16, 2018
- LAM RESEARCH CORPORATION
- John DAUGHERTY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ACTIVE SHOWERHEAD
- Publication number 20180130640
- Publication date May 10, 2018
- LAM RESEARCH CORPORATION
- Mariusch Gregor
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Systems for Removing and Replacing Consumable Parts from a Semicond...
- Publication number 20180032062
- Publication date Feb 1, 2018
- LAM RESEARCH CORPORATION
- David D. Trussell
- G05 - CONTROLLING REGULATING
Information Patent Application
Systems for Removing and Replacing Consumable Parts from a Semicond...
- Publication number 20170115657
- Publication date Apr 27, 2017
- LAM RESEARCH CORPORATION
- David D. Trussell
- G05 - CONTROLLING REGULATING
Information Patent Application
SERVICE TUNNEL FOR USE ON CAPITAL EQUIPMENT IN SEMICONDUCTOR MANUFA...
- Publication number 20170110350
- Publication date Apr 20, 2017
- LAM RESEARCH CORPORATION
- David Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER TRANSPORT ASSEMBLY WITH INTEGRATED BUFFERS
- Publication number 20170110354
- Publication date Apr 20, 2017
- LAM RESEARCH CORPORATION
- John Daugherty
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOAD LOCK INTERFACE AND INTEGRATED POST-PROCESSING MODULE
- Publication number 20170110351
- Publication date Apr 20, 2017
- LAM RESEARCH CORPORATION
- David Trussell
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVABLE GAS NOZZLE IN DRYING MODULE
- Publication number 20160086864
- Publication date Mar 24, 2016
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA CONFINEMENT RINGS HAVING REDUCED POLYMER DEPOSITION CHARACTE...
- Publication number 20120325407
- Publication date Dec 27, 2012
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PART ELECTRODE FOR A SEMICONDUCTOR PROCESSING PLASMA REACTOR...
- Publication number 20110067814
- Publication date Mar 24, 2011
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method for Controlling Plasma Density Profile
- Publication number 20100126847
- Publication date May 27, 2010
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma confinement rings assemblies having reduced polymer depositi...
- Publication number 20080318433
- Publication date Dec 25, 2008
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and method for controlling plasma density profile
- Publication number 20070141729
- Publication date Jun 21, 2007
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vacuum plasma processor including control in response to DC bias vo...
- Publication number 20050264219
- Publication date Dec 1, 2005
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processor with electrode responsive to multiple RF frequencies
- Publication number 20050264218
- Publication date Dec 1, 2005
- LAM RESEARCH CORPORATION
- Rajinder Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multiple frequency plasma etch reactor
- Publication number 20050039682
- Publication date Feb 24, 2005
- Raj Dhindsa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-part electrode for a semiconductor processing plasma reactor...
- Publication number 20040074609
- Publication date Apr 22, 2004
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma processing apparatus and method for confining an RF plasma u...
- Publication number 20030151371
- Publication date Aug 14, 2003
- LAM RESEARCH CORPORATION
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS

Dave Trussell

Person

Patents Grantslast 30 patents

Wafer transport assembly with integrated buffers

Wafer transport assembly with integrated buffers

Systems for removing and replacing consumable parts from a semicond...

Active showerhead

Wafer transport assembly with integrated buffers

Active showerhead

Load lock interface and integrated post-processing module

Wafer transport assembly with integrated buffers

Service tunnel for use on capital equipment in semiconductor manufa...

Service tunnel for use on capital equipment in semiconductor manufa...

Apparatus and method for controlling etch uniformity

Multi-part electrode for a semiconductor processing plasma reactor...

Plasma confinement rings having reduced polymer deposition characte...

Apparatus and method for controlling plasma density profile

Plasma confinement rings having reduced polymer deposition characte...

Multi-part electrode for a semiconductor processing plasma reactor...

Apparatus and method for controlling plasma density profile

Plasma confinement ring assemblies having reduced polymer depositio...

Multiple frequency plasma processor method and apparatus

Vacuum plasma processor including control in response to DC bias vo...

Plasma processor with electrode responsive to multiple RF frequencies

Plasma processing apparatus and method for confining an RF plasma u...

Chemical vapor deposition system with a plasma chamber having separ...

Chemical vapor deposition system with a plasma chamber having separ...

Method of in-situ cleaning of a chuck within a plasma chamber

Patents Applicationslast 30 patents

WAFER TRANSPORT ASSEMBLY WITH INTEGRATED BUFFERS

WAFER TRANSPORT ASSEMBLY WITH INTEGRATED BUFFERS

ACTIVE SHOWERHEAD

Wafer Transport Assembly With Integrated Buffers

ACTIVE SHOWERHEAD

Systems for Removing and Replacing Consumable Parts from a Semicond...

Systems for Removing and Replacing Consumable Parts from a Semicond...

SERVICE TUNNEL FOR USE ON CAPITAL EQUIPMENT IN SEMICONDUCTOR MANUFA...

WAFER TRANSPORT ASSEMBLY WITH INTEGRATED BUFFERS

LOAD LOCK INTERFACE AND INTEGRATED POST-PROCESSING MODULE

MOVABLE GAS NOZZLE IN DRYING MODULE

PLASMA CONFINEMENT RINGS HAVING REDUCED POLYMER DEPOSITION CHARACTE...

MULTI-PART ELECTRODE FOR A SEMICONDUCTOR PROCESSING PLASMA REACTOR...

Apparatus and Method for Controlling Plasma Density Profile

Plasma confinement rings assemblies having reduced polymer depositi...

Apparatus and method for controlling plasma density profile

Vacuum plasma processor including control in response to DC bias vo...

Plasma processor with electrode responsive to multiple RF frequencies

Multiple frequency plasma etch reactor

Multi-part electrode for a semiconductor processing plasma reactor...

Plasma processing apparatus and method for confining an RF plasma u...