Dave Tuggle

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method for optimizing charged particle beams formed by shaped apert...
- Patent number 9,679,742
- Issue date Jun 13, 2017
- FEI Company
- Richard Swinford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,401,262
- Issue date Jul 26, 2016
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 9,029,812
- Issue date May 12, 2015
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Charged particle beam system aperture
- Patent number 8,907,296
- Issue date Dec 9, 2014
- FEI Company
- N. William Parker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
Retarding field analyzer integral with particle beam column
- Patent number 8,803,102
- Issue date Aug 12, 2014
- FEI Company
- David William Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,692,217
- Issue date Apr 8, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,405,054
- Issue date Mar 26, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wide aperature wien ExB mass filter
- Patent number 8,294,093
- Issue date Oct 23, 2012
- FEI Company
- David Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Aberration-corrected wien ExB mass filter with removal of neutrals...
- Patent number 8,283,629
- Issue date Oct 9, 2012
- FEI Company
- David Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-source plasma focused ion beam system
- Patent number 8,076,650
- Issue date Dec 13, 2011
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for synthesizing nanoscale structures in defined locations
- Patent number 7,226,663
- Issue date Jun 5, 2007
- State of Oregon Acting by and Through the State Board of Higher Education on...
- Jun Jiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
MEMS based charged particle deflector design
- Patent number 6,956,219
- Issue date Oct 18, 2005
- Zyvex Corporation
- Rahul Saini
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR OPTIMIZING CHARGED PARTICLE BEAMS FORMED BY SHAPED APERT...
- Publication number 20170125207
- Publication date May 4, 2017
- FEI Company
- Richard Swinford
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Source Plasma Focused Ion Beam System
- Publication number 20150318140
- Publication date Nov 5, 2015
- FEI Company
- Noel Smith
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20140312245
- Publication date Oct 23, 2014
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Retarding Field Analyzer Integral with Particle Beam Column
- Publication number 20140117233
- Publication date May 1, 2014
- FEI Company
- David William Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20130309421
- Publication date Nov 21, 2013
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Charged Particle Beam System Aperture
- Publication number 20130181140
- Publication date Jul 18, 2013
- FEI Company
- N. William Parker
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
WIDE APERATURE WIEN EXB MASS FILTER
- Publication number 20120261565
- Publication date Oct 18, 2012
- FEI Company
- David Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ABERRATION-CORRECTED WIEN EXB MASS FILTER WITH REMOVAL OF NEUTRALS...
- Publication number 20120261566
- Publication date Oct 18, 2012
- FEI Company
- David Tuggle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multi-Source Plasma Focused Ion Beam System
- Publication number 20120080407
- Publication date Apr 5, 2012
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Multibeam System
- Publication number 20110163068
- Publication date Jul 7, 2011
- Mark Utlaut
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM
- Publication number 20090309018
- Publication date Dec 17, 2009
- FEI Company
- Noel Smith
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for synthesizing nanoscale structures in defined locations
- Publication number 20080107892
- Publication date May 8, 2008
- State of Oregon acting by and through the Oregon State Board of Higher Educat...
- Jun Jiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for synthesizing nanoscale structures in defined locations
- Publication number 20050260453
- Publication date Nov 24, 2005
- Jun Jiao
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
MEMS BASED CHARGED PARTICLE DEFLECTOR DESIGN
- Publication number 20050199822
- Publication date Sep 15, 2005
- Zyvex Corporation
- Rahul Saini
- B82 - NANO-TECHNOLOGY

Dave Tuggle

Person

Patents Grantslast 30 patents

Method for optimizing charged particle beams formed by shaped apert...

Multi-source plasma focused ion beam system

Multi-source plasma focused ion beam system

Charged particle beam system aperture

Retarding field analyzer integral with particle beam column

Multi-source plasma focused ion beam system

Multi-source plasma focused ion beam system

Wide aperature wien ExB mass filter

Aberration-corrected wien ExB mass filter with removal of neutrals...

Multi-source plasma focused ion beam system

Method for synthesizing nanoscale structures in defined locations

MEMS based charged particle deflector design

Patents Applicationslast 30 patents

METHOD FOR OPTIMIZING CHARGED PARTICLE BEAMS FORMED BY SHAPED APERT...

Multi-Source Plasma Focused Ion Beam System

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

Retarding Field Analyzer Integral with Particle Beam Column

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

Charged Particle Beam System Aperture

WIDE APERATURE WIEN EXB MASS FILTER

ABERRATION-CORRECTED WIEN EXB MASS FILTER WITH REMOVAL OF NEUTRALS...

Multi-Source Plasma Focused Ion Beam System

Multibeam System

MULTI-SOURCE PLASMA FOCUSED ION BEAM SYSTEM

Method for synthesizing nanoscale structures in defined locations

Method for synthesizing nanoscale structures in defined locations

MEMS BASED CHARGED PARTICLE DEFLECTOR DESIGN