David Brzozowy

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Bristol, RI, US

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Patents Grantslast 30 patents

Information Patent Grant
Photoresist compositions
- Patent number 6,911,297
- Issue date Jun 28, 2005
- Arch Specialty Chemicals, Inc.
- David Brzozowy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
Device manufacturing process utilizing a double patterning process
- Publication number 20080199814
- Publication date Aug 21, 2008
- FUJIFILM ELECTRONIC MATERIALS, U.S.A., INC.
- Dave Brzozowy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist compositions
- Publication number 20040072095
- Publication date Apr 15, 2004
- Arch Speciality Chemical, Inc.
- David Brzozowy
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Novel beta-oxo compounds and their use in photoresist
- Publication number 20030078354
- Publication date Apr 24, 2003
- Arch Specialty Chemicals, Inc.
- Art Medina
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Free-acid containing polymers and their use in photoresists
- Publication number 20030064321
- Publication date Apr 3, 2003
- Arch Specialty Chemicals, Inc.
- Sanjay Malik
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY