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David C.S. Wu
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Chupei-City, TW
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last 30 patents
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Patent Grant
Scatterometry modeling in the presence of undesired diffraction orders
Patent number
11,422,095
Issue date
Aug 23, 2022
KLA Corporation
Phillip Atkins
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Patents Applications
last 30 patents
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Patent Application
Calibration Of Parametric Measurement Models Based On In-Line Wafer...
Publication number
20240102941
Publication date
Mar 28, 2024
KLA Corporation
Brian C. Lin
G01 - MEASURING TESTING
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Patent Application
Scatterometry Modeling in the Presence of Undesired Diffraction Orders
Publication number
20200232909
Publication date
Jul 23, 2020
KLA-Tencor Corporation
Phillip Atkins
G01 - MEASURING TESTING