David DECKERS

Person

Schilde, BE

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,940,740
- Issue date Mar 26, 2024
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,782,349
- Issue date Oct 10, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining corrections for lithographic apparatus
- Patent number 11,754,931
- Issue date Sep 12, 2023
- ASML Netherlands B.V.
- Roy Werkman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,592,753
- Issue date Feb 28, 2023
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 11,385,550
- Issue date Jul 12, 2022
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of determining corrections for a patterning process, device...
- Patent number 11,327,407
- Issue date May 10, 2022
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for controlling an industrial process using pr...
- Patent number 11,054,813
- Issue date Jul 6, 2021
- ASML Netherlands B.V.
- Alexander Ypma
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and system for increasing accuracy of pattern positioning
- Patent number 10,996,573
- Issue date May 4, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus to correct for patterning process error
- Patent number 10,915,689
- Issue date Feb 9, 2021
- ASML Netherlands B.V.
- Peter Ten Berge
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods of determining corrections for a patterning process
- Patent number 10,877,381
- Issue date Dec 29, 2020
- ASML Netherlands B.V.
- Weitian Kou
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and apparatus for obtaining diagnostic information relating...
- Patent number 10,642,162
- Issue date May 5, 2020
- ASML Netherlands B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method for transferring a mark pattern to a substrate, a calibratio...
- Patent number 10,191,390
- Issue date Jan 29, 2019
- ASML Netherlands B.V.
- Paul Cornelis Hubertus Aben
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Measuring method, apparatus and substrate
- Patent number 10,151,987
- Issue date Dec 11, 2018
- ASML Netherlands B.V.
- David Deckers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment measurement system, lithographic apparatus, and a method...
- Patent number 9,280,057
- Issue date Mar 8, 2016
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G01 - MEASURING TESTING
Information Patent Grant
Alignment measurement system, lithographic apparatus, and a method...
- Patent number 9,046,385
- Issue date Jun 2, 2015
- ASML Netherlands B.V.
- Franciscus Godefridus Casper Bijnen
- G01 - MEASURING TESTING
Information Patent Grant
Alignment mark, substrate, set of patterning devices, and device ma...
- Patent number 9,025,148
- Issue date May 5, 2015
- ASML Netherlands B.V.
- David Deckers
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Alignment mark deformation estimating method, substrate position pr...
- Patent number 8,982,347
- Issue date Mar 17, 2015
- ASML Netherlands B.V.
- Xiuhong Wei
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...
- Publication number 20240152059
- Publication date May 9, 2024
- ASML NETHERLANDS B.V.
- Dogacan KARA
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...
- Publication number 20240019788
- Publication date Jan 18, 2024
- ASML NETHERLANDS B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS
- Publication number 20230333485
- Publication date Oct 19, 2023
- ASML NETHERLANDS B.V.
- Wim Tjibbo TEL
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20230168591
- Publication date Jun 1, 2023
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...
- Publication number 20220326623
- Publication date Oct 13, 2022
- ASML NETHERLANDS B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD FOR DETERMINING CORRECTIONS FOR LITHOGRAPHIC APPARATUS
- Publication number 20220252988
- Publication date Aug 11, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20220229373
- Publication date Jul 21, 2022
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS
- Publication number 20220091514
- Publication date Mar 24, 2022
- ASML NETHERLANDS B.V.
- Roy WERKMAN
- G05 - CONTROLLING REGULATING
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...
- Publication number 20210080836
- Publication date Mar 18, 2021
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS & APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING T...
- Publication number 20200264520
- Publication date Aug 20, 2020
- ASML NETHERLANDS B.V.
- Alexander YPMA
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND SYSTEM FOR INCREASING ACCURACY OF PATTERN POSITIONING
- Publication number 20200124989
- Publication date Apr 23, 2020
- ASML NETHERLANDS B.V.
- Peter TEN BERGE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS
- Publication number 20200019067
- Publication date Jan 16, 2020
- ASML NETHERLANDS B.V.
- Weitian KOU
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...
- Publication number 20190278188
- Publication date Sep 12, 2019
- ASML NETHERLANDS B.V.
- Alexander Ypma
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
Alignment Measurement System, Lithographic Apparatus, and a Method...
- Publication number 20150261100
- Publication date Sep 17, 2015
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G01 - MEASURING TESTING
Information Patent Application
Alignment Mark Deformation Estimating Method, Substrate Position Pr...
- Publication number 20130141723
- Publication date Jun 6, 2013
- ASML Netherlands N.V.
- Xiuhong WEI
- G01 - MEASURING TESTING
Information Patent Application
MEASURING METHOD, APPARATUS AND SUBSTRATE
- Publication number 20120133938
- Publication date May 31, 2012
- ASML NETHERLANDS B.V.
- David DECKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Alignment Measurement System, Lithographic Apparatus, and a Method...
- Publication number 20120062863
- Publication date Mar 15, 2012
- ASML NETHERLANDS B.V.
- Franciscus Godefridus Casper BIJNEN
- G01 - MEASURING TESTING
Information Patent Application
Alignment Mark, Substrate, Set of Patterning Devices, and Device Ma...
- Publication number 20120057159
- Publication date Mar 8, 2012
- ASML NETHERLANDS B.V.
- David DECKERS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PRODUCTION OF AN ALIGNMENT MARK
- Publication number 20110273685
- Publication date Nov 10, 2011
- ASML NETHERLANDS B.V.
- Chung-Hsun LI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

David DECKERS

Person

Patents Grantslast 30 patents

Methods and apparatus for obtaining diagnostic information relating...

Methods of determining corrections for a patterning process, device...

Method for determining corrections for lithographic apparatus

Methods of determining corrections for a patterning process, device...

Methods and apparatus for obtaining diagnostic information relating...

Methods of determining corrections for a patterning process, device...

Method and apparatus for controlling an industrial process using pr...

Method and system for increasing accuracy of pattern positioning

Method and apparatus to correct for patterning process error

Methods of determining corrections for a patterning process

Methods and apparatus for obtaining diagnostic information relating...

Method for transferring a mark pattern to a substrate, a calibratio...

Measuring method, apparatus and substrate

Alignment measurement system, lithographic apparatus, and a method...

Alignment measurement system, lithographic apparatus, and a method...

Alignment mark, substrate, set of patterning devices, and device ma...

Alignment mark deformation estimating method, substrate position pr...

Patents Applicationslast 30 patents

A METHOD FOR MODELING MEASUREMENT DATA OVER A SUBSTRATE AREA AND AS...

METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...

TARGET STRUCTURE AND ASSOCIATED METHODS AND APPARATUS

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...

METHOD FOR DETERMINING CORRECTIONS FOR LITHOGRAPHIC APPARATUS

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHODS AND APPARATUS FOR CONTROLLING A LITHOGRAPHIC PROCESS

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS, DEVICE...

METHODS & APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING T...

METHOD AND SYSTEM FOR INCREASING ACCURACY OF PATTERN POSITIONING

METHODS OF DETERMINING CORRECTIONS FOR A PATTERNING PROCESS

METHODS AND APPARATUS FOR OBTAINING DIAGNOSTIC INFORMATION RELATING...

Alignment Measurement System, Lithographic Apparatus, and a Method...

Alignment Mark Deformation Estimating Method, Substrate Position Pr...

MEASURING METHOD, APPARATUS AND SUBSTRATE

Alignment Measurement System, Lithographic Apparatus, and a Method...

Alignment Mark, Substrate, Set of Patterning Devices, and Device Ma...

PRODUCTION OF AN ALIGNMENT MARK