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David J. Sturtevant

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  • Gresham, OR, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Method for optimizing wafer edge patterning
    • Patent number 8,685,633
    • Issue date Apr 1, 2014
    • LSI Corporation
    • Duane B. Barber
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Yield profile manipulator
    • Patent number 7,930,655
    • Issue date Apr 19, 2011
    • LSI Corporation
    • ChandraSekhar Desu
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Grant

    Mask set for variable mask field exposure
    • Patent number 7,638,245
    • Issue date Dec 29, 2009
    • LSI Corporation
    • David J. Sturtevant
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Yield profile manipulator
    • Patent number 7,395,522
    • Issue date Jul 1, 2008
    • LSI Corporation
    • ChandraSekhar Desu
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Grant

    Wafer edge structure measurement method
    • Patent number 7,312,880
    • Issue date Dec 25, 2007
    • LSI Corporation
    • Bruce Whitefield
    • G01 - MEASURING TESTING
  • Information Patent Grant

    Variable mask field exposure
    • Patent number 7,018,753
    • Issue date Mar 28, 2006
    • LSI Logic Corporation
    • David J. Sturtevant
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

  • Information Patent Application

    Variable Mask Field Exposure
    • Publication number 20080274417
    • Publication date Nov 6, 2008
    • LSI Corporation
    • David J. Sturtevant
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Yield Profile Manipulator
    • Publication number 20080216048
    • Publication date Sep 4, 2008
    • LSI Corporation
    • ChandraSekhar Desu
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Application

    MULTI-LAYER REGISTRATION AND DIMENSIONAL TEST MARK FOR SCATTEROMETR...
    • Publication number 20070246844
    • Publication date Oct 25, 2007
    • Phong Thanh Do
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Multi-layer registration and dimensional test mark for scatterometr...
    • Publication number 20060172447
    • Publication date Aug 3, 2006
    • LSI Logic Corporation
    • Phong Thanh Do
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Multi reticle exposures
    • Publication number 20060127823
    • Publication date Jun 15, 2006
    • LSI Logic Corporation
    • David J. Sturtevant
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Variable mask field exposure
    • Publication number 20060093965
    • Publication date May 4, 2006
    • LSI Logic Corporation
    • David J. Sturtevant
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Wafer edge structure measurement method
    • Publication number 20060044571
    • Publication date Mar 2, 2006
    • Bruce Whitefield
    • G01 - MEASURING TESTING
  • Information Patent Application

    Method for optimizing wafer edge patterning
    • Publication number 20060046213
    • Publication date Mar 2, 2006
    • Duane B. Barber
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Yield profile manipulator
    • Publication number 20050229144
    • Publication date Oct 13, 2005
    • Chandra Sekhar Desu
    • G06 - COMPUTING CALCULATING COUNTING
  • Information Patent Application

    Variable mask field exposure
    • Publication number 20040224236
    • Publication date Nov 11, 2004
    • David J. Sturtevant
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY