David K. Watts

Person

Austin, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
Method of chemical mechanical planarization using copper coordinati...
- Patent number 6,096,652
- Issue date Aug 1, 2000
- Motorola, Inc.
- David K. Watts
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of chemical mechanical planarization using a water rinse to...
- Patent number 6,071,816
- Issue date Jun 6, 2000
- Motorola, Inc.
- David K. Watts
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low selectivity chemical mechanical polishing (CMP) process for use...
- Patent number 6,045,435
- Issue date Apr 4, 2000
- Motorola, Inc.
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Chemical mechanical polishing (CMP) slurry for polishing copper int...
- Patent number 6,001,730
- Issue date Dec 14, 1999
- Motorola, Inc.
- Janos Farkas
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Method of making a semiconductor device using chemical-mechanical p...
- Patent number 5,985,748
- Issue date Nov 16, 1999
- Motorola, Inc.
- David K. Watts
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for forming a semiconductor device
- Patent number 5,935,871
- Issue date Aug 10, 1999
- Motorola, Inc.
- Janos Farkas
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical mechanical polishing (CMP) slurry for copper and method of...
- Patent number 5,897,375
- Issue date Apr 27, 1999
- Motorola, Inc.
- David Watts
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

David K. Watts

Person

Patents Grantslast 30 patents

Method of chemical mechanical planarization using copper coordinati...

Method of chemical mechanical planarization using a water rinse to...

Low selectivity chemical mechanical polishing (CMP) process for use...

Chemical mechanical polishing (CMP) slurry for polishing copper int...

Method of making a semiconductor device using chemical-mechanical p...

Process for forming a semiconductor device

Chemical mechanical polishing (CMP) slurry for copper and method of...