David Knapp

Person

Santa Clara, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Non-line-of-sight deposition of coating on internal components of a...
- Patent number 11,933,942
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Alexander Berger
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of depositing metal films using metal oxyhalide precursors
- Patent number 10,483,116
- Issue date Nov 19, 2019
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Precursors of manganese and manganese-based compounds for copper di...
- Patent number 10,283,352
- Issue date May 7, 2019
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods of depositing metal films using metal oxyhalide precursors
- Patent number 10,121,671
- Issue date Nov 6, 2018
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical modification of hardmask films for enhanced etching and se...
- Patent number 10,115,593
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- David Knapp
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Deposition of metal films using beta-hydrogen free precursors
- Patent number 9,982,345
- Issue date May 29, 2018
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Tungsten films by organometallic or silane pre-treatment of substrate
- Patent number 9,922,872
- Issue date Mar 20, 2018
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Precursors of manganese and manganese-based compounds for copper di...
- Patent number 9,916,975
- Issue date Mar 13, 2018
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemical modification of hardmask films for enhanced etching and se...
- Patent number 9,870,915
- Issue date Jan 16, 2018
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Selectively etching metals and metal nitrides conformally
- Patent number 9,449,843
- Issue date Sep 20, 2016
- Applied Materials, Inc.
- Mikhail Korolik
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for producing nickel-containing films
- Patent number 9,194,040
- Issue date Nov 24, 2015
- Applied Materials, Inc.
- David Knapp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal amide deposition precursors and their stabilization with an i...
- Patent number 9,196,474
- Issue date Nov 24, 2015
- Applied Materials, Inc.
- David Knapp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for depositing films comprising cobalt and cobalt nitrides
- Patent number 9,005,704
- Issue date Apr 14, 2015
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for producing nickel-containing films
- Patent number 8,859,045
- Issue date Oct 14, 2014
- Applied Materials, Inc.
- David Knapp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
NON-LINE-OF-SIGHT DEPOSITION OF COATING ON INTERNAL COMPONENTS OF A...
- Publication number 20240264336
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- Alexander Berger
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Application
ENHANCED ETCH SELECTIVITY USING HALIDES
- Publication number 20240266180
- Publication date Aug 8, 2024
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRY ETCHING WITH ETCH BYPRODUCT SELF-CLEANING
- Publication number 20240128091
- Publication date Apr 18, 2024
- Applied Materials, Inc.
- Zhonghua Yao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR PROCES...
- Publication number 20230287568
- Publication date Sep 14, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL PRESSURE OXIDATION METHOD FOR FORMING AN OXIDE LAYER IN A FEATURE
- Publication number 20230207291
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Christopher S. OLSEN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-LINE-OF-SIGHT DEPOSITION OF COATING ON INTERNAL COMPONENTS OF A...
- Publication number 20200310001
- Publication date Oct 1, 2020
- Applied Materials, Inc.
- Alexander BERGER
- G02 - OPTICS
Information Patent Application
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors
- Publication number 20190088489
- Publication date Mar 21, 2019
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Precursors Of Manganese And Manganese-Based Compounds For Copper Di...
- Publication number 20180204721
- Publication date Jul 19, 2018
- Applied Materials, Inc.
- Feng Q. Liu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHEMICAL MODIFICATION OF HARDMASK FILMS FOR ENHANCED ETCHING AND SE...
- Publication number 20180096834
- Publication date Apr 5, 2018
- Applied Materials, Inc.
- David KNAPP
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods of Depositing Metal Films Using Metal Oxyhalide Precursors
- Publication number 20170062224
- Publication date Mar 2, 2017
- Applied Materials, Inc.
- Xinyu Fu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Deposition of Metal Films Using Beta-Hydrogen Free Precursors
- Publication number 20170016113
- Publication date Jan 19, 2017
- Applied Materials, Inc.
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Tungsten Films by Organometallic or Silane Pre-Treatment of Substrate
- Publication number 20160336222
- Publication date Nov 17, 2016
- Applied Materials, Inc.
- David Knapp
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Precursors Of Manganese And Manganese-Based Compounds For Copper Di...
- Publication number 20160181150
- Publication date Jun 23, 2016
- Applied Materials, Inc.
- Feng Q. Liu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH THROUGH-PUT AND LOW TEMPERATURE ALD COPPER DEPOSITION AND INTE...
- Publication number 20160032455
- Publication date Feb 4, 2016
- Applied Materials, Inc.
- Feng Q. Liu
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Methods For Depositing Films Comprising Cobalt And Cobalt Nitrides
- Publication number 20140255606
- Publication date Sep 11, 2014
- David Thompson
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Metal Amide Deposition Precursors And Their Stabilization With An I...
- Publication number 20140242806
- Publication date Aug 28, 2014
- David Knapp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods for Producing Nickel-Containing Films
- Publication number 20140030436
- Publication date Jan 30, 2014
- Applied Materials, Inc.
- David Knapp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method For Producing Nickel-Containing Films
- Publication number 20140023785
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- David Knapp
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

David Knapp

Person

Patents Grantslast 30 patents

Non-line-of-sight deposition of coating on internal components of a...

Methods of depositing metal films using metal oxyhalide precursors

Precursors of manganese and manganese-based compounds for copper di...

Methods of depositing metal films using metal oxyhalide precursors

Chemical modification of hardmask films for enhanced etching and se...

Deposition of metal films using beta-hydrogen free precursors

Tungsten films by organometallic or silane pre-treatment of substrate

Precursors of manganese and manganese-based compounds for copper di...

Chemical modification of hardmask films for enhanced etching and se...

Selectively etching metals and metal nitrides conformally

Methods for producing nickel-containing films

Metal amide deposition precursors and their stabilization with an i...

Methods for depositing films comprising cobalt and cobalt nitrides

Method for producing nickel-containing films

Patents Applicationslast 30 patents

NON-LINE-OF-SIGHT DEPOSITION OF COATING ON INTERNAL COMPONENTS OF A...

ENHANCED ETCH SELECTIVITY USING HALIDES

DRY ETCHING WITH ETCH BYPRODUCT SELF-CLEANING

ADVANCED BARRIER NICKEL OXIDE (BNiO) COATING DEVELOPMENT FOR PROCES...

DUAL PRESSURE OXIDATION METHOD FOR FORMING AN OXIDE LAYER IN A FEATURE

NON-LINE-OF-SIGHT DEPOSITION OF COATING ON INTERNAL COMPONENTS OF A...

Methods of Depositing Metal Films Using Metal Oxyhalide Precursors

Precursors Of Manganese And Manganese-Based Compounds For Copper Di...

CHEMICAL MODIFICATION OF HARDMASK FILMS FOR ENHANCED ETCHING AND SE...

Methods of Depositing Metal Films Using Metal Oxyhalide Precursors

Deposition of Metal Films Using Beta-Hydrogen Free Precursors

Tungsten Films by Organometallic or Silane Pre-Treatment of Substrate

Precursors Of Manganese And Manganese-Based Compounds For Copper Di...

HIGH THROUGH-PUT AND LOW TEMPERATURE ALD COPPER DEPOSITION AND INTE...

Methods For Depositing Films Comprising Cobalt And Cobalt Nitrides

Metal Amide Deposition Precursors And Their Stabilization With An I...

Methods for Producing Nickel-Containing Films

Method For Producing Nickel-Containing Films