David Knick

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Methods for in-situ chamber clean in plasma etching processing chamber
- Patent number 10,115,572
- Issue date Oct 30, 2018
- Applied Materials, Inc.
- Banqiu Wu
- B08 - CLEANING

Patents Applicationslast 30 patents

Information Patent Application
METHODS FOR IN-SITU CHAMBER CLEAN IN PLASMA ETCHING PROCESSING CHAMBER
- Publication number 20170213709
- Publication date Jul 27, 2017
- Applied Materials, Inc.
- Banqiu WU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DC VOLTAGE CHARGING OF CATHODE FOR PLASMA STRIKING
- Publication number 20110236806
- Publication date Sep 29, 2011
- Applied Materials, Inc.
- ALAN HIROSHI OUYE
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHODS AND APPARATUS FOR IN-SITU CHAMBER DRY CLEAN DURING PHOTOMAS...
- Publication number 20090325387
- Publication date Dec 31, 2009
- APPLIED MATERIALS, INC.
- Xiaoyi Chen
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY