David R. Medeiros

Person

Stockbridge, MA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Organic graded spin on BARC compositions for high NA lithography
- Patent number 8,652,762
- Issue date Feb 18, 2014
- International Business Machines Corporation
- Dario L. Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low temperature melt-processing of organic-inorganic hybrid
- Patent number 8,574,953
- Issue date Nov 5, 2013
- International Business Machines Corporation
- Patrick W. DeHaven
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Antireflective hardmask composition and a method of preparing a pat...
- Patent number 8,323,871
- Issue date Dec 4, 2012
- International Business Machines Corporation
- Sean D. Burns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Organic graded spin on BARC compositions for high NA lithography
- Patent number 8,137,874
- Issue date Mar 20, 2012
- International Business Machines Corporation
- Dario L. Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low temperature melt-processing of organic-inorganic hybrid
- Patent number 8,123,997
- Issue date Feb 28, 2012
- International Business Machines Corporation
- Patrick W Dehaven
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Self-segregating multilayer imaging stack with built-in antireflect...
- Patent number 8,084,193
- Issue date Dec 27, 2011
- International Business Machines Corporation
- Joy Cheng
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Use of mixed bases to enhance patterned resist profiles on chrome o...
- Patent number 7,960,095
- Issue date Jun 14, 2011
- International Business Machines Corporation
- Wayne M. Moreau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bleachable materials for lithography
- Patent number 7,875,408
- Issue date Jan 25, 2011
- International Business Machines Corporation
- John A. Hoffnagle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
High performance CMOS devices comprising gapped dual stressors with...
- Patent number 7,847,357
- Issue date Dec 7, 2010
- International Business Machines Corporation
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,816,069
- Issue date Oct 19, 2010
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for tuning epitaxial growth by interfacial doping and struct...
- Patent number 7,790,593
- Issue date Sep 7, 2010
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,736,833
- Issue date Jun 15, 2010
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,709,177
- Issue date May 4, 2010
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective hardmask and uses thereof
- Patent number 7,648,820
- Issue date Jan 19, 2010
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultrathin polymeric photoacid generator layer and method of fabrica...
- Patent number 7,638,266
- Issue date Dec 29, 2009
- International Business Machines Corporation
- Marie Angelopoulos
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
High performance CMOS devices comprising gapped dual stressors with...
- Patent number 7,598,540
- Issue date Oct 6, 2009
- International Business Machines Corporation
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Graded spin-on organic antireflective coating for photolithography
- Patent number 7,588,879
- Issue date Sep 15, 2009
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Negative resists based on acid-catalyzed elimination of polar molec...
- Patent number 7,563,558
- Issue date Jul 21, 2009
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Topcoat material and use thereof in immersion lithography processes
- Patent number 7,521,172
- Issue date Apr 21, 2009
- International Business Machines Corporation
- Robert Allen David
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low temperature melt-processing of organic-inorganic hybrid
- Patent number 7,456,045
- Issue date Nov 25, 2008
- International Business Machines Corporation
- Patrick W Dehaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resists based on acid-catalyzed elimination of polar molec...
- Patent number 7,393,624
- Issue date Jul 1, 2008
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Multilayered resist systems using tuned polymer films as underlayer...
- Patent number 7,361,444
- Issue date Apr 22, 2008
- International Business Machines Corporation
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for tuning epitaxial growth by interfacial doping and struct...
- Patent number 7,329,596
- Issue date Feb 12, 2008
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High sensitivity resist compositions for electron-based lithography
- Patent number 7,314,700
- Issue date Jan 1, 2008
- International Business Machines Corporation
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for fabricating an ultralow dielectric constant material as...
- Patent number 7,312,524
- Issue date Dec 25, 2007
- International Business Machines Corporation
- Stephen M. Gates
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Negative resists based on a acid-catalyzed elimination of polar mol...
- Patent number 7,300,739
- Issue date Nov 27, 2007
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Advanced chemically amplified resist for sub 30 nm dense feature re...
- Patent number 7,300,741
- Issue date Nov 27, 2007
- International Business Machines Corporation
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Low temperature melt-processing of organic-inorganic hybrid
- Patent number 7,291,516
- Issue date Nov 6, 2007
- International Business Machines Corporation
- Patrick W Dehaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic antireflective hardmask compositions and uses thereof
- Patent number 7,223,517
- Issue date May 29, 2007
- International Business Machines Corporation
- Katherina Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Use of an energy source to convert precursors into patterned semico...
- Patent number 7,176,484
- Issue date Feb 13, 2007
- International Business Machines Corporation
- Ali Afzali-Ardakani
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY
- Publication number 20120205787
- Publication date Aug 16, 2012
- International Business Machines Corporation
- Dario L. Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW TEMPERATURE MELT-PROCESSING OF ORGANIC-INORGANIC HYBRID
- Publication number 20120126216
- Publication date May 24, 2012
- International Business Machines Corporation
- Patrick W. DeHaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...
- Publication number 20110300483
- Publication date Dec 8, 2011
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...
- Publication number 20110294068
- Publication date Dec 1, 2011
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Hardmask Composition and a Method of Preparing a Pat...
- Publication number 20110207047
- Publication date Aug 25, 2011
- International Business Machines Corporation
- Sean D. Burns
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SELF-SEGREGATING MULTILAYER IMAGING STACK WITH BUILT-IN ANTIREFLECT...
- Publication number 20100009132
- Publication date Jan 14, 2010
- International Business Machines Corporation
- Joy Cheng
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
HIGH PERFORMANCE CMOS DEVICES COMPRISING GAPPED DUAL STRESSORS WITH...
- Publication number 20090321847
- Publication date Dec 31, 2009
- International Business Machines Corporation
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY
- Publication number 20090186294
- Publication date Jul 23, 2009
- IBM
- Dario L. Goldfarb
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING A DUAL-DAMASCENE STRUCTURE USING AN UNDERLAYER
- Publication number 20090093114
- Publication date Apr 9, 2009
- Sean David Burns
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE MELT-PROCESSING OF ORGANIC-INORGANIC HYBRID
- Publication number 20080292825
- Publication date Nov 27, 2008
- International Business Machines Corporation
- Patrick W. DeHaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative Resists Based on Acid-Catalyzed Elimination of Polar Molec...
- Publication number 20080233517
- Publication date Sep 25, 2008
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome o...
- Publication number 20080227030
- Publication date Sep 18, 2008
- International Business Machines Corporation
- Wayne M. Moreau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Graded Spin-on Organic Antireflective Coating for Photolithography
- Publication number 20080213707
- Publication date Sep 4, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Bleachable materials for lithography
- Publication number 20080182178
- Publication date Jul 31, 2008
- John A. Hoffnagle
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...
- Publication number 20080153270
- Publication date Jun 26, 2008
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Multilayered resist systems using tuned polymer films as underlayer...
- Publication number 20080124649
- Publication date May 29, 2008
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Multilayered resist systems using tuned polymer films as underlayer...
- Publication number 20080124650
- Publication date May 29, 2008
- Marie Angelopoulos
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...
- Publication number 20080093640
- Publication date Apr 24, 2008
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Graded spin-on organic antireflective coating for photolithography
- Publication number 20080008955
- Publication date Jan 10, 2008
- International Business Machines Corporation
- Colin J. Brodsky
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
High performance CMOS devices comprising gapped dual stressors with...
- Publication number 20070284617
- Publication date Dec 13, 2007
- International Business Machines Corporation
- Bruce B. Doris
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Negative resists based on acid-catalyzed elimination of polar molec...
- Publication number 20070259274
- Publication date Nov 8, 2007
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
TOPCOAT MATERIAL AND USE THEREOF IN IMMERSION LITHOGRAPHY PROCESSES
- Publication number 20070254237
- Publication date Nov 1, 2007
- International Business Machines Corporation
- ROBERT DAVID ALLEN
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RES...
- Publication number 20070248908
- Publication date Oct 25, 2007
- International Business Machines
- Wu-Song S. Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Antireflective Hardmask and Uses Thereof
- Publication number 20070105363
- Publication date May 10, 2007
- International Business Machines Corporation
- Katherina E. Babich
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Method for tuning epitaxial growth by interfacial doping and struct...
- Publication number 20070090487
- Publication date Apr 26, 2007
- International Business Machines Corporation
- Katherina E. Babich
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NEGATIVE RESISTS BASED ON A ACID-CATALYZED ELIMINATION OF POLAR MOL...
- Publication number 20070026339
- Publication date Feb 1, 2007
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
Low temperature melt-processing of organic-inorganic hybrid
- Publication number 20060270100
- Publication date Nov 30, 2006
- International Business Machines Corporation
- Patrick W. Dehaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Low temperature melt-processing of organic-inorganic hybrid
- Publication number 20060234480
- Publication date Oct 19, 2006
- International Business Machines Corporation
- Patrick W. Dehaven
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
High sensitivity resist compositions for electron-based lithography
- Publication number 20060127800
- Publication date Jun 15, 2006
- Wu-Song Huang
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
photoresist composition
- Publication number 20060128914
- Publication date Jun 15, 2006
- International Business Machines Corporation
- Robert David Allen
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

David R. Medeiros

Person

Patents Grantslast 30 patents

Organic graded spin on BARC compositions for high NA lithography

Low temperature melt-processing of organic-inorganic hybrid

Antireflective hardmask composition and a method of preparing a pat...

Organic graded spin on BARC compositions for high NA lithography

Low temperature melt-processing of organic-inorganic hybrid

Self-segregating multilayer imaging stack with built-in antireflect...

Use of mixed bases to enhance patterned resist profiles on chrome o...

Bleachable materials for lithography

High performance CMOS devices comprising gapped dual stressors with...

Graded spin-on organic antireflective coating for photolithography

Method for tuning epitaxial growth by interfacial doping and struct...

Multilayered resist systems using tuned polymer films as underlayer...

Multilayered resist systems using tuned polymer films as underlayer...

Antireflective hardmask and uses thereof

Ultrathin polymeric photoacid generator layer and method of fabrica...

High performance CMOS devices comprising gapped dual stressors with...

Graded spin-on organic antireflective coating for photolithography

Negative resists based on acid-catalyzed elimination of polar molec...

Topcoat material and use thereof in immersion lithography processes

Low temperature melt-processing of organic-inorganic hybrid

Negative resists based on acid-catalyzed elimination of polar molec...

Multilayered resist systems using tuned polymer films as underlayer...

Method for tuning epitaxial growth by interfacial doping and struct...

High sensitivity resist compositions for electron-based lithography

Method for fabricating an ultralow dielectric constant material as...

Negative resists based on a acid-catalyzed elimination of polar mol...

Advanced chemically amplified resist for sub 30 nm dense feature re...

Low temperature melt-processing of organic-inorganic hybrid

Lithographic antireflective hardmask compositions and uses thereof

Use of an energy source to convert precursors into patterned semico...

Patents Applicationslast 30 patents

ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY

LOW TEMPERATURE MELT-PROCESSING OF ORGANIC-INORGANIC HYBRID

Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...

Self-Segregating Multilayer Imaging Stack With Built-In Antireflect...

Antireflective Hardmask Composition and a Method of Preparing a Pat...

SELF-SEGREGATING MULTILAYER IMAGING STACK WITH BUILT-IN ANTIREFLECT...

HIGH PERFORMANCE CMOS DEVICES COMPRISING GAPPED DUAL STRESSORS WITH...

ORGANIC GRADED SPIN ON BARC COMPOSITIONS FOR HIGH NA LITHOGRAPHY

METHOD OF FORMING A DUAL-DAMASCENE STRUCTURE USING AN UNDERLAYER

LOW TEMPERATURE MELT-PROCESSING OF ORGANIC-INORGANIC HYBRID

Negative Resists Based on Acid-Catalyzed Elimination of Polar Molec...

Use of Mixed Bases to Enhance Patterned Resist Profiles on Chrome o...

Graded Spin-on Organic Antireflective Coating for Photolithography

Bleachable materials for lithography

METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...

Multilayered resist systems using tuned polymer films as underlayer...

Multilayered resist systems using tuned polymer films as underlayer...

METHOD FOR TUNING EPITAXIAL GROWTH BY INTERFACIAL DOPING AND STRUCT...

Graded spin-on organic antireflective coating for photolithography

High performance CMOS devices comprising gapped dual stressors with...

Negative resists based on acid-catalyzed elimination of polar molec...

TOPCOAT MATERIAL AND USE THEREOF IN IMMERSION LITHOGRAPHY PROCESSES

ADVANCED CHEMICALLY AMPLIFIED RESIST FOR SUB 30NM DENSE FEATURE RES...

Antireflective Hardmask and Uses Thereof

Method for tuning epitaxial growth by interfacial doping and struct...

NEGATIVE RESISTS BASED ON A ACID-CATALYZED ELIMINATION OF POLAR MOL...

Low temperature melt-processing of organic-inorganic hybrid

Low temperature melt-processing of organic-inorganic hybrid

High sensitivity resist compositions for electron-based lithography

photoresist composition