David R. Pirkle

Person

Soquel, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods and apparatus for sensing unconfinement in a plasma process...
- Patent number 7,722,778
- Issue date May 25, 2010
- Lam Research Corporation
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for providing uniform removal of organic material
- Patent number 7,534,363
- Issue date May 19, 2009
- Lam Research Corporation
- Rao V. Annapragada
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for the detection of an arc in a plasma proce...
- Patent number 7,334,477
- Issue date Feb 26, 2008
- Lam Research Corporation
- David Pirkle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching silicon nitride
- Patent number 6,962,879
- Issue date Nov 8, 2005
- Lam Research Corporation
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench etch process for low-k dielectrics
- Patent number 6,909,195
- Issue date Jun 21, 2005
- Lam Research Corporation
- SiYi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Trench etch process for low-k dielectrics
- Patent number 6,794,293
- Issue date Sep 21, 2004
- Lam Research Corporation
- SiYi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of plasma etching of silicon carbide
- Patent number 6,670,278
- Issue date Dec 30, 2003
- Lam Research Corporation
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma processor
- Patent number 6,016,766
- Issue date Jan 25, 2000
- Lam Research Corporation
- David R. Pirkle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods for filling trenches in a semiconductor wafer
- Patent number 5,915,190
- Issue date Jun 22, 1999
- Lam Research Corporation
- David R. Pirkle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for monitoring process endpoints in a plasma chamber and a p...
- Patent number 5,846,373
- Issue date Dec 8, 1998
- Lam Research Corporation
- David R. Pirkle
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chuck for substrate processing and method for depositing a film in...
- Patent number 5,841,623
- Issue date Nov 24, 1998
- Lam Research Corporation
- Dean R. Denison
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Plasma cleaning method for removing residues in a plasma process ch...
- Patent number 5,647,953
- Issue date Jul 15, 1997
- Lam Research Corporation
- Larry Williams
- B08 - CLEANING
Information Patent Grant
Window for microwave plasma processing device
- Patent number 5,234,526
- Issue date Aug 10, 1993
- Lam Research Corporation
- Ching-Hwa Chen
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD AND APPARATUS FOR DETECTING DEFECTS ON WAFERS
- Publication number 20160293502
- Publication date Oct 6, 2016
- LAM RESEARCH CORPORATION
- David Pirkle
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SENSING UNCONFINEMENT IN A PLASMA PROCESS...
- Publication number 20100096361
- Publication date Apr 22, 2010
- Andreas Fischer
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for providing uniform removal of organic material
- Publication number 20050006346
- Publication date Jan 13, 2005
- Rao V. Annapragada
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Trench etch process for low-k dielectrics
- Publication number 20050009324
- Publication date Jan 13, 2005
- LAM RESEARCH CORPORATION
- SiYi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TRENCH ETCH PROCESS FOR LOW-K DIELECTRICS
- Publication number 20040038540
- Publication date Feb 26, 2004
- LAM RESEARCH CORPORATION
- SiYi Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching silicon nitride
- Publication number 20020182880
- Publication date Dec 5, 2002
- Helen H. Zhu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of plasma etching of silicon carbide
- Publication number 20020177322
- Publication date Nov 28, 2002
- Si Yi Li
- H01 - BASIC ELECTRIC ELEMENTS

David R. Pirkle

Person

Patents Grantslast 30 patents

Methods and apparatus for sensing unconfinement in a plasma process...

Method for providing uniform removal of organic material

Apparatus and methods for the detection of an arc in a plasma proce...

Method of plasma etching silicon nitride

Trench etch process for low-k dielectrics

Trench etch process for low-k dielectrics

Method of plasma etching of silicon carbide

Microwave plasma processor

Methods for filling trenches in a semiconductor wafer

Method for monitoring process endpoints in a plasma chamber and a p...

Chuck for substrate processing and method for depositing a film in...

Plasma cleaning method for removing residues in a plasma process ch...

Window for microwave plasma processing device

Patents Applicationslast 30 patents

METHOD AND APPARATUS FOR DETECTING DEFECTS ON WAFERS

METHODS AND APPARATUS FOR SENSING UNCONFINEMENT IN A PLASMA PROCESS...

Method for providing uniform removal of organic material

Trench etch process for low-k dielectrics

TRENCH ETCH PROCESS FOR LOW-K DIELECTRICS

Method of plasma etching silicon nitride

Method of plasma etching of silicon carbide