David S. Alles

Person

Los Altos, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Inspecting high-resolution photolithography masks
- Patent number 9,619,878
- Issue date Apr 11, 2017
- KLA-Tencor Corporation
- Fred Stanke
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Spectral purity filter and light monitor for an EUV reticle inspect...
- Patent number 9,348,214
- Issue date May 24, 2016
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Grant
Auto focus system for reticle inspection
- Patent number 8,928,895
- Issue date Jan 6, 2015
- KLA-Tencor Corporation
- Michael J. Wright
- G01 - MEASURING TESTING
Information Patent Grant
Apparatus and method for synchronizing sample stage motion with a t...
- Patent number 8,772,731
- Issue date Jul 8, 2014
- KLA-Tencor Corporation
- Pradeep Subrahmanyan
- G01 - MEASURING TESTING
Information Patent Grant
Beam conditioning to reduce spatial coherence
- Patent number 7,926,959
- Issue date Apr 19, 2011
- KLA-Tencor Corporation
- Damon Kvamme
- G02 - OPTICS
Information Patent Grant
Auto focus system for reticle inspection
- Patent number 7,835,015
- Issue date Nov 16, 2010
- KLA-Tencor Corporation
- Michael J. Wright
- G01 - MEASURING TESTING
Information Patent Grant
Methods for detecting and classifying defects on a reticle
- Patent number 7,738,093
- Issue date Jun 15, 2010
- KLA-Tencor Corp.
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods and systems for reticle inspection and defect review using...
- Patent number 7,379,175
- Issue date May 27, 2008
- KLA-Tencor Technologies Corp.
- Stan Stokowski
- G01 - MEASURING TESTING
Information Patent Grant
Methods and systems for inspecting reticles using aerial imaging an...
- Patent number 7,123,356
- Issue date Oct 17, 2006
- KLA-Tencor Technologies Corp.
- Stan Stokowski
- G01 - MEASURING TESTING
Information Patent Grant
Surface inspection system and method using summed light analysis of...
- Patent number 7,046,352
- Issue date May 16, 2006
- KLA-Tencor Technologies Corporation
- Aditya Dayal
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Methods and systems for inspecting reticles using aerial imaging at...
- Patent number 7,027,143
- Issue date Apr 11, 2006
- KLA-Tencor Technologies Corp.
- Stan Stokowski
- G01 - MEASURING TESTING
Information Patent Grant
Mechanisms for making and inspecting reticles
- Patent number 6,748,103
- Issue date Jun 8, 2004
- KLA Tencor
- Lance A. Glasser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for collecting global data during a reticle i...
- Patent number 6,654,489
- Issue date Nov 25, 2003
- KLA-Tencor Technologies Corporation
- James N. Wiley
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Mechanisms for making and inspecting reticles
- Patent number 6,529,621
- Issue date Mar 4, 2003
- KLA Tencor
- Lance A. Glasser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Apparatus and methods for collecting global data during a reticle i...
- Patent number 6,516,085
- Issue date Feb 4, 2003
- KLA Tencor
- James N. Wiley
- G06 - COMPUTING CALCULATING COUNTING

Patents Applicationslast 30 patents

Information Patent Application
INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS
- Publication number 20140307943
- Publication date Oct 16, 2014
- KLA-Tencor Corporation
- Fred Stanke
- G01 - MEASURING TESTING
Information Patent Application
SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE...
- Publication number 20140217298
- Publication date Aug 7, 2014
- KLA-Tencor Corporation
- Daimian Wang
- G01 - MEASURING TESTING
Information Patent Application
APPARATUS AND METHOD FOR SYNCHRONIZING SAMPLE STAGE MOTION WITH A T...
- Publication number 20130270444
- Publication date Oct 17, 2013
- KLA-Tencor Corporation
- Pradeep Subrahmanyan
- G01 - MEASURING TESTING
Information Patent Application
Auto Focus System for Reticle Inspection
- Publication number 20110019206
- Publication date Jan 27, 2011
- KLA-Tencor Corporation
- Michael J. Wright
- G01 - MEASURING TESTING
Information Patent Application
METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE
- Publication number 20080304056
- Publication date Dec 11, 2008
- David Alles
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Mechanisms for making and inspecting reticles
- Publication number 20030142860
- Publication date Jul 31, 2003
- KLA-Tencor Technologies Corporation
- Lance A. Glasser
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Apparatus and methods for collecting global data during a reticle i...
- Publication number 20030091224
- Publication date May 15, 2003
- KLA-Tencor Technologies Corporation
- James N. Wiley
- G06 - COMPUTING CALCULATING COUNTING

David S. Alles

Person

Patents Grantslast 30 patents

Inspecting high-resolution photolithography masks

Spectral purity filter and light monitor for an EUV reticle inspect...

Auto focus system for reticle inspection

Apparatus and method for synchronizing sample stage motion with a t...

Beam conditioning to reduce spatial coherence

Auto focus system for reticle inspection

Methods for detecting and classifying defects on a reticle

Methods and systems for reticle inspection and defect review using...

Methods and systems for inspecting reticles using aerial imaging an...

Surface inspection system and method using summed light analysis of...

Methods and systems for inspecting reticles using aerial imaging at...

Mechanisms for making and inspecting reticles

Apparatus and methods for collecting global data during a reticle i...

Mechanisms for making and inspecting reticles

Apparatus and methods for collecting global data during a reticle i...

Patents Applicationslast 30 patents

INSPECTING HIGH-RESOLUTION PHOTOLITHOGRAPHY MASKS

SPECTRAL PURITY FILTER AND LIGHT MONITOR FOR AN EUV ACTINIC RETICLE...

APPARATUS AND METHOD FOR SYNCHRONIZING SAMPLE STAGE MOTION WITH A T...

Auto Focus System for Reticle Inspection

METHODS FOR DETECTING AND CLASSIFYING DEFECTS ON A RETICLE

Mechanisms for making and inspecting reticles

Apparatus and methods for collecting global data during a reticle i...