David Starosvetsky

Person

Yokneam Elit, IL

People

Patents Grantslast 30 patents

Information Patent Grant
Copper CMP slurry composition
- Patent number 7,964,005
- Issue date Jun 21, 2011
- Technion Research and Development Foundation Ltd.
- Yair Ein-Eli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for electrochemical etching of semiconductor material using...
- Patent number 7,494,936
- Issue date Feb 24, 2009
- Technion Research and Development Foundation Ltd.
- Yair Ein-Eli
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Anode assembly and method of reducing sludge formation during elect...
- Patent number 6,830,673
- Issue date Dec 14, 2004
- Applied Materials, Inc.
- Joseph Yahalom
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Semiconductor etching process and apparatus
- Patent number 6,521,118
- Issue date Feb 18, 2003
- Technion Research and Development Foundation
- David Starosvetsky
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
CARBON-NANOTUBES COPPER COMPOSITE CONDUCTORS
- Publication number 20220223314
- Publication date Jul 14, 2022
- Technion Research & Development Foundation Limited
- Yair EIN-ELI
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
PROCESS FOR ELECTROPLATING OF COPPER
- Publication number 20120028073
- Publication date Feb 2, 2012
- Technion Research & Development Foundation Ltd.
- Yair Ein-Eli
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Copper cmp slurry composition
- Publication number 20070163677
- Publication date Jul 19, 2007
- Yair Ein-Eli
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Method for electrochemical etching of semiconductor material using...
- Publication number 20060254928
- Publication date Nov 16, 2006
- Yair Ein-Eli
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Texturing a semiconductor material using negative potential dissolu...
- Publication number 20050148198
- Publication date Jul 7, 2005
- TECHNION RESEARCH AND DEVELOPMENT FOUNDATION LTD.
- Yair Ein-Eli
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
Anode assembly and method of reducing sludge formation during elect...
- Publication number 20030150715
- Publication date Aug 14, 2003
- Joseph Yahalom
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR

David Starosvetsky

Person

Patents Grantslast 30 patents

Copper CMP slurry composition

Method for electrochemical etching of semiconductor material using...

Anode assembly and method of reducing sludge formation during elect...

Semiconductor etching process and apparatus

Patents Applicationslast 30 patents

CARBON-NANOTUBES COPPER COMPOSITE CONDUCTORS

PROCESS FOR ELECTROPLATING OF COPPER

Copper cmp slurry composition

Method for electrochemical etching of semiconductor material using...

Texturing a semiconductor material using negative potential dissolu...

Anode assembly and method of reducing sludge formation during elect...