David V. Horak

Person

Essex Junction, VT, US

People

Patents Grantslast 30 patents

Information Patent Grant
Size-filtered multimetal structures
- Patent number 10,134,631
- Issue date Nov 20, 2018
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-lithographic line pattern formation
- Patent number 9,997,367
- Issue date Jun 12, 2018
- International Business Machines Corporation
- Chiahsun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact with vertical isolation from source-drain
- Patent number 9,935,168
- Issue date Apr 3, 2018
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement gate electrode with a self-aligned dielectric spacer
- Patent number 9,660,030
- Issue date May 23, 2017
- GLOBALFOUNDRIES Inc.
- Shom Ponoth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned dielectric isolation for FinFET devices
- Patent number 9,627,377
- Issue date Apr 18, 2017
- GLOBALFOUNDRIES Inc.
- Marc Adam Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Borderless contact structure
- Patent number 9,620,619
- Issue date Apr 11, 2017
- GLOBALFOUNDRIES Inc.
- Veeraraghavan S. Basker
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact with vertical isolation from source-drain
- Patent number 9,614,047
- Issue date Apr 4, 2017
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate
- Patent number 9,515,070
- Issue date Dec 6, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Size-filtered multimetal structures
- Patent number 9,484,254
- Issue date Nov 1, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-lithographic line pattern formation
- Patent number 9,396,957
- Issue date Jul 19, 2016
- International Business Machines Corporation
- Chiahsun Tseng
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Integrated circuit structure having selectively formed metal cap
- Patent number 9,379,198
- Issue date Jun 28, 2016
- GLOBALFOUNDRIES Inc.
- Chih-Chao Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual hard mask lithography process
- Patent number 9,373,580
- Issue date Jun 21, 2016
- GLOBALFOUNDRIES Inc.
- John C. Arnold
- Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information Patent Grant
Silicon-on-insulator transistor with self-aligned borderless source...
- Patent number 9,368,590
- Issue date Jun 14, 2016
- GLOBALFOUNDRIES Inc.
- Susan S. Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact with vertical isolation from source-drain
- Patent number 9,349,598
- Issue date May 24, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Non-lithographic hole pattern formation
- Patent number 9,330,962
- Issue date May 3, 2016
- International Business Machines Corporation
- Chiahsun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microelectronic structure including air gap
- Patent number 9,332,628
- Issue date May 3, 2016
- GLOBALFOUNDRIES Inc.
- Daniel C. Edelstein
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Integrated circuits having gate cap protection and methods of formi...
- Patent number 9,269,611
- Issue date Feb 23, 2016
- GLOBALFOUNDRIES, INC.
- Daniel Thanh Khae Pham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Dual damascene dual alignment interconnect scheme
- Patent number 9,269,621
- Issue date Feb 23, 2016
- GLOBALFOUNDRIES Inc.
- Steven J. Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Overlay-tolerant via mask and reactive ion etch (RIE) technique
- Patent number 9,263,388
- Issue date Feb 16, 2016
- GLOBALFOUNDRIES Inc.
- Steven J. Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sub-lithographic semiconductor structures with non-constant pitch
- Patent number 9,263,290
- Issue date Feb 16, 2016
- GLOBALFOUNDRIES INC.
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Replacement metal gate
- Patent number 9,231,080
- Issue date Jan 5, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Mask free protection of work function material portions in wide rep...
- Patent number 9,202,879
- Issue date Dec 1, 2015
- GLOBALFOUNDRIES Inc.
- Charles W. Koburger
- E21 - EARTH DRILLING MINING
Information Patent Grant
Sub-lithographic semiconductor structures with non-constant pitch
- Patent number 9,177,820
- Issue date Nov 3, 2015
- GlobalFoundries U.S. 2 LLC
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Copper interconnect structures and methods of making same
- Patent number 9,159,653
- Issue date Oct 13, 2015
- GLOBALFOUNDRIES Inc.
- Chih-Chao Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate contact with vertical isolation from source-drain
- Patent number 9,147,576
- Issue date Sep 29, 2015
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Interconnect structures and methods for back end of the line integr...
- Patent number 9,141,749
- Issue date Sep 22, 2015
- International Business Machines Corporation
- David V. Horak
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Recessing and capping of gate structures with varying metal composi...
- Patent number 9,130,029
- Issue date Sep 8, 2015
- GLOBALFOUNDRIES Singapore Pte. Ltd.
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Profile control in interconnect structures
- Patent number 9,105,641
- Issue date Aug 11, 2015
- International Business Machines Corporation
- Shyng-Tsong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microelectronic structure including air gap
- Patent number 9,105,693
- Issue date Aug 11, 2015
- International Business Machines Corporation
- Daniel C. Edelstein
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bi-layer gate cap for self-aligned contact formation
- Patent number 9,064,801
- Issue date Jun 23, 2015
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN
- Publication number 20170170266
- Publication date Jun 15, 2017
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-LITHOGRAPHIC LINE PATTERN FORMATION
- Publication number 20160329214
- Publication date Nov 10, 2016
- International Business Machines Corporation
- Chiahsun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN
- Publication number 20160260812
- Publication date Sep 8, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SIZE-FILTERED MULTIMETAL STRUCTURES
- Publication number 20160204064
- Publication date Jul 14, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT METAL GATE
- Publication number 20160086944
- Publication date Mar 24, 2016
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SUB-LITHOGRAPHIC SEMICONDUCTOR STRUCTURES WITH NON-CONSTANT PITCH
- Publication number 20150380262
- Publication date Dec 31, 2015
- GLOBALFOUNDRIES Inc.
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN
- Publication number 20150357409
- Publication date Dec 10, 2015
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RECESSING AND CAPPING OF GATE STRUCTURES WITH VARYING METAL COMPOSI...
- Publication number 20150340462
- Publication date Nov 26, 2015
- GLOBALFOUNDRIES SINGAPORE PTE. LTD.
- Ruilong XIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MICROELECTRONIC STRUCTURE INCLUDING AIR GAP
- Publication number 20150289361
- Publication date Oct 8, 2015
- International Business Machines Corporation
- Daniel C. Edelstein
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
REPLACEMENT METAL GATE
- Publication number 20150270373
- Publication date Sep 24, 2015
- Intemational Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OVERLAY-TOLERANT VIA MASK AND REACTIVE ION ETCH (RIE) TECHNIQUE
- Publication number 20150221591
- Publication date Aug 6, 2015
- International Business Machines Corporation
- Steven J. Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUITS HAVING GATE CAP PROTECTION AND METHODS OF FORMI...
- Publication number 20150206844
- Publication date Jul 23, 2015
- International Business Machines Corporation
- Daniel Thanh Khae Pham
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN
- Publication number 20150206754
- Publication date Jul 23, 2015
- GLOBALFOUNDRIES INC.
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORDERLESS CONTACT FOR ULTRA-THIN BODY DEVICES
- Publication number 20150155353
- Publication date Jun 4, 2015
- International Business Machines Corporation
- Su Chen Fan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SELF-ALIGNED DIELECTRIC ISOLATION FOR FINFET DEVICES
- Publication number 20150061040
- Publication date Mar 5, 2015
- International Business Machines Corporation
- Marc Adam Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPACER FOR ENHANCING VIA PATTERN OVERLAY TOLERENCE
- Publication number 20150035157
- Publication date Feb 5, 2015
- International Business Machines Corporation
- Steven J. Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROFILE CONTROL IN INTERCONNECT STRUCTURES
- Publication number 20150035154
- Publication date Feb 5, 2015
- International Business Machines Corporation
- Shyng-Tsong Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MIDDLE-OF-LINE BORDERLESS CONTACT STRUCTURE AND METHOD OF FORMING
- Publication number 20150035026
- Publication date Feb 5, 2015
- International Business Machines Corporation
- Brent A. Anderson
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
INTEGRATED CIRCUIT STRUCTURE HAVING SELECTIVELY FORMED METAL CAP
- Publication number 20150008527
- Publication date Jan 8, 2015
- International Business Machines Corporation
- Chih-Chao Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT GATE ELECTRODE WITH A SELF-ALIGNED DIELECTRIC SPACER
- Publication number 20140363941
- Publication date Dec 11, 2014
- Shom Ponoth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-LITHOGRAPHIC LINE PATTERN FORMATION
- Publication number 20140349088
- Publication date Nov 27, 2014
- International Business Machines Corporation
- Chiahsun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-LITHOGRAPHIC HOLE PATTERN FORMATION
- Publication number 20140346640
- Publication date Nov 27, 2014
- International Business Machines Corporation
- Chiahsun Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL DAMASCENE DUAL ALIGNMENT INTERCONNECT SCHEME
- Publication number 20140342549
- Publication date Nov 20, 2014
- Steven J. Holmes
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTACT FORMATION FOR ULTRA-SCALED DEVICES
- Publication number 20140339629
- Publication date Nov 20, 2014
- International Business Machines Corporation
- Ruilong Xie
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF THE DIELECTRIC CAP LAYER FOR A REPLACEMENT GATE STRUCTURE
- Publication number 20140299924
- Publication date Oct 9, 2014
- GLOBALFOUNFRIES SINGAPORE PTE. LTD.
- Ruilong XIE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COPPER INTERCONNECT STRUCTURES AND METHODS OF MAKING SAME
- Publication number 20140264878
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Chih-Chao Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REPLACEMENT GATE ELECTRODE WITH A SELF-ALIGNED DIELECTRIC SPACER
- Publication number 20140264490
- Publication date Sep 18, 2014
- International Business Machines Corporation
- Shom Ponoth
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FINFETS AND FIN ISOLATION STRUCTURES
- Publication number 20140231918
- Publication date Aug 21, 2014
- International Business Machines Corporation
- Marc A. Bergendahl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
AIR-DIELECTRIC FOR SUBTRACTIVE ETCH LINE AND VIA METALLIZATION
- Publication number 20140203453
- Publication date Jul 24, 2014
- International Business Machines Corporation
- David V. Horak
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DUAL MANDREL SIDEWALL IMAGE TRANSFER PROCESSES
- Publication number 20140190935
- Publication date Jul 10, 2014
- International Business Machines Corporation
- David V. Horak
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

David V. Horak

Person

Patents Grantslast 30 patents

Size-filtered multimetal structures

Non-lithographic line pattern formation

Gate contact with vertical isolation from source-drain

Replacement gate electrode with a self-aligned dielectric spacer

Self-aligned dielectric isolation for FinFET devices

Borderless contact structure

Gate contact with vertical isolation from source-drain

Replacement metal gate

Size-filtered multimetal structures

Non-lithographic line pattern formation

Integrated circuit structure having selectively formed metal cap

Dual hard mask lithography process

Silicon-on-insulator transistor with self-aligned borderless source...

Gate contact with vertical isolation from source-drain

Non-lithographic hole pattern formation

Microelectronic structure including air gap

Integrated circuits having gate cap protection and methods of formi...

Dual damascene dual alignment interconnect scheme

Overlay-tolerant via mask and reactive ion etch (RIE) technique

Sub-lithographic semiconductor structures with non-constant pitch

Replacement metal gate

Mask free protection of work function material portions in wide rep...

Sub-lithographic semiconductor structures with non-constant pitch

Copper interconnect structures and methods of making same

Gate contact with vertical isolation from source-drain

Interconnect structures and methods for back end of the line integr...

Recessing and capping of gate structures with varying metal composi...

Profile control in interconnect structures

Microelectronic structure including air gap

Bi-layer gate cap for self-aligned contact formation

Patents Applicationslast 30 patents

GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN

NON-LITHOGRAPHIC LINE PATTERN FORMATION

GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN

SIZE-FILTERED MULTIMETAL STRUCTURES

REPLACEMENT METAL GATE

SUB-LITHOGRAPHIC SEMICONDUCTOR STRUCTURES WITH NON-CONSTANT PITCH

GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN

RECESSING AND CAPPING OF GATE STRUCTURES WITH VARYING METAL COMPOSI...

MICROELECTRONIC STRUCTURE INCLUDING AIR GAP

REPLACEMENT METAL GATE

OVERLAY-TOLERANT VIA MASK AND REACTIVE ION ETCH (RIE) TECHNIQUE

INTEGRATED CIRCUITS HAVING GATE CAP PROTECTION AND METHODS OF FORMI...

GATE CONTACT WITH VERTICAL ISOLATION FROM SOURCE-DRAIN

BORDERLESS CONTACT FOR ULTRA-THIN BODY DEVICES

SELF-ALIGNED DIELECTRIC ISOLATION FOR FINFET DEVICES

SPACER FOR ENHANCING VIA PATTERN OVERLAY TOLERENCE

PROFILE CONTROL IN INTERCONNECT STRUCTURES

MIDDLE-OF-LINE BORDERLESS CONTACT STRUCTURE AND METHOD OF FORMING

INTEGRATED CIRCUIT STRUCTURE HAVING SELECTIVELY FORMED METAL CAP

REPLACEMENT GATE ELECTRODE WITH A SELF-ALIGNED DIELECTRIC SPACER

NON-LITHOGRAPHIC LINE PATTERN FORMATION

NON-LITHOGRAPHIC HOLE PATTERN FORMATION

DUAL DAMASCENE DUAL ALIGNMENT INTERCONNECT SCHEME

CONTACT FORMATION FOR ULTRA-SCALED DEVICES

FORMATION OF THE DIELECTRIC CAP LAYER FOR A REPLACEMENT GATE STRUCTURE

COPPER INTERCONNECT STRUCTURES AND METHODS OF MAKING SAME

REPLACEMENT GATE ELECTRODE WITH A SELF-ALIGNED DIELECTRIC SPACER

FINFETS AND FIN ISOLATION STRUCTURES

AIR-DIELECTRIC FOR SUBTRACTIVE ETCH LINE AND VIA METALLIZATION

DUAL MANDREL SIDEWALL IMAGE TRANSFER PROCESSES