David W. Benzing

Person

San Jose, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Electrode for plasma processes and method for manufacture and use t...
- Patent number 8,845,855
- Issue date Sep 30, 2014
- Lam Research Corporation
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow anode plasma reactor and method
- Patent number 8,465,620
- Issue date Jun 18, 2013
- Lam Research
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 7,470,627
- Issue date Dec 30, 2008
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Hollow anode plasma reactor and method
- Patent number 6,974,523
- Issue date Dec 13, 2005
- Lam Research Corporation
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 6,823,815
- Issue date Nov 30, 2004
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer boat and boat holder
- Patent number 6,669,253
- Issue date Dec 30, 2003
- David W. Benzing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Wafer area pressure control for plasma confinement
- Patent number 6,492,774
- Issue date Dec 10, 2002
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for in-situ chamber cleaning
- Patent number 4,786,352
- Issue date Nov 22, 1988
- Benzing Technologies, Inc.
- David W. Benzing
- B08 - CLEANING
Information Patent Grant
In-situ CVD chamber cleaner
- Patent number 4,657,616
- Issue date Apr 14, 1987
- Benzing Technologies, Inc.
- David W. Benzing
- C30 - CRYSTAL GROWTH
Information Patent Grant
Troide plasma reactor with magnetic enhancement
- Patent number 4,572,759
- Issue date Feb 25, 1986
- Benzing Technology, Inc.
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
HOLLOW ANODE PLASMA REACTOR AND METHOD
- Publication number 20080271849
- Publication date Nov 6, 2008
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode for plasma processes and method for manufacture and use t...
- Publication number 20080026589
- Publication date Jan 31, 2008
- LAM RESEARCH CORPORATION
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hollow anode plasma reactor and method
- Publication number 20060027328
- Publication date Feb 9, 2006
- Lam Research Corporation
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer area pressure control for plasma confinement
- Publication number 20050051268
- Publication date Mar 10, 2005
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer area pressure control for plasma confinement
- Publication number 20020190657
- Publication date Dec 19, 2002
- Lam Research Corporation
- Taejoon Han
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Hollow anode plasma reactor and method
- Publication number 20020170881
- Publication date Nov 21, 2002
- LAM RESEARCH
- David W. Benzing
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Electrode for plasma processes and method for manufacture and use t...
- Publication number 20020127853
- Publication date Sep 12, 2002
- Jerome S. Hubacek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Wafer boat and boat holder
- Publication number 20020076316
- Publication date Jun 20, 2002
- David W. Benzing
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

David W. Benzing

Person

Patents Grantslast 30 patents

Electrode for plasma processes and method for manufacture and use t...

Hollow anode plasma reactor and method

Wafer area pressure control for plasma confinement

Hollow anode plasma reactor and method

Wafer area pressure control for plasma confinement

Wafer boat and boat holder

Wafer area pressure control for plasma confinement

Apparatus for in-situ chamber cleaning

In-situ CVD chamber cleaner

Troide plasma reactor with magnetic enhancement

Patents Applicationslast 30 patents

HOLLOW ANODE PLASMA REACTOR AND METHOD

Electrode for plasma processes and method for manufacture and use t...

Hollow anode plasma reactor and method

Wafer area pressure control for plasma confinement

Wafer area pressure control for plasma confinement

Hollow anode plasma reactor and method

Electrode for plasma processes and method for manufacture and use t...

Wafer boat and boat holder