David W. Minsek

Person

Pleasantville, NY, US

People

Patents Grantslast 30 patents

Information Patent Grant
Oxidizing aqueous cleaner for the removal of post-etch residues
- Patent number 9,443,713
- Issue date Sep 13, 2016
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal and dielectric compatible sacrificial anti-reflective coating...
- Patent number 9,422,513
- Issue date Aug 23, 2016
- Advanced Technology Materials, Inc.
- Melissa K. Rath
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Photoresist removal
- Patent number 9,256,134
- Issue date Feb 9, 2016
- Advanced Technology Materials, Inc.
- David W. Minsek
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Light induced plating of metals on silicon photovoltaic cells
- Patent number 8,956,687
- Issue date Feb 17, 2015
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Metal and dielectric compatible sacrificial anti-reflective coating...
- Patent number 8,951,948
- Issue date Feb 10, 2015
- Advanced Technology Materials, Inc.
- Melissa K. Rath
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxidizing aqueous cleaner for the removal of post-etch residues
- Patent number 8,765,654
- Issue date Jul 1, 2014
- Advanced Technology Materials, Inc.
- David W. Minsek
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Light induced electroless plating
- Patent number 8,722,142
- Issue date May 13, 2014
- David Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist removal
- Patent number 8,679,734
- Issue date Mar 25, 2014
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition and process for post-etch removal of photoresist and/or...
- Patent number 8,338,087
- Issue date Dec 25, 2012
- Advanced Technology Materials, Inc.
- Melissa K. Rath
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Light induced plating of metals on silicon photovoltaic cells
- Patent number 8,337,942
- Issue date Dec 25, 2012
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Photoresist removal
- Patent number 8,236,485
- Issue date Aug 7, 2012
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Composition useful for removal of post-etch photoresist and bottom...
- Patent number 7,994,108
- Issue date Aug 9, 2011
- Advanced Technology Materials, Inc.
- David W. Minsek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Oxidizing aqueous cleaner for the removal of post-etch residues
- Patent number 7,922,824
- Issue date Apr 12, 2011
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Treatment of semiconductor substrates using long-chain organothiols...
- Patent number 7,326,673
- Issue date Feb 5, 2008
- Advanced Technology Materials, Inc.
- Chongying Xu
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Compositions and methods for high-efficiency cleaning/polishing of...
- Patent number 7,119,052
- Issue date Oct 10, 2006
- Advanced Technology Materials, Inc.
- Michael B. Korzenski
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Composition and process for wet stripping removal of sacrificial an...
- Patent number 6,849,200
- Issue date Feb 1, 2005
- Advanced Technology Materials, Inc.
- Thomas H. Baum
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Deep-UV anti-reflective resist compositions
- Patent number 6,824,952
- Issue date Nov 30, 2004
- MicroChem Corp.
- David W. Minsek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
pH buffered compositions useful for cleaning residue from semicondu...
- Patent number 6,773,873
- Issue date Aug 10, 2004
- Advanced Technology Materials, Inc.
- Ma. Fatima Seijo
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Grant
Epoxy photoresist composition with improved cracking resistance
- Patent number 6,716,568
- Issue date Apr 6, 2004
- MicroChem Corp.
- David W. Minsek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
PHOTORESIST REMOVAL
- Publication number 20160152926
- Publication date Jun 2, 2016
- Advanced Technology Materials, Inc.
- David W. Minsek
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Electroplating of Metals on Conductive Oxide Substrates
- Publication number 20150259816
- Publication date Sep 17, 2015
- MACDERMID ACUMEN, INC.
- David W. Minsek
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Application
METAL AND DIELECTRIC COMPATIBLE SACRIFICIAL ANTI-REFLECTIVE COATING...
- Publication number 20150094248
- Publication date Apr 2, 2015
- Entegris, Inc.
- Melissa K. RATH
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES
- Publication number 20150000697
- Publication date Jan 1, 2015
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST REMOVAL
- Publication number 20140213498
- Publication date Jul 31, 2014
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION AND PROCESS FOR POST-ETCH REMOVAL OF PHOTORESIST AND/OR...
- Publication number 20130109605
- Publication date May 2, 2013
- Advanced Technology Materials, Inc.
- Melissa K. Rath
- C11 - ANIMAL AND VEGETABLE OILS, FATS, FATTY SUBSTANCES AND WAXES FATTY ACIDS...
Information Patent Application
Light Induced Plating of Metals on Silicon Photovoltaic Cells
- Publication number 20130078754
- Publication date Mar 28, 2013
- MACDERMID ACUMEN, INC.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHOTORESIST REMOVAL
- Publication number 20120302483
- Publication date Nov 29, 2012
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Light Induced Plating of Metals on Silicon Photovoltaic Cells
- Publication number 20110275175
- Publication date Nov 10, 2011
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES
- Publication number 20110186086
- Publication date Aug 4, 2011
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-SELECTIVE OXIDE ETCH WET CLEAN COMPOSITION AND METHOD OF USE
- Publication number 20110117751
- Publication date May 19, 2011
- Advanced Technology Materials, Inc.
- Prerna Sonthalia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Light Induced Electroless Plating
- Publication number 20110052835
- Publication date Mar 3, 2011
- DAVID MINSEK
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
LIQUID CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES
- Publication number 20100163788
- Publication date Jul 1, 2010
- Advanced Technology Materials, Inc.
- Pamela Visintin
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
METHODS FOR STRIPPING MATERIAL FOR WAFER RECLAMATION
- Publication number 20100112728
- Publication date May 6, 2010
- Advanced Technology Materials, Inc.
- Michael B. Korzenski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES
- Publication number 20090215658
- Publication date Aug 27, 2009
- Advanced Technology Materials, Inc.
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COMPOSITION USEFUL FOR REMOVAL OF POST-ETCH PHOTORESIST AND BOTTOM...
- Publication number 20090215659
- Publication date Aug 27, 2009
- Advanced Technology Materials Inc.
- David W. Minsek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DENSE FLUID COMPOSITIONS FOR REMOVAL OF HARDENED PHOTORESIST, POST-...
- Publication number 20090192065
- Publication date Jul 30, 2009
- Advanced Technology Materials, Inc.
- Michael B. Korzenski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
COMPOSITION AND METHOD FOR SELECTIVELY ETCHING GATE SPACER OXIDE MA...
- Publication number 20090032766
- Publication date Feb 5, 2009
- Advanced Technology Materials, Inc.
- Martha M. Rajaratnam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Metal and Dielectric Compatible Sacrificial Anti-Reflective Coating...
- Publication number 20080242574
- Publication date Oct 2, 2008
- Advanced Technology Materials, Inc.
- Melissa K. Rath
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
SUPERCRITICAL FLUID CLEANING OF SEMICONDUCTOR SUBSTRATES
- Publication number 20080058238
- Publication date Mar 6, 2008
- Advanced Technology Materials, Inc.
- Chongying Xu
- B08 - CLEANING
Information Patent Application
Composition useful for removal of post-etch photoresist and bottom...
- Publication number 20060154186
- Publication date Jul 13, 2006
- Advanced Technology Materials, Inc.
- David W. Minsek
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compositions and methods for high-efficiency cleaning of semiconduc...
- Publication number 20060122085
- Publication date Jun 8, 2006
- Michael B. Korzenski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Composition and process for ashless removal of post-etch photoresis...
- Publication number 20060063687
- Publication date Mar 23, 2006
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition and process for post-etch removal of photoresist and/or...
- Publication number 20050197265
- Publication date Sep 8, 2005
- Melissa K. Rath
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Compositions and methods for high-efficiency cleaning/polishing of...
- Publication number 20040266635
- Publication date Dec 30, 2004
- Michael B. Korzenski
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Photoresist removal
- Publication number 20040180300
- Publication date Sep 16, 2004
- David W. Minsek
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Composition and process for wet stripping removal of sacrificial an...
- Publication number 20040016904
- Publication date Jan 29, 2004
- Thomas H. Baum
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
pH buffered compositions useful for cleaning residue from semicondu...
- Publication number 20030181342
- Publication date Sep 25, 2003
- Ma. Fatima Seijo
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Supercritical fluid cleaning of semiconductor substrates
- Publication number 20030125225
- Publication date Jul 3, 2003
- Chongying Xu
- B08 - CLEANING

David W. Minsek

Person

Patents Grantslast 30 patents

Oxidizing aqueous cleaner for the removal of post-etch residues

Metal and dielectric compatible sacrificial anti-reflective coating...

Photoresist removal

Light induced plating of metals on silicon photovoltaic cells

Metal and dielectric compatible sacrificial anti-reflective coating...

Oxidizing aqueous cleaner for the removal of post-etch residues

Light induced electroless plating

Photoresist removal

Composition and process for post-etch removal of photoresist and/or...

Light induced plating of metals on silicon photovoltaic cells

Photoresist removal

Composition useful for removal of post-etch photoresist and bottom...

Oxidizing aqueous cleaner for the removal of post-etch residues

Treatment of semiconductor substrates using long-chain organothiols...

Compositions and methods for high-efficiency cleaning/polishing of...

Composition and process for wet stripping removal of sacrificial an...

Deep-UV anti-reflective resist compositions

pH buffered compositions useful for cleaning residue from semicondu...

Epoxy photoresist composition with improved cracking resistance

Patents Applicationslast 30 patents

PHOTORESIST REMOVAL

Electroplating of Metals on Conductive Oxide Substrates

METAL AND DIELECTRIC COMPATIBLE SACRIFICIAL ANTI-REFLECTIVE COATING...

OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES

PHOTORESIST REMOVAL

COMPOSITION AND PROCESS FOR POST-ETCH REMOVAL OF PHOTORESIST AND/OR...

Light Induced Plating of Metals on Silicon Photovoltaic Cells

PHOTORESIST REMOVAL

Light Induced Plating of Metals on Silicon Photovoltaic Cells

OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES

NON-SELECTIVE OXIDE ETCH WET CLEAN COMPOSITION AND METHOD OF USE

Light Induced Electroless Plating

LIQUID CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES

METHODS FOR STRIPPING MATERIAL FOR WAFER RECLAMATION

OXIDIZING AQUEOUS CLEANER FOR THE REMOVAL OF POST-ETCH RESIDUES

COMPOSITION USEFUL FOR REMOVAL OF POST-ETCH PHOTORESIST AND BOTTOM...

DENSE FLUID COMPOSITIONS FOR REMOVAL OF HARDENED PHOTORESIST, POST-...

COMPOSITION AND METHOD FOR SELECTIVELY ETCHING GATE SPACER OXIDE MA...

Metal and Dielectric Compatible Sacrificial Anti-Reflective Coating...

SUPERCRITICAL FLUID CLEANING OF SEMICONDUCTOR SUBSTRATES

Composition useful for removal of post-etch photoresist and bottom...

Compositions and methods for high-efficiency cleaning of semiconduc...

Composition and process for ashless removal of post-etch photoresis...

Composition and process for post-etch removal of photoresist and/or...

Compositions and methods for high-efficiency cleaning/polishing of...

Photoresist removal

Composition and process for wet stripping removal of sacrificial an...

pH buffered compositions useful for cleaning residue from semicondu...

Supercritical fluid cleaning of semiconductor substrates