De-Fang Chen

Person

Hsin-Chu City, TW

People

Patents Grantslast 30 patents

Information Patent Grant
Semiconductor devices with modified source/drain feature and method...
- Patent number 12,080,800
- Issue date Sep 3, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Wei-Jen Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 12,027,370
- Issue date Jul 2, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical device having a protrusion source
- Patent number 11,916,131
- Issue date Feb 27, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- De-Fang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improved critical dimension uniformity in a semiconducto...
- Patent number 11,901,188
- Issue date Feb 13, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chi-Cheng Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Structure and formation method of semiconductor device with nanoshe...
- Patent number 11,855,167
- Issue date Dec 26, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Po-Cheng Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and manufacturing method thereof
- Patent number 11,742,353
- Issue date Aug 29, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd
- Kuo-Pi Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 11,462,408
- Issue date Oct 4, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for improved critical dimension uniformity in a semiconducto...
- Patent number 11,289,338
- Issue date Mar 29, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming isolation layer
- Patent number 11,227,788
- Issue date Jan 18, 2022
- Taiwan Semiconductor Manufacturing Co., Ltd
- Teng-Chun Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device with multiple threshold voltage and method of...
- Patent number 11,056,486
- Issue date Jul 6, 2021
- Taiwan Semiconductor Manufacturing Co., Ltd
- Li-Ting Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned nanowire formation using double patterning
- Patent number 10,879,129
- Issue date Dec 29, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical device having a protrusion structure
- Patent number 10,854,728
- Issue date Dec 1, 2020
- Taiwan Semiconductor Manufacturing Company Limited
- De-Fang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for improved critical dimension uniformity in a semiconduct...
- Patent number 10,714,357
- Issue date Jul 14, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming isolation layer
- Patent number 10,707,114
- Issue date Jul 7, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd
- Teng-Chun Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 10,665,457
- Issue date May 26, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned nanowire formation using double patterning
- Patent number 10,504,792
- Issue date Dec 10, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertical device having a protrusion source
- Patent number 10,505,014
- Issue date Dec 10, 2019
- Taiwan Semiconductor Manufacturing Company Limited
- De-Fang Chen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of forming isolation layer
- Patent number 10,418,271
- Issue date Sep 17, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Teng-Chun Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Semiconductor device and method of forming vertical structure
- Patent number 10,325,994
- Issue date Jun 18, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tang Peng
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic technique incorporating varied pattern materials
- Patent number 10,312,109
- Issue date Jun 4, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd
- Chin-Yuan Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device with multiple threshold voltage and method of...
- Patent number 10,276,562
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd
- Li-Ting Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Gate structure
- Patent number 10,276,725
- Issue date Apr 30, 2019
- Taiwan Semiconductor Manufacturing Company Limited
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Self-aligned nanowire formation using double patterning
- Patent number 10,163,723
- Issue date Dec 25, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for improved critical dimension uniformity in a semiconduct...
- Patent number 10,032,639
- Issue date Jul 24, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Methods for fabricating vertical-gate-all-around transistor structures
- Patent number 10,026,658
- Issue date Jul 17, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- Teng-Chun Tsai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Lithographic technique incorporating varied pattern materials
- Patent number 9,991,132
- Issue date Jun 5, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chin-Yuan Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of making a silicide beneath a vertical structure
- Patent number 9,966,448
- Issue date May 8, 2018
- Taiwan Semiconductor Manufacturing Company Limited
- Cheng-Tung Lin
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor device and method of forming vertical structure
- Patent number 9,954,069
- Issue date Apr 24, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Chih-Tang Peng
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Tunnel field-effect transistor
- Patent number 9,941,394
- Issue date Apr 10, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd
- Teng-Chun Tsai
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method of forming an integrated circuit using a patterned mask layer
- Patent number 9,934,971
- Issue date Apr 3, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
SEMICONDUCTOR DEVICES WITH MODIFIED SOURCE/DRAIN FEATURE AND METHOD...
- Publication number 20240372005
- Publication date Nov 7, 2024
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Jen Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming a Vertical Device
- Publication number 20240186400
- Publication date Jun 6, 2024
- Taiwan Semiconductor Manufacturing Company Limited
- DE-FANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20230361122
- Publication date Nov 9, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Pi TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH NANOSHE...
- Publication number 20230010717
- Publication date Jan 12, 2023
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Po-Cheng WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method Of Forming An Integrated Circuit Priority Claim
- Publication number 20220375752
- Publication date Nov 24, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yen HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF
- Publication number 20220336457
- Publication date Oct 20, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Kuo-Pi TSENG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Semiconductor Devices With Modified Source/Drain Feature And Method...
- Publication number 20220285561
- Publication date Sep 8, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Wei-Jen Lai
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Improved Critical Dimension Uniformity in a Semiconducto...
- Publication number 20220223428
- Publication date Jul 14, 2022
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A VERTICAL DEVICE
- Publication number 20210050430
- Publication date Feb 18, 2021
- Taiwan Semiconductor Manufacturing Company Limited
- DE-FANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method for Improved Critical Dimension Uniformity in a Semiconducto...
- Publication number 20200343097
- Publication date Oct 29, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD OF FORMING ISOLATION LAYER
- Publication number 20200335388
- Publication date Oct 22, 2020
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Teng-Chun TSAI
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of Forming an Integrated Circuit
- Publication number 20200312663
- Publication date Oct 1, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yen Hsieh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A VERTICAL DEVICE
- Publication number 20200111887
- Publication date Apr 9, 2020
- Taiwan Semiconductor Manufacturing Company Limited
- DE-FANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned Nanowire Formation Using Double Patterning
- Publication number 20200083110
- Publication date Mar 12, 2020
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE WITH MULTIPLE THRESHOLD VOLTAGE AND METHOD OF...
- Publication number 20190229118
- Publication date Jul 25, 2019
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Li-Ting WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned Nanowire Formation Using Double Patterning
- Publication number 20190122936
- Publication date Apr 25, 2019
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING ISOLATION LAYER
- Publication number 20180350655
- Publication date Dec 6, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Teng-Chun TSAI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods for Improved Critical Dimension Uniformity in a Semiconduct...
- Publication number 20180330960
- Publication date Nov 15, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
Lithographic Technique Incorporating Varied Pattern Materials
- Publication number 20180286698
- Publication date Oct 4, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chin-Yuan Tseng
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR DEVICE AND METHOD OF FORMING VERTICAL STRUCTURE
- Publication number 20180240882
- Publication date Aug 23, 2018
- Taiwan Semiconductor Manufacturing Co., Ltd.
- Chih-Tang PENG
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method of Forming an Integrated Circuit
- Publication number 20180218904
- Publication date Aug 2, 2018
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yen HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nano Wire Structure and Method for Fabricating the Same
- Publication number 20170365524
- Publication date Dec 21, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR IMPROVED CRITICAL DIMENSION UNIFORMITY IN A SEMICONDUCT...
- Publication number 20170345670
- Publication date Nov 30, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Chi-Cheng Hung
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of Forming an Integrated Circuit
- Publication number 20170236712
- Publication date Aug 17, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Tzu-Yen HSIEH
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Self-Aligned Nanowire Formation Using Double Patterning
- Publication number 20170229349
- Publication date Aug 10, 2017
- Taiwan Semiconductor Manufacturing Company,Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF FORMING A VERTICAL DEVICE
- Publication number 20170200804
- Publication date Jul 13, 2017
- Taiwan Semiconductor Manufacturing Company Limited
- DE-FANG CHEN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Gate Structure
- Publication number 20170162720
- Publication date Jun 8, 2017
- Taiwan Semiconductor Manufacturing Company Limited
- CHING-FENG FU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Vertical Structure and Method of Forming Semiconductor Device
- Publication number 20170154807
- Publication date Jun 1, 2017
- Taiwan Semiconductor Manufacturing Company Limited
- CHENG-TUNG LIN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nano Wire Structure and Method for Fabricating the Same
- Publication number 20170154824
- Publication date Jun 1, 2017
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Nano Wire Structure and Method for Fabricating the Same
- Publication number 20160343620
- Publication date Nov 24, 2016
- Taiwan Semiconductor Manufacturing Company, Ltd.
- Ching-Feng Fu
- H01 - BASIC ELECTRIC ELEMENTS

De-Fang Chen

Person

Patents Grantslast 30 patents

Semiconductor devices with modified source/drain feature and method...

Method of forming an integrated circuit using a patterned mask layer

Vertical device having a protrusion source

Method for improved critical dimension uniformity in a semiconducto...

Structure and formation method of semiconductor device with nanoshe...

Semiconductor device and manufacturing method thereof

Method of forming an integrated circuit using a patterned mask layer

Method for improved critical dimension uniformity in a semiconducto...

Method of forming isolation layer

Semiconductor device with multiple threshold voltage and method of...

Self-aligned nanowire formation using double patterning

Vertical device having a protrusion structure

Methods for improved critical dimension uniformity in a semiconduct...

Method of forming isolation layer

Method of forming an integrated circuit using a patterned mask layer

Self-aligned nanowire formation using double patterning

Vertical device having a protrusion source

Method of forming isolation layer

Semiconductor device and method of forming vertical structure

Lithographic technique incorporating varied pattern materials

Semiconductor device with multiple threshold voltage and method of...

Gate structure

Self-aligned nanowire formation using double patterning

Methods for improved critical dimension uniformity in a semiconduct...

Methods for fabricating vertical-gate-all-around transistor structures

Lithographic technique incorporating varied pattern materials

Method of making a silicide beneath a vertical structure

Semiconductor device and method of forming vertical structure

Tunnel field-effect transistor

Method of forming an integrated circuit using a patterned mask layer

Patents Applicationslast 30 patents

SEMICONDUCTOR DEVICES WITH MODIFIED SOURCE/DRAIN FEATURE AND METHOD...

Method of Forming a Vertical Device

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

STRUCTURE AND FORMATION METHOD OF SEMICONDUCTOR DEVICE WITH NANOSHE...

Method Of Forming An Integrated Circuit Priority Claim

SEMICONDUCTOR DEVICE AND MANUFACTURING METHOD THEREOF

Semiconductor Devices With Modified Source/Drain Feature And Method...

Method for Improved Critical Dimension Uniformity in a Semiconducto...

METHOD OF FORMING A VERTICAL DEVICE

Method for Improved Critical Dimension Uniformity in a Semiconducto...

METHOD OF FORMING ISOLATION LAYER

Method of Forming an Integrated Circuit

METHOD OF FORMING A VERTICAL DEVICE

Self-Aligned Nanowire Formation Using Double Patterning

SEMICONDUCTOR DEVICE WITH MULTIPLE THRESHOLD VOLTAGE AND METHOD OF...

Self-Aligned Nanowire Formation Using Double Patterning

METHOD OF FORMING ISOLATION LAYER

Methods for Improved Critical Dimension Uniformity in a Semiconduct...

Lithographic Technique Incorporating Varied Pattern Materials

SEMICONDUCTOR DEVICE AND METHOD OF FORMING VERTICAL STRUCTURE

Method of Forming an Integrated Circuit

Nano Wire Structure and Method for Fabricating the Same

METHODS FOR IMPROVED CRITICAL DIMENSION UNIFORMITY IN A SEMICONDUCT...

Method of Forming an Integrated Circuit

Self-Aligned Nanowire Formation Using Double Patterning

METHOD OF FORMING A VERTICAL DEVICE

Gate Structure

Vertical Structure and Method of Forming Semiconductor Device

Nano Wire Structure and Method for Fabricating the Same

Nano Wire Structure and Method for Fabricating the Same