Dean G. Scott

Person

Mesa, AZ, US

People

Patents Grantslast 30 patents

Information Patent Grant
Methods of measuring electrical characteristics during plasma etching
- Patent number 10,453,697
- Issue date Oct 22, 2019
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods of measuring electrical characteristics during plasma etching
- Patent number 10,083,838
- Issue date Sep 25, 2018
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for shielding a plasma etcher electrode
- Patent number 9,905,484
- Issue date Feb 27, 2018
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods for etching through-wafer vias in a wafer
- Patent number 9,711,364
- Issue date Jul 18, 2017
- Skyworks Solutions, Inc.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for shielding a plasma etcher electrode
- Patent number 9,478,428
- Issue date Oct 25, 2016
- Skyworks Solutions, Inc.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for electrical measurements in a plasma etcher
- Patent number 8,357,263
- Issue date Jan 22, 2013
- Skyworks Solutions, Inc.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING
- Publication number 20190057875
- Publication date Feb 21, 2019
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING
- Publication number 20180061651
- Publication date Mar 1, 2018
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE
- Publication number 20160315021
- Publication date Oct 27, 2016
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING THROUGH-WAFER VIAS IN A WAFER
- Publication number 20140191415
- Publication date Jul 10, 2014
- SKYWORKS SOLUTIONS, INC.
- Daniel Kwadwo Amponsah Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR FOCUSING PLASMA
- Publication number 20120083129
- Publication date Apr 5, 2012
- SKYWORKS SOLUTIONS, INC.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR ELECTRICAL MEASUREMENTS IN A PLASMA ETCHER
- Publication number 20120083051
- Publication date Apr 5, 2012
- SKYWORKS SOLUTIONS, INC.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE
- Publication number 20120083130
- Publication date Apr 5, 2012
- SKYWORKS SOLUTIONS, INC.
- Daniel K. Berkoh
- H01 - BASIC ELECTRIC ELEMENTS

Dean G. Scott

Person

Patents Grantslast 30 patents

Methods of measuring electrical characteristics during plasma etching

Methods of measuring electrical characteristics during plasma etching

Methods for shielding a plasma etcher electrode

Methods for etching through-wafer vias in a wafer

Apparatus and methods for shielding a plasma etcher electrode

Apparatus and methods for electrical measurements in a plasma etcher

Patents Applicationslast 30 patents

METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING

METHODS OF MEASURING ELECTRICAL CHARACTERISTICS DURING PLASMA ETCHING

METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE

METHODS FOR ETCHING THROUGH-WAFER VIAS IN A WAFER

APPARATUS AND METHODS FOR FOCUSING PLASMA

APPARATUS AND METHODS FOR ELECTRICAL MEASUREMENTS IN A PLASMA ETCHER

APPARATUS AND METHODS FOR SHIELDING A PLASMA ETCHER ELECTRODE