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Debra Fenzel-Alexander

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  • San Jose, CA, US
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Patents Grantslast 30 patents

  • Information Patent Grant

    Fluorinated silsesquioxane polymers and use thereof in lithographic...
    • Patent number 7,550,254
    • Issue date Jun 23, 2009
    • International Business Machines Corporation
    • Ratnam Sooriyakumaran
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Fluorinated silsesquioxane polymers and use thereof in lithographic...
    • Patent number 7,261,992
    • Issue date Aug 28, 2007
    • International Business Machines Corporation
    • Ratnam Sooriyakumaran
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Grant

    Photoresist composition
    • Patent number 7,135,595
    • Issue date Nov 14, 2006
    • International Business Machines Corporation
    • Robert David Allen
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Photoresist composition
    • Patent number 7,014,980
    • Issue date Mar 21, 2006
    • International Business Machines Corporation
    • Robert David Allen
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Grant

    Photoresist composition
    • Patent number 6,806,026
    • Issue date Oct 19, 2004
    • International Business Machines Corporation
    • Robert David Allen
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

  • Information Patent Application

    Fluorinated silsesquioxane polymers and use thereof in lithographic...
    • Publication number 20070202440
    • Publication date Aug 30, 2007
    • International Business Machines Corporation
    • Ratnam Sooriyakumaran
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    photoresist composition
    • Publication number 20060128914
    • Publication date Jun 15, 2006
    • International Business Machines Corporation
    • Robert David Allen
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Photoresist composition
    • Publication number 20050019696
    • Publication date Jan 27, 2005
    • International Business Machines Corporation
    • Robert David Allen
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Photoresist composition
    • Publication number 20030224283
    • Publication date Dec 4, 2003
    • International Business Machines Corporation
    • Robert David Allen
    • C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
  • Information Patent Application

    Substantially transparent aqueous base soluble polymer system for u...
    • Publication number 20020090572
    • Publication date Jul 11, 2002
    • Ratnam Sooriyakumaran
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
  • Information Patent Application

    Substantially transparent aqueous base soluble polymer system for u...
    • Publication number 20020081520
    • Publication date Jun 27, 2002
    • Ratnam Sooriyakumaran
    • G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY