Declan Scanlan

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Sunnyvale, CA, US

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Patents Grantslast 30 patents

Information Patent Grant
Apparatus for etching high aspect ratio features
- Patent number 8,475,625
- Issue date Jul 2, 2013
- Applied Materials, Inc.
- Sharma Pamarthy
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES
- Publication number 20100099266
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Manfred Oswald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR ETCHING HIGH ASPECT RATIO FEATURES
- Publication number 20070256785
- Publication date Nov 8, 2007
- Sharma Pamarthy
- H01 - BASIC ELECTRIC ELEMENTS