Dee Wu

Person

Shanghai, CN

People

Patents Grantslast 30 patents

Information Patent Grant
Bottom electrode assembly, plasma processing apparatus, and method...
- Patent number 12,094,693
- Issue date Sep 17, 2024
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Jiangtao Pei
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Uniform pumping dual-station vacuum processor
- Patent number 11,387,084
- Issue date Jul 12, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Yuejun Gong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma reactor and heating apparatus therefor
- Patent number 11,363,680
- Issue date Jun 14, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Corrosion-resistant structure for a gas delivery system in a plasma...
- Patent number 11,348,763
- Issue date May 31, 2022
- ADVANCED MICRO-FABRICATION EQUIPMENT INC. CHINA
- Zengdi Lian
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BOTTOM ELECTRODE ASSEMBLY, PLASMA PROCESSING APPARATUS, AND METHOD...
- Publication number 20220165551
- Publication date May 26, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Jiangtao PEI
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA PROCESSING APPARATUS AND METHOD OF ADJUSTING THE SAME
- Publication number 20220157570
- Publication date May 19, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Mingming WANG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL METHOD FOR MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL IN...
- Publication number 20220005677
- Publication date Jan 6, 2022
- Advanced Micro-Fabrication Equipment Inc. China
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...
- Publication number 20210118716
- Publication date Apr 22, 2021
- Advanced Micro-Fabrication Equipment Inc. China
- Rubin YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORROSION-RESISTANT STRUCTURE FOR A GAS DELIVERY SYSTEM IN A PLASMA...
- Publication number 20200381213
- Publication date Dec 3, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Zengdi LIAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Plasma Reactor and Heating Apparatus Therefor
- Publication number 20200214087
- Publication date Jul 2, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Temperature Control Apparatus for Semiconductor Processing Equipmen...
- Publication number 20200211873
- Publication date Jul 2, 2020
- Advanced Micro-Fabrication Equipment Inc. China
- Kui Zhao
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
UNIFORM PUMPING DUAL-STATION VACUUM PROCESSOR
- Publication number 20190139745
- Publication date May 9, 2019
- Advanced Micro-Fabrication Equipment Inc, China
- Yuejun GONG
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ELECTRODE STRUCTURE FOR ICP ETCHER
- Publication number 20170186585
- Publication date Jun 29, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Rason Zuo
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE...
- Publication number 20170186592
- Publication date Jun 29, 2017
- ADVANCED MICRO-FABRICATION EQUIPMENT INC, SHANGHAI
- Tuqiang Ni
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Bottom electrode assembly, plasma processing apparatus, and method...

Uniform pumping dual-station vacuum processor

Plasma reactor and heating apparatus therefor

Corrosion-resistant structure for a gas delivery system in a plasma...

Patents Applicationslast 30 patents

BOTTOM ELECTRODE ASSEMBLY, PLASMA PROCESSING APPARATUS, AND METHOD...

PLASMA PROCESSING APPARATUS AND METHOD OF ADJUSTING THE SAME

CONTROL METHOD FOR MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL IN...

ELECTROSTATIC CHUCK, METHOD OF MANUFACTURING ELECTROSTATIC CHUCK, A...

CORROSION-RESISTANT STRUCTURE FOR A GAS DELIVERY SYSTEM IN A PLASMA...

Plasma Reactor and Heating Apparatus Therefor

Temperature Control Apparatus for Semiconductor Processing Equipmen...

UNIFORM PUMPING DUAL-STATION VACUUM PROCESSOR

ELECTRODE STRUCTURE FOR ICP ETCHER

MULTI-ZONE ACTIVE-MATRIX TEMPERATURE CONTROL SYSTEM AND TEMPERATURE...