Deepak Vedhachalam

Follow

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Controlling dry etch process characteristics using waferless dry cl...
- Patent number 11,273,469
- Issue date Mar 15, 2022
- Tokyo Electron Limited
- Brian J. Coppa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Controlling dry etch process characteristics using waferless dry cl...
- Patent number 10,773,282
- Issue date Sep 15, 2020
- Tokyo Electron Limited
- Brian J. Coppa
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Compositional optical emission spectroscopy for detection of partic...
- Patent number 10,436,717
- Issue date Oct 8, 2019
- Tokyo Electron Limited
- Thomas Omstead
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CL...
- Publication number 20200406315
- Publication date Dec 31, 2020
- TOKYO ELECTRON LIMITED
- Brian J. Coppa
- B08 - CLEANING
Information Patent Application
COMPOSITIONAL OPTICAL EMISSION SPECTROSCOPY FOR DETECTION OF PARTIC...
- Publication number 20180143141
- Publication date May 24, 2018
- TOKYO ELECTRON LIMITED
- Thomas Omstead
- G01 - MEASURING TESTING
Information Patent Application
CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CL...
- Publication number 20170287791
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Brian J. Coppa
- B08 - CLEANING
Information Patent Application
CONTROLLING DRY ETCH PROCESS CHARACTERISTICS USING WAFERLESS DRY CL...
- Publication number 20170282223
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Brian J. Coppa
- B08 - CLEANING