Denis Glushkov

Person

Alfter, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Source collector apparatus, lithographic apparatus and method
- Patent number 9,964,852
- Issue date May 8, 2018
- ASML Netherlands B.V.
- Niek Antonius Jacobus Maria Kleemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element comprising oriented carbon nanotube sheet and litho...
- Patent number 9,897,930
- Issue date Feb 20, 2018
- ASML Netherlands B.V.
- Leonid Aizikovitch Sjmaenok
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Source collector apparatus, lithographic apparatus and method
- Patent number 9,841,680
- Issue date Dec 12, 2017
- ASML Netherlands B.V.
- Niek Antonius Jacobus Maria Kleemans
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Multilayer mirror, method of producing a multilayer mirror and lith...
- Patent number 9,448,492
- Issue date Sep 20, 2016
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Lithographic apparatus
- Patent number 9,307,624
- Issue date Apr 5, 2016
- ASML Netherlands B.V.
- Denis Alexandrovich Glushkov
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Grant
EUV multilayer mirror with interlayer and lithographic apparatus us...
- Patent number 9,082,521
- Issue date Jul 14, 2015
- ASML Netherlands B.V.
- Denis Alexandrovich Glushkov
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Imprint lithography
- Patent number 8,454,849
- Issue date Jun 4, 2013
- ASML Netherlands B.V.
- Sander Frederik Wuister
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20180120711
- Publication date May 3, 2018
- ASML NETHERLANDS B.V.
- Niek Antonius Jacobus Maria KLEEMANS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD
- Publication number 20160054663
- Publication date Feb 25, 2016
- ASML NETHERLANDS B.V.
- Niek Antonius Jacobus Maria KLEEMANS
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...
- Publication number 20140198306
- Publication date Jul 17, 2014
- ASML NETHERLANDS B.V.
- Andrei Mikhailovich Yakunin
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV Radiation Source and EUV Radiation Generation Method
- Publication number 20130015373
- Publication date Jan 17, 2013
- ASML Netherlands B.V.
- Andrei Mikhailovich Yakunin
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANU...
- Publication number 20120147350
- Publication date Jun 14, 2012
- ASML NETHERLANDS B.V.
- Andrei Yakunin
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
- Publication number 20110292366
- Publication date Dec 1, 2011
- ASML Netherlands B.V.
- Denis Alexandrovich Glushkov
- G02 - OPTICS
Information Patent Application
IMPRINT LITHOGRAPHY
- Publication number 20110226735
- Publication date Sep 22, 2011
- ASML NETHERLANDS B.V.
- Sander Frederik Wuister
- B82 - NANO-TECHNOLOGY
Information Patent Application
MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS
- Publication number 20110080573
- Publication date Apr 7, 2011
- ASML NETHERLANDS B.V.
- Denis Alexandrovich Glushkov
- B82 - NANO-TECHNOLOGY
Information Patent Application
TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVI...
- Publication number 20110043777
- Publication date Feb 24, 2011
- ASML NETHERLANDS B.V.
- Vladimir Mihailovitc Krivtsun
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANU...
- Publication number 20100328639
- Publication date Dec 30, 2010
- ASML NETHERLANDS B.V.
- Martin Jacobus Johan Jak
- G02 - OPTICS
Information Patent Application
RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS
- Publication number 20100141909
- Publication date Jun 10, 2010
- ASML NETHERLANDS B.V.
- Arnoud Cornelis Wassink
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
LITHOGRAPHIC APPARATUS
- Publication number 20100002211
- Publication date Jan 7, 2010
- ASML NETHERLANDS B.V.
- Denis GLUSHKOV
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR

Denis Glushkov

Person

Patents Grantslast 30 patents

Source collector apparatus, lithographic apparatus and method

Optical element comprising oriented carbon nanotube sheet and litho...

Source collector apparatus, lithographic apparatus and method

Multilayer mirror, method of producing a multilayer mirror and lith...

Lithographic apparatus

EUV multilayer mirror with interlayer and lithographic apparatus us...

Imprint lithography

Patents Applicationslast 30 patents

SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD

SOURCE COLLECTOR APPARATUS, LITHOGRAPHIC APPARATUS AND METHOD

MULTILAYER MIRROR, METHOD OF PRODUCING A MULTILAYER MIRROR AND LITH...

EUV Radiation Source and EUV Radiation Generation Method

SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANU...

MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS

IMPRINT LITHOGRAPHY

MULTILAYER MIRROR AND LITHOGRAPHIC APPARATUS

TARGET MATERIAL, A SOURCE, AN EUV LITHOGRAPHIC APPARATUS AND A DEVI...

SPECTRAL PURITY FILTER, LITHOGRAPHIC APPARATUS, AND METHOD FOR MANU...

RADIATION SYSTEM AND LITHOGRAPHIC APPARATUS

LITHOGRAPHIC APPARATUS