Denis M. KOOSAU

Person

Pleasanton, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
High-temperature substrate support assembly with failure protection
- Patent number 12,185,433
- Issue date Dec 31, 2024
- Applied Materials, Inc.
- Denis Martin Koosau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration jig and calibration method
- Patent number 12,148,645
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 12,094,752
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Sensors and system for in-situ edge ring erosion monitor
- Patent number 12,009,236
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Yaoling Pan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Calibration jig and calibration method
- Patent number 11,935,773
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Andrew Myles
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit ring adaptor
- Patent number 11,842,917
- Issue date Dec 12, 2023
- Applied Materials, Inc.
- Leon Volfovski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for controlling edge ring variation
- Patent number 11,668,553
- Issue date Jun 6, 2023
- Applied Materials Inc.
- Sathyendra Ghantasala
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Wafer edge ring lifting solution
- Patent number 11,393,710
- Issue date Jul 19, 2022
- Applied Materials, Inc.
- Michael R. Rice
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Movable and removable process kit
- Patent number 11,043,400
- Issue date Jun 22, 2021
- Applied Materials, Inc.
- Andreas Schmid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,991,556
- Issue date Apr 27, 2021
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process kit ring adaptor
- Patent number 10,964,584
- Issue date Mar 30, 2021
- Applied Materials, Inc.
- Leon Volfovski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cooling base with spiral channels for ESC
- Patent number 10,586,718
- Issue date Mar 10, 2020
- Applied Materials, Inc.
- Vladimir Knyazik
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,553,404
- Issue date Feb 4, 2020
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,504,702
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 10,103,010
- Issue date Oct 16, 2018
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Adjustable extended electrode for edge uniformity control
- Patent number 9,947,517
- Issue date Apr 17, 2018
- Applied Materials, Inc.
- Olivier Luere
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Polishing head zone boundary smoothing
- Patent number 9,050,699
- Issue date Jun 9, 2015
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Apparatus and method for temperature control during polishing
- Patent number 8,591,286
- Issue date Nov 26, 2013
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing head zone boundary smoothing
- Patent number 8,460,067
- Issue date Jun 11, 2013
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Grant
Method and apparatus for controlling temperature of a substrate
- Patent number 7,436,645
- Issue date Oct 14, 2008
- Applied Materials, Inc.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE
- Publication number 20250014878
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Andreas SCHMID
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20240429088
- Publication date Dec 26, 2024
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20240321610
- Publication date Sep 26, 2024
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION JIG AND CALIBRATION METHOD
- Publication number 20240178035
- Publication date May 30, 2024
- Applied Materials, Inc.
- Andrew MYLES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH-TEMPERATURE SUBSTRATE SUPPORT ASSEMBLY WITH FAILURE PROTECTION
- Publication number 20230380016
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Denis Martin Koosau
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
HIGH-TEMPERATURE SUBSTRATE SUPPORT ASSEMBLY WITH FAILURE PROTECTION
- Publication number 20230377930
- Publication date Nov 23, 2023
- Applied Materials, Inc.
- Denis Martin Koosau
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING EDGE RING VARIATION
- Publication number 20230280150
- Publication date Sep 7, 2023
- Applied Materials, Inc.
- Sathyendra GHANTASALA
- G01 - MEASURING TESTING
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20220319904
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CONTROLLING EDGE RING VARIATION
- Publication number 20210254957
- Publication date Aug 19, 2021
- Applied Materials, Inc.
- Sathyendra GHANTASALA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT RING ADAPTOR
- Publication number 20210217650
- Publication date Jul 15, 2021
- Applied Materials, Inc.
- Leon Volfovski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS KIT RING ADAPTOR
- Publication number 20200373194
- Publication date Nov 26, 2020
- Applied Materials, Inc.
- Leon Volfovski
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR
- Publication number 20200335368
- Publication date Oct 22, 2020
- Applied Materials, Inc.
- Yaoling PAN
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MOVABLE AND REMOVABLE PROCESS KIT
- Publication number 20200234981
- Publication date Jul 23, 2020
- Applied Materials, Inc.
- Andreas SCHMID
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20200118798
- Publication date Apr 16, 2020
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CALIBRATION JIG AND CALIBRATION METHOD
- Publication number 20190385880
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Andrew MYLES
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESSING WITH POWERED EDGE RING
- Publication number 20190228952
- Publication date Jul 25, 2019
- Applied Materials, Inc.
- Leonid DORF
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180315583
- Publication date Nov 1, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180233334
- Publication date Aug 16, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL
- Publication number 20180218933
- Publication date Aug 2, 2018
- Applied Materials, Inc.
- Olivier LUERE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER EDGE RING LIFTING SOLUTION
- Publication number 20170213758
- Publication date Jul 27, 2017
- Applied Materials, Inc.
- Michael R. RICE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COOLING BASE WITH SPIRAL CHANNELS FOR ESC
- Publication number 20170133244
- Publication date May 11, 2017
- Applied Materials, Inc.
- Vladimir KNYAZIK
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Application
Sensors in Carrier Head of a CMP System
- Publication number 20140020829
- Publication date Jan 23, 2014
- Applied Materials, Inc.
- Hung Chih Chen
- B24 - GRINDING POLISHING
Information Patent Application
APPARATUS AND METHOD FOR TEMPERATURE CONTROL DURING POLISHING
- Publication number 20120040592
- Publication date Feb 16, 2012
- Applied Materials, Inc.
- HUNG CHIH CHEN
- B24 - GRINDING POLISHING
Information Patent Application
SUBSTRATE HOLDER TO REDUCE SUBSTRATE EDGE STRESS DURING CHEMICAL ME...
- Publication number 20120021673
- Publication date Jan 26, 2012
- Applied Materials, Inc.
- HUNG CHIH CHEN
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING HEAD ZONE BOUNDARY SMOOTHING
- Publication number 20100291842
- Publication date Nov 18, 2010
- Applied Materials, Inc.
- HUNG CHIH CHEN
- B24 - GRINDING POLISHING
Information Patent Application
ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES
- Publication number 20100099266
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- Manfred Oswald
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING
- Publication number 20090014323
- Publication date Jan 15, 2009
- Boris Yendler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE
- Publication number 20070139856
- Publication date Jun 21, 2007
- APPLIED MATERIALS, INC.
- John Holland
- H01 - BASIC ELECTRIC ELEMENTS

Denis M. KOOSAU

Person

Patents Grantslast 30 patents

High-temperature substrate support assembly with failure protection

Calibration jig and calibration method

Wafer edge ring lifting solution

Sensors and system for in-situ edge ring erosion monitor

Calibration jig and calibration method

Process kit ring adaptor

Apparatus and method for controlling edge ring variation

Wafer edge ring lifting solution

Movable and removable process kit

Adjustable extended electrode for edge uniformity control

Process kit ring adaptor

Cooling base with spiral channels for ESC

Adjustable extended electrode for edge uniformity control

Adjustable extended electrode for edge uniformity control

Adjustable extended electrode for edge uniformity control

Adjustable extended electrode for edge uniformity control

Polishing head zone boundary smoothing

Apparatus and method for temperature control during polishing

Polishing head zone boundary smoothing

Method and apparatus for controlling temperature of a substrate

Patents Applicationslast 30 patents

WAFER EDGE PROFILE CONTROL USING CONNECTED EDGE RING HARDWARE

WAFER EDGE RING LIFTING SOLUTION

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

CALIBRATION JIG AND CALIBRATION METHOD

HIGH-TEMPERATURE SUBSTRATE SUPPORT ASSEMBLY WITH FAILURE PROTECTION

HIGH-TEMPERATURE SUBSTRATE SUPPORT ASSEMBLY WITH FAILURE PROTECTION

APPARATUS AND METHOD FOR CONTROLLING EDGE RING VARIATION

WAFER EDGE RING LIFTING SOLUTION

APPARATUS AND METHOD FOR CONTROLLING EDGE RING VARIATION

PROCESS KIT RING ADAPTOR

PROCESS KIT RING ADAPTOR

SENSORS AND SYSTEM FOR IN-SITU EDGE RING EROSION MONITOR

MOVABLE AND REMOVABLE PROCESS KIT

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

CALIBRATION JIG AND CALIBRATION METHOD

PROCESSING WITH POWERED EDGE RING

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

ADJUSTABLE EXTENDED ELECTRODE FOR EDGE UNIFORMITY CONTROL

WAFER EDGE RING LIFTING SOLUTION

COOLING BASE WITH SPIRAL CHANNELS FOR ESC

Sensors in Carrier Head of a CMP System

APPARATUS AND METHOD FOR TEMPERATURE CONTROL DURING POLISHING

SUBSTRATE HOLDER TO REDUCE SUBSTRATE EDGE STRESS DURING CHEMICAL ME...

POLISHING HEAD ZONE BOUNDARY SMOOTHING

ETCH REACTOR SUITABLE FOR ETCHING HIGH ASPECT RATIO FEATURES

HIGH TEMPERATURE CATHODE FOR PLASMA ETCHING

METHOD AND APPARATUS FOR CONTROLLING TEMPERATURE OF A SUBSTRATE