Denis Shaw

Person

Fort Collins, CO, US

People

Patents Grantslast 30 patents

Information Patent Grant
Synchronization of bias supplies
- Patent number 12,176,184
- Issue date Dec 24, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial control of plasma processing environments
- Patent number 12,159,767
- Issue date Dec 3, 2024
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma sheath with bias supplies
- Patent number 12,142,460
- Issue date Nov 12, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Match efficiency-variation compensation
- Patent number 12,009,181
- Issue date Jun 11, 2024
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,842,884
- Issue date Dec 12, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization between an excitation source and a substrate bias s...
- Patent number 11,610,761
- Issue date Mar 21, 2023
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,437,221
- Issue date Sep 6, 2022
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial monitoring and control of plasma processing environments
- Patent number 11,282,677
- Issue date Mar 22, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Application of modulating supplies in a plasma processing system
- Patent number 11,264,209
- Issue date Mar 1, 2022
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization between an excitation source and a substrate bias s...
- Patent number 10,896,807
- Issue date Jan 19, 2021
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Application of modulating supplies in a plasma processing system
- Patent number 10,811,227
- Issue date Oct 20, 2020
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Control of plasma processing systems that include plasma modulating...
- Patent number 10,811,228
- Issue date Oct 20, 2020
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronization with a bias supply in a plasma processing system
- Patent number 10,811,229
- Issue date Oct 20, 2020
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial and temporal control of ion bias voltage for plasma processing
- Patent number 10,707,055
- Issue date Jul 7, 2020
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Synchronized pulsing of plasma processing source and substrate bias
- Patent number 10,607,813
- Issue date Mar 31, 2020
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for frequency tuning in a RF generator
- Patent number 10,026,595
- Issue date Jul 17, 2018
- Advanced Energy Industries, Inc.
- Myeong Yeol Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for frequency tuning in a RF generator
- Patent number 9,748,076
- Issue date Aug 29, 2017
- Advanced Energy Industries, Inc.
- Myeong Yeol Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and apparatus for preventing the formation of a plasma-inhib...
- Patent number 7,942,112
- Issue date May 17, 2011
- Advanced Energy Industries, Inc.
- Fernando Gustavo Tomasel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Power supply for a hot-filament cathode
- Patent number 6,911,789
- Issue date Jun 28, 2005
- Kaufman & Robinson, Inc.
- Steven J. Geissler
- H02 - GENERATION CONVERSION OR DISTRIBUTION OF ELECTRIC POWER
Information Patent Grant
Method of cleaning ion source, and corresponding apparatus/system
- Patent number 6,812,648
- Issue date Nov 2, 2004
- Guardian Industries Corp.
- Henry A. Luten
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...
- Publication number 20250183006
- Publication date Jun 5, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20250166970
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH NETWORK WITH SWITCHABLE VARIABLE CAPACITANCE
- Publication number 20250167748
- Publication date May 22, 2025
- Advanced Energy Industries, Inc.
- Denis Shaw
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
PLASMA BEHAVIORS PREDICTED BY CURRENT MEASUREMENTS DURING ASYMMETRI...
- Publication number 20250022698
- Publication date Jan 16, 2025
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS
- Publication number 20240079213
- Publication date Mar 7, 2024
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES
- Publication number 20230395354
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF BIAS SUPPLIES
- Publication number 20230395355
- Publication date Dec 7, 2023
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS
- Publication number 20230268162
- Publication date Aug 24, 2023
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20230116058
- Publication date Apr 13, 2023
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20220285131
- Publication date Sep 8, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MATCH EFFICIENCY-VARIATION COMPENSATION
- Publication number 20220181121
- Publication date Jun 9, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEMS AND METHODS COMBINING MATCH NETWORKS AND FREQUENCY TUNING
- Publication number 20220139674
- Publication date May 5, 2022
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210241996
- Publication date Aug 5, 2021
- Advanced Energy Industries, Inc.
- Daniel Carter
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...
- Publication number 20210134562
- Publication date May 6, 2021
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM
- Publication number 20210074513
- Publication date Mar 11, 2021
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS
- Publication number 20210005428
- Publication date Jan 7, 2021
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...
- Publication number 20200203128
- Publication date Jun 25, 2020
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SYNCHRONIZATION WITH A BIAS SUPPLY IN A PLASMA PROCESSING SYSTEM
- Publication number 20190172685
- Publication date Jun 6, 2019
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYNCHRONIZED PULSING OF PLASMA PROCESSING SOURCE AND SUBSTRATE BIAS
- Publication number 20190157040
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Kevin Fairbairn
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SPATIAL AND TEMPORAL CONTROL OF ION BIAS VOLTAGE FOR PLASMA PROCESSING
- Publication number 20190157043
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Denis Shaw
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM
- Publication number 20190157041
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONTROL OF PLASMA PROCESSING SYSTEMS THAT INCLUDE PLASMA MODULATING...
- Publication number 20190157042
- Publication date May 23, 2019
- Advanced Energy Industries, Inc.
- Gideon Van Zyl
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus for Frequency Tuning in a RF Generator
- Publication number 20170323771
- Publication date Nov 9, 2017
- Advanced Energy Industries, Inc.
- Myeong Yeol Choi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR PREVENTING THE FORMATION OF A PLASMA-INHIB...
- Publication number 20080127893
- Publication date Jun 5, 2008
- Fernando Gustavo Tomasel
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Power supply for a hot-filament cathode
- Publication number 20040183470
- Publication date Sep 23, 2004
- Steven J. Geissler
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Method of cleaning ion source, and corresponding apparatus/system
- Publication number 20040075060
- Publication date Apr 22, 2004
- Henry A. Luten
- H01 - BASIC ELECTRIC ELEMENTS

Person

Patents Grantslast 30 patents

Synchronization of bias supplies

Spatial control of plasma processing environments

Control of plasma sheath with bias supplies

Match efficiency-variation compensation

Spatial monitoring and control of plasma processing environments

Synchronization between an excitation source and a substrate bias s...

Spatial monitoring and control of plasma processing environments

Spatial monitoring and control of plasma processing environments

Application of modulating supplies in a plasma processing system

Synchronization between an excitation source and a substrate bias s...

Application of modulating supplies in a plasma processing system

Control of plasma processing systems that include plasma modulating...

Synchronization with a bias supply in a plasma processing system

Spatial and temporal control of ion bias voltage for plasma processing

Synchronized pulsing of plasma processing source and substrate bias

Apparatus for frequency tuning in a RF generator

Apparatus for frequency tuning in a RF generator

Method and apparatus for preventing the formation of a plasma-inhib...

Power supply for a hot-filament cathode

Method of cleaning ion source, and corresponding apparatus/system

Patents Applicationslast 30 patents

MATCH NETWORK WITH VARIABLE CAPACITANCE AND SWITCHABLE ARRAY OF SOL...

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

MATCH NETWORK WITH SWITCHABLE VARIABLE CAPACITANCE

PLASMA BEHAVIORS PREDICTED BY CURRENT MEASUREMENTS DURING ASYMMETRI...

SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS

CONTROL OF PLASMA SHEATH WITH BIAS SUPPLIES

SYNCHRONIZATION OF BIAS SUPPLIES

SYNCHRONIZATION OF PLASMA PROCESSING COMPONENTS

SPATIAL CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

MATCH EFFICIENCY-VARIATION COMPENSATION

SYSTEMS AND METHODS COMBINING MATCH NETWORKS AND FREQUENCY TUNING

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...

APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM

SPATIAL MONITORING AND CONTROL OF PLASMA PROCESSING ENVIRONMENTS

SYNCHRONIZATION BETWEEN AN EXCITATION SOURCE AND A SUBSTRATE BIAS S...

SYNCHRONIZATION WITH A BIAS SUPPLY IN A PLASMA PROCESSING SYSTEM

SYNCHRONIZED PULSING OF PLASMA PROCESSING SOURCE AND SUBSTRATE BIAS

SPATIAL AND TEMPORAL CONTROL OF ION BIAS VOLTAGE FOR PLASMA PROCESSING

APPLICATION OF MODULATING SUPPLIES IN A PLASMA PROCESSING SYSTEM

CONTROL OF PLASMA PROCESSING SYSTEMS THAT INCLUDE PLASMA MODULATING...

Apparatus for Frequency Tuning in a RF Generator

METHOD AND APPARATUS FOR PREVENTING THE FORMATION OF A PLASMA-INHIB...

Power supply for a hot-filament cathode

Method of cleaning ion source, and corresponding apparatus/system