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Gyeonggi, KR
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Patents Grants
last 30 patents
Information
Patent Grant
Isocyanurate compound for forming organic anti-reflective layer and...
Patent number
9,063,424
Issue date
Jun 23, 2015
Dongjin Semichem Co., Ltd.
Hyo-Jung Roh
B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information
Patent Grant
Polymer for forming resist protection film, composition for forming...
Patent number
8,551,684
Issue date
Oct 8, 2013
Dongjin Semichem Co., Ltd.
Jong Kyoung Park
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Method for forming fine pattern in semiconductor device
Patent number
8,293,458
Issue date
Oct 23, 2012
Dongjin Semichem Co., Ltd.
Jun-Gyeong Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive compound and photoresist composition including the same
Patent number
7,745,099
Issue date
Jun 29, 2010
Dongjin Semichem Co., Ltd.
Jung-Woo Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Monomer, polymer and composition for photoresist
Patent number
7,604,919
Issue date
Oct 20, 2009
Dongjin Semichem Co., Ltd.
Deog-Bae Kim
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Monomer having sulfonyl group, polymer thereof and photoresist comp...
Patent number
7,569,325
Issue date
Aug 4, 2009
Dongjin Semichem Co., Ltd.
Jung-Youl Lee
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Photosensitive polymer and photoresist composition
Patent number
7,504,195
Issue date
Mar 17, 2009
Dongjin Semichem Co., Ltd.
Deog-Bae Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer for forming anti-reflective coating layer
Patent number
7,465,531
Issue date
Dec 16, 2008
Dongjin Semichem Co., Ltd.
Sang-Jung Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist monomer having spiro cyclic ketal group, polymer thereo...
Patent number
7,419,761
Issue date
Sep 2, 2008
Dongjin Semichem Co., Ltd.
Jae-Woo Lee
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer for forming anti-reflective coating layer
Patent number
7,368,219
Issue date
May 6, 2008
Dongjin Semichem Co., Ltd.
Sang-Jung Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Chemically amplified polymer having pendant group with dicyclohexyl...
Patent number
7,344,820
Issue date
Mar 18, 2008
DongJin Semichem Co., Ltd.
Eun-Kyung Son
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer for forming anti-reflective coating layer
Patent number
7,309,561
Issue date
Dec 18, 2007
Dongjin Semichem Co., Ltd.
Sang-Jung Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photosensitive polymer and chemically amplified photoresist composi...
Patent number
7,297,463
Issue date
Nov 20, 2007
Dongjin Semichem Co., Ltd.
Deog-Bae Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Grant
Polymer for forming anti-reflective coating layer
Patent number
7,282,530
Issue date
Oct 16, 2007
Dongjin Semichem Co., Ltd.
Sang-Jung Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Photoresist monomers, polymers and photoresist compositions for pre...
Patent number
6,924,078
Issue date
Aug 2, 2005
Hynix Semiconductor Inc.
Geun Su Lee
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Polymer for chemically amplified resist and a resist composition us...
Patent number
6,767,687
Issue date
Jul 27, 2004
Dongjin Semichem Co., Ltd.
Deog-Bae Kim
Y10 - TECHNICAL SUBJECTS COVERED BY FORMER USPC
Information
Patent Grant
Chemically amplified resist and a resist composition
Patent number
6,743,881
Issue date
Jun 1, 2004
Dongjin Semichem Co., Ltd.
Deog-Bae Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Grant
Queue management system capable of controlling priority and jitter
Patent number
6,215,791
Issue date
Apr 10, 2001
Daewoo Electronics Co., Ltd.
Deog-Nyoun Kim
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Grant
Bandwith allocating method by using sub-tables in an ATM network in...
Patent number
6,175,572
Issue date
Jan 16, 2001
Daewoo Electronics Co., Ltd.
Deog-Nyoun Kim
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Grant
Per-session pre-synchronized framing method for real-time services...
Patent number
6,052,389
Issue date
Apr 18, 2000
Daewoo Electronics Co., Ltd.
Deog-Nyoun Kim
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Grant
Method and apparatus for scheduling cells based on pre-synchronized...
Patent number
6,044,091
Issue date
Mar 28, 2000
Daewoo Electronics Co., Ltd.
Deog-Nyoun Kim
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Grant
Method and apparatus for scheduling cells for use in a static prior...
Patent number
5,999,534
Issue date
Dec 7, 1999
Daewoo Electronics Co., Ltd.
Deog-Nyoun Kim
H04 - ELECTRIC COMMUNICATION TECHNIQUE
Information
Patent Grant
Anaerobic curing compositions comprising a lutidine
Patent number
5,314,933
Issue date
May 24, 1994
SKC Limited
Deog-Il Kim
C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Patents Applications
last 30 patents
Information
Patent Application
ISOCYANURATE COMPOUND FOR FORMING ORGANIC ANTI-REFLECTIVE LAYER AND...
Publication number
20120164338
Publication date
Jun 28, 2012
DONGJIN SEMICHEM CO., LTD.
Hyo-Jung Roh
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
POLYMER FOR FORMING RESIST PROTECTION FILM, COMPOSITION FOR FORMING...
Publication number
20120003589
Publication date
Jan 5, 2012
Jong Kyoung Park
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
METHOD FOR FORMING FINE PATTERN IN SEMICONDUCTOR DEVICE
Publication number
20100233622
Publication date
Sep 16, 2010
Dongjin Semichem Co., Ltd.
Jun-Gyeong Lee
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
MONOMER HAVING SULFONYL GROUP, POLYMER THEREOF AND PHOTORESIST COMP...
Publication number
20080102402
Publication date
May 1, 2008
Jung-Youl Lee
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
MONOMER, POLYMER AND COMPOSITION FOR PHOTORESIST
Publication number
20080070161
Publication date
Mar 20, 2008
Deog-Bae Kim
C07 - ORGANIC CHEMISTRY
Information
Patent Application
PHOTOSENSITIVE POLYMER AND PHOTORESIST COMPOSITION
Publication number
20080057436
Publication date
Mar 6, 2008
Deog-Bae KIM
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Polymer for forming anti-reflective coating layer
Publication number
20060199107
Publication date
Sep 7, 2006
DongJin Semichem Co., Ltd.
Sang-Jung Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer for forming anti-reflective coating layer
Publication number
20060199106
Publication date
Sep 7, 2006
DongJin Semichem Co., Ltd.
Sang-Jung Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer for forming anti-reflective coating layer
Publication number
20060199108
Publication date
Sep 7, 2006
DongJin Semichem Co., Ltd.
Sang-Jung Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Polymer for forming anti-reflective coating layer
Publication number
20060134558
Publication date
Jun 22, 2006
DongJin Semichem Co., Ltd.
Sang-Jung Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Photoresist monomer having spiro cyclic ketal goup, polymer thereof...
Publication number
20060057494
Publication date
Mar 16, 2006
DongJin Semichem Co., Ltd.
Jae-Woo Lee
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Chemically amplified polymer having pendant group with dicyclohexyl...
Publication number
20060019192
Publication date
Jan 26, 2006
Eun-Kyung SON
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Photosensitive polymer and chemically amplified photoresist composi...
Publication number
20050271977
Publication date
Dec 8, 2005
DONGJIN SEMICHEM CO., LTD.
Deog-Bae Kim
C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information
Patent Application
Streptomyces sp. CJPV975652 capable of converting compactin to prav...
Publication number
20040253692
Publication date
Dec 16, 2004
Chan Kyu Lee
C12 - BIOCHEMISTRY BEER SPIRITS WINE VINEGAR MICROBIOLOGY ENZYMOLOGY MUTATION...
Information
Patent Application
Chemically amplified resist and a resist composition
Publication number
20030181629
Publication date
Sep 25, 2003
Deog- Bae Kim
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information
Patent Application
Photoresist monomers, polymers and photoresist compositions for pre...
Publication number
20030091927
Publication date
May 15, 2003
Hynix Semiconductor Inc.
Geun Su Lee
C07 - ORGANIC CHEMISTRY