Derek R. Witty

Person

Fremont, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Conformal amorphous carbon for spacer and spacer protection applica...
- Patent number 10,236,182
- Issue date Mar 19, 2019
- Applied Materials, Inc.
- Sungjin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ultra-conformal carbon film deposition
- Patent number 10,074,534
- Issue date Sep 11, 2018
- Applied Materials, Inc.
- Swayambhu P. Behera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
PEALD of films comprising silicon nitride
- Patent number 9,984,868
- Issue date May 29, 2018
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ultra-conformal carbon film deposition
- Patent number 9,721,784
- Issue date Aug 1, 2017
- Applied Materials, Inc.
- Swayambhu P. Behera
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Conformal amorphous carbon for spacer and spacer protection applica...
- Patent number 9,570,303
- Issue date Feb 14, 2017
- Applied Materials, Inc.
- Sungjin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for substrate clamping in a plasma chamber
- Patent number 9,337,072
- Issue date May 10, 2016
- Applied Materials, Inc.
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Copper oxide removal techniques
- Patent number 8,758,638
- Issue date Jun 24, 2014
- Applied Materials, Inc.
- Weifeng Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Deposition of an amorphous carbon layer with high film density and...
- Patent number 8,679,987
- Issue date Mar 25, 2014
- Applied Materials, Inc.
- Patrick Reilly
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Plasma-enhanced chemical vapor deposition of crystalline germanium
- Patent number 8,598,020
- Issue date Dec 3, 2013
- Applied Materials, Inc.
- Victor Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Low temperature plasma enhanced chemical vapor deposition of confor...
- Patent number 8,586,487
- Issue date Nov 19, 2013
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Boron film interface engineering
- Patent number 8,563,090
- Issue date Oct 22, 2013
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming flash memory with ultraviolet treatment
- Patent number 8,501,568
- Issue date Aug 6, 2013
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to minimize wet etch undercuts and provide pore sealing of e...
- Patent number 8,445,075
- Issue date May 21, 2013
- Applied Materials, Inc.
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Air gap integration scheme
- Patent number 8,389,376
- Issue date Mar 5, 2013
- Applied Materials, Inc.
- Alexandros T. Demos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Silicon dioxide layer deposited with BDEAS
- Patent number 8,343,881
- Issue date Jan 1, 2013
- Applied Materials, Inc.
- Yong-Won Lee
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method for depositing boron-rich films for lithographic mask applic...
- Patent number 8,337,950
- Issue date Dec 25, 2012
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to improve the in-film defectivity of PECVD amorphous carbo...
- Patent number 8,282,734
- Issue date Oct 9, 2012
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming a non-volatile memory having a silicon nitride ch...
- Patent number 8,252,653
- Issue date Aug 28, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron nitride and boron-nitride derived materials deposition method
- Patent number 8,148,269
- Issue date Apr 3, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to increase silicon nitride tensile stress using nitrogen pl...
- Patent number 8,138,104
- Issue date Mar 20, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of depositing boron nitride and boron nitride-derived materials
- Patent number 8,084,105
- Issue date Dec 27, 2011
- Applied Materials, Inc.
- Jeong-Uk Huh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods to obtain low k dielectric barrier with superior etch resis...
- Patent number 7,964,442
- Issue date Jun 21, 2011
- Applied Materials, Inc.
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and systems for forming at least one dielectric layer
- Patent number 7,871,926
- Issue date Jan 18, 2011
- Applied Materials, Inc.
- Li-Qun Xia
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method for depositing an amorphous carbon film with improved densit...
- Patent number 7,867,578
- Issue date Jan 11, 2011
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method of forming non-volatile memory having charge trap layer with...
- Patent number 7,816,205
- Issue date Oct 19, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method to deposit functionally graded dielectric films via chemical...
- Patent number 7,802,538
- Issue date Sep 28, 2010
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Method to increase the compressive stress of PECVD dielectric films
- Patent number 7,790,635
- Issue date Sep 7, 2010
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Boron derived materials deposition method
- Patent number 7,704,816
- Issue date Apr 27, 2010
- Applied Materials, Inc.
- Jeong-Uk Huh
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Air gap integration scheme
- Patent number 7,670,924
- Issue date Mar 2, 2010
- Applied Materials, Inc.
- Alexandros T. Demos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-stage curing of low K nano-porous films
- Patent number 7,611,996
- Issue date Nov 3, 2009
- Applied Materials, Inc.
- Francimar Schmitt
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Patents Applicationslast 30 patents

Information Patent Application
ACOUSTIC CARRIER HEAD MONITORING
- Publication number 20240139900
- Publication date May 2, 2024
- Applied Materials, Inc.
- Jeonghoon Oh
- B24 - GRINDING POLISHING
Information Patent Application
ADAPTIVE SLURRY DISPENSE SYSTEM
- Publication number 20220193858
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Sameer DESHPANDE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
ULTRA-CONFORMAL CARBON FILM DEPOSITION
- Publication number 20170301537
- Publication date Oct 19, 2017
- Applied Materials, Inc.
- Swayambhu P. BEHERA
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...
- Publication number 20170170015
- Publication date Jun 15, 2017
- Applied Materials, Inc.
- Sungjin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ULTRA-CONFORMAL CARBON FILM DEPOSITION LAYER-BY-LAYER DEPOSITION OF...
- Publication number 20160005596
- Publication date Jan 7, 2016
- Applied Materials, Inc.
- Swayambhu P. BEHERA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...
- Publication number 20150279676
- Publication date Oct 1, 2015
- Applied Materials, Inc.
- Sungjin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...
- Publication number 20140349490
- Publication date Nov 27, 2014
- Applied Materials, Inc.
- Sungjin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VBD AND TDDB IMPROVEMENT THRU INTERFACE ENGINEERING
- Publication number 20140273516
- Publication date Sep 18, 2014
- Li-Qun XIA
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PEALD of Films Comprising Silicon Nitride
- Publication number 20140273529
- Publication date Sep 18, 2014
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DEPOSITION OF AN AMORPHOUS CARBON LAYER WITH HIGH FILM DENSITY AND...
- Publication number 20130302996
- Publication date Nov 14, 2013
- Applied Materials, Inc.
- Patrick REILLY
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...
- Publication number 20130189845
- Publication date Jul 25, 2013
- Applied Materials, Inc.
- Sungjin Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ENGINEERING DIELECTRIC FILMS FOR CMP STOP
- Publication number 20130189841
- Publication date Jul 25, 2013
- Applied Materials, Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CONFOR...
- Publication number 20130183835
- Publication date Jul 18, 2013
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
COPPER OXIDE REMOVAL TECHNIQUES
- Publication number 20120289049
- Publication date Nov 15, 2012
- Applied Materials, Inc.
- WEIFENG YE
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ADHESION IMPROVEMENT OF DIELECTRIC BARRIER TO COPPER BY THE ADDITIO...
- Publication number 20120276301
- Publication date Nov 1, 2012
- Yong-Won Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS TO IMPROVE THE IN-FILM DEFECTIVITY OF PECVD AMORPHOUS CARBO...
- Publication number 20120204795
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...
- Publication number 20120208373
- Publication date Aug 16, 2012
- Applied Materials, Inc.
- DEENESH PADHI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...
- Publication number 20120196450
- Publication date Aug 2, 2012
- Applied Materials, Inc.
- Mihaela Balseanu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
DUAL DELIVERY CHAMBER DESIGN
- Publication number 20120097330
- Publication date Apr 26, 2012
- Applied Materials, Inc.
- Prahallad Iyengar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CRYSTALLINE GERMANIUM
- Publication number 20110315992
- Publication date Dec 29, 2011
- Applied Materials, Inc.
- Victor T. Nguyen
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SILICON DIOXIDE LAYER DEPOSITED WITH BDEAS
- Publication number 20110298099
- Publication date Dec 8, 2011
- Applied Materials, Inc.
- Yong-Won LEE
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...
- Publication number 20110104400
- Publication date May 5, 2011
- Deenesh Padhi
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER
- Publication number 20110090613
- Publication date Apr 21, 2011
- Ganesh Balasubramanian
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...
- Publication number 20110092077
- Publication date Apr 21, 2011
- Huiwen Xu
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
ENGINEERING BORON-RICH FILMS FOR LITHOGRAPHIC MASK APPLICATIONS
- Publication number 20100233633
- Publication date Sep 16, 2010
- Applied Materials, Inc.
- Victor Nguyen
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NOVEL AIR GAP INTEGRATION SCHEME
- Publication number 20100151671
- Publication date Jun 17, 2010
- Applied Materials, Inc.
- Alexandros T. Demos
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
NON-VOLATILE MEMORY HAVING SILICON NITRIDE CHARGE TRAP LAYER
- Publication number 20100096687
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- Mihaela BALSEANU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
NON-VOLATILE MEMORY HAVING CHARGE TRAP LAYER WITH COMPOSITIONAL GRA...
- Publication number 20100096688
- Publication date Apr 22, 2010
- APPLIED MATERIALS, INC.
- Mihaela BALSEANU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FLASH MEMORY WITH TREATED CHARGE TRAP LAYER
- Publication number 20100099247
- Publication date Apr 22, 2010
- Applied Materials Inc.
- Mihaela Balseanu
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BORON FILM INTERFACE ENGINEERING
- Publication number 20100098884
- Publication date Apr 22, 2010
- Applied Materials, Inc.
- MIHAELA BALSEANU
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Derek R. Witty

Person

Patents Grantslast 30 patents

Conformal amorphous carbon for spacer and spacer protection applica...

Ultra-conformal carbon film deposition

PEALD of films comprising silicon nitride

Ultra-conformal carbon film deposition

Conformal amorphous carbon for spacer and spacer protection applica...

Apparatus and method for substrate clamping in a plasma chamber

Copper oxide removal techniques

Deposition of an amorphous carbon layer with high film density and...

Plasma-enhanced chemical vapor deposition of crystalline germanium

Low temperature plasma enhanced chemical vapor deposition of confor...

Boron film interface engineering

Method of forming flash memory with ultraviolet treatment

Method to minimize wet etch undercuts and provide pore sealing of e...

Air gap integration scheme

Silicon dioxide layer deposited with BDEAS

Method for depositing boron-rich films for lithographic mask applic...

Methods to improve the in-film defectivity of PECVD amorphous carbo...

Method of forming a non-volatile memory having a silicon nitride ch...

Boron nitride and boron-nitride derived materials deposition method

Method to increase silicon nitride tensile stress using nitrogen pl...

Method of depositing boron nitride and boron nitride-derived materials

Methods to obtain low k dielectric barrier with superior etch resis...

Methods and systems for forming at least one dielectric layer

Method for depositing an amorphous carbon film with improved densit...

Method of forming non-volatile memory having charge trap layer with...

Method to deposit functionally graded dielectric films via chemical...

Method to increase the compressive stress of PECVD dielectric films

Boron derived materials deposition method

Air gap integration scheme

Multi-stage curing of low K nano-porous films

Patents Applicationslast 30 patents

ACOUSTIC CARRIER HEAD MONITORING

ADAPTIVE SLURRY DISPENSE SYSTEM

ULTRA-CONFORMAL CARBON FILM DEPOSITION

CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...

ULTRA-CONFORMAL CARBON FILM DEPOSITION LAYER-BY-LAYER DEPOSITION OF...

CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...

CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...

VBD AND TDDB IMPROVEMENT THRU INTERFACE ENGINEERING

PEALD of Films Comprising Silicon Nitride

DEPOSITION OF AN AMORPHOUS CARBON LAYER WITH HIGH FILM DENSITY AND...

CONFORMAL AMORPHOUS CARBON FOR SPACER AND SPACER PROTECTION APPLICA...

ENGINEERING DIELECTRIC FILMS FOR CMP STOP

LOW TEMPERATURE PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION OF CONFOR...

COPPER OXIDE REMOVAL TECHNIQUES

ADHESION IMPROVEMENT OF DIELECTRIC BARRIER TO COPPER BY THE ADDITIO...

METHODS TO IMPROVE THE IN-FILM DEFECTIVITY OF PECVD AMORPHOUS CARBO...

METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...

METHOD TO INCREASE SILICON NITRIDE TENSILE STRESS USING NITROGEN PL...

DUAL DELIVERY CHAMBER DESIGN

PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION OF CRYSTALLINE GERMANIUM

SILICON DIOXIDE LAYER DEPOSITED WITH BDEAS

METHOD FOR DEPOSITING AN AMORPHOUS CARBON FILM WITH IMPROVED DENSIT...

APPARATUS AND METHOD FOR SUBSTRATE CLAMPING IN A PLASMA CHAMBER

METHOD TO MINIMIZE WET ETCH UNDERCUTS AND PROVIDE PORE SEALING OF E...

ENGINEERING BORON-RICH FILMS FOR LITHOGRAPHIC MASK APPLICATIONS

NOVEL AIR GAP INTEGRATION SCHEME

NON-VOLATILE MEMORY HAVING SILICON NITRIDE CHARGE TRAP LAYER

NON-VOLATILE MEMORY HAVING CHARGE TRAP LAYER WITH COMPOSITIONAL GRA...

FLASH MEMORY WITH TREATED CHARGE TRAP LAYER

BORON FILM INTERFACE ENGINEERING