Derek W. Bassett

Person

Cedar Park, TX, US

People

Patents Grantslast 30 patents

Information Patent Grant
System and methods for wafer drying
- Patent number 12,002,687
- Issue date Jun 4, 2024
- Tokyo Electron Limited
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
System and methods for wafer drying
- Patent number 11,515,178
- Issue date Nov 29, 2022
- Tokyo Electron Limited
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method to electrostatically remove foreign matter fro...
- Patent number 11,376,640
- Issue date Jul 5, 2022
- Tokyo Electron Limited
- Antonio Luis Pacheco Rotondaro
- B08 - CLEANING
Information Patent Grant
Process and apparatus for processing a nitride structure without si...
- Patent number 10,916,440
- Issue date Feb 9, 2021
- Tokyo Electron Limited
- Derek Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Etching of silicon nitride and silica deposition control in 3D NAND...
- Patent number 10,886,290
- Issue date Jan 5, 2021
- Tokyo Electron Limited
- Derek Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process and apparatus for processing a nitride structure without si...
- Patent number 10,515,820
- Issue date Dec 24, 2019
- Tokyo Electron Limited
- Derek Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cover plate for wind mark control in spin coating process
- Patent number 10,262,880
- Issue date Apr 16, 2019
- Tokyo Electron Limited
- Derek W. Bassett
- B05 - SPRAYING OR ATOMISING IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATER...
Information Patent Grant
Method of treating a microelectronic substrate using dilute TMAH
- Patent number 10,256,163
- Issue date Apr 9, 2019
- Tokyo Electron Limited
- Wallace P. Printz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Grant
Chemical fluid processing apparatus and chemical fluid processing m...
- Patent number 10,062,586
- Issue date Aug 28, 2018
- Tokyo Electron Limited
- Derek W Bassett
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
PLASMA PROCESSING METHOD AND APPARATUS
- Publication number 20240404794
- Publication date Dec 5, 2024
- TOKYO ELECTRON LIMITED
- Derek William Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Methods for Wafer Drying
- Publication number 20230092779
- Publication date Mar 23, 2023
- TOKYO ELECTRON LIMITED
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Method for Wet Chemical Etching in Semiconductor Processing
- Publication number 20210384049
- Publication date Dec 9, 2021
- TOKYO ELECTRON LIMITED
- Derek William Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
System and Methods for Wafer Drying
- Publication number 20210287919
- Publication date Sep 16, 2021
- TOKYO ELECTRON LIMITED
- Trace Hurd
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Apparatus and Method to Electrostatically Remove Foreign Matter fro...
- Publication number 20200101500
- Publication date Apr 2, 2020
- TOKYO ELECTRON LIMITED
- Antonio Luis Pacheco Rotondaro
- B08 - CLEANING
Information Patent Application
ETCHING OF SILICON NITRIDE AND SILICA DEPOSITION CONTROL IN 3D NAND...
- Publication number 20200027891
- Publication date Jan 23, 2020
- TOKYO ELECTRON LIMITED
- Derek Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Rapid Wafer Drying Using Induction Heating
- Publication number 20190348305
- Publication date Nov 14, 2019
- TOKYO ELECTRON LIMITED
- Derek Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS AND APPARATUS FOR PROCESSING A NITRIDE STRUCTURE WITHOUT SI...
- Publication number 20190237339
- Publication date Aug 1, 2019
- TOKYO ELECTRON LIMITED
- Derek Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Process and Apparatus for Processing a Nitride Structure Without Si...
- Publication number 20170287726
- Publication date Oct 5, 2017
- TOKYO ELECTRON LIMITED
- Derek Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD OF TREATING A MICROELECTRONIC SUBSTRATE USING DILUTE TMAH
- Publication number 20170141005
- Publication date May 18, 2017
- TOKYO ELECTRON LIMITED
- Wallace P. Printz
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical Fluid Processing Apparatus and Chemical Fluid Processing M...
- Publication number 20150031214
- Publication date Jan 29, 2015
- TOKYO ELECTRON LIMITED
- Derek W Bassett
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COVER PLATE FOR WIND MARK CONTROL IN SPIN COATING PROCESS
- Publication number 20140235070
- Publication date Aug 21, 2014
- TOKYO ELECTRON LIMITED
- Derek W. Bassett
- H01 - BASIC ELECTRIC ELEMENTS

Derek W. Bassett

Person

Patents Grantslast 30 patents

System and methods for wafer drying

System and methods for wafer drying

Apparatus and method to electrostatically remove foreign matter fro...

Process and apparatus for processing a nitride structure without si...

Etching of silicon nitride and silica deposition control in 3D NAND...

Process and apparatus for processing a nitride structure without si...

Cover plate for wind mark control in spin coating process

Method of treating a microelectronic substrate using dilute TMAH

Chemical fluid processing apparatus and chemical fluid processing m...

Patents Applicationslast 30 patents

PLASMA PROCESSING METHOD AND APPARATUS

System and Methods for Wafer Drying

System and Method for Wet Chemical Etching in Semiconductor Processing

System and Methods for Wafer Drying

Apparatus and Method to Electrostatically Remove Foreign Matter fro...

ETCHING OF SILICON NITRIDE AND SILICA DEPOSITION CONTROL IN 3D NAND...

Rapid Wafer Drying Using Induction Heating

PROCESS AND APPARATUS FOR PROCESSING A NITRIDE STRUCTURE WITHOUT SI...

Process and Apparatus for Processing a Nitride Structure Without Si...

METHOD OF TREATING A MICROELECTRONIC SUBSTRATE USING DILUTE TMAH

Chemical Fluid Processing Apparatus and Chemical Fluid Processing M...

COVER PLATE FOR WIND MARK CONTROL IN SPIN COATING PROCESS