Devesh Dadhich Shreeram

Person

Boise, ID, US

People

Patents Grantslast 30 patents

Information Patent Grant
Capacitors with electrodes having a portion of material removed, an...
- Patent number 12,193,208
- Issue date Jan 7, 2025
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
Information Patent Grant
Integrated assemblies and methods of forming integrated assemblies
- Patent number 11,848,360
- Issue date Dec 19, 2023
- Micron Technology, Inc.
- Yoshitaka Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Integrated memory with redistribution of capacitor connections, and...
- Patent number 11,563,008
- Issue date Jan 24, 2023
- Micron Technology, Inc.
- Guangjun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Column formation using sacrificial material
- Patent number 11,011,523
- Issue date May 18, 2021
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure patterning
- Patent number 11,011,521
- Issue date May 18, 2021
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a capacitor using a hard mask
- Patent number 10,978,553
- Issue date Apr 13, 2021
- Micron Technology, Inc.
- Diem Thy N. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Formation of a capacitor using a sacrificial layer
- Patent number 10,964,475
- Issue date Mar 30, 2021
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Reduction of roughness on a sidewall of an opening
- Patent number 10,923,478
- Issue date Feb 16, 2021
- Micron Technology, Inc.
- Christopher J. Gambee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Storage node shaping
- Patent number 10,811,419
- Issue date Oct 20, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor structure formation
- Patent number 10,777,561
- Issue date Sep 15, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
OVER-SCULPTED STORAGE NODE
- Publication number 20240088211
- Publication date Mar 14, 2024
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DIGIT LINE AND CELL CONTACT ISOLATION
- Publication number 20230354585
- Publication date Nov 2, 2023
- Micron Technology, Inc.
- Albert P. Chan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Assemblies and Methods of Forming Integrated Assemblies
- Publication number 20220406899
- Publication date Dec 22, 2022
- Micron Technology, Inc.
- Yoshitaka Nakamura
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Integrated Memory with Redistribution of Capacitor Connections, and...
- Publication number 20220285357
- Publication date Sep 8, 2022
- Micron Technology, Inc.
- Guangjun Yang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CAPACITORS WITH ELECTRODES HAVING A PORTION OF MATERIAL REMOVED, AN...
- Publication number 20220238532
- Publication date Jul 28, 2022
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE PATTERNING
- Publication number 20200381437
- Publication date Dec 3, 2020
- Micron Technology, Inc.
- Sevim Korkmaz
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SEMICONDUCTOR STRUCTURE FORMATION
- Publication number 20200243528
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
COLUMN FORMATION USING SACRIFICIAL MATERIAL
- Publication number 20200243536
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REDUCTION OF ROUGHNESS ON A SIDEWALL OF AN OPENING
- Publication number 20200243535
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Christopher J. Gambee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF A CAPACITOR USING A HARD MASK
- Publication number 20200243640
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Diem Thy N. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
FORMATION OF A CAPACITOR USING A SACRIFICIAL LAYER
- Publication number 20200243258
- Publication date Jul 30, 2020
- Micron Technology, Inc.
- Devesh Dadhich Shreeram
- H01 - BASIC ELECTRIC ELEMENTS

Devesh Dadhich Shreeram

Person

Patents Grantslast 30 patents

Capacitors with electrodes having a portion of material removed, an...

Integrated assemblies and methods of forming integrated assemblies

Integrated memory with redistribution of capacitor connections, and...

Column formation using sacrificial material

Semiconductor structure patterning

Formation of a capacitor using a hard mask

Formation of a capacitor using a sacrificial layer

Reduction of roughness on a sidewall of an opening

Storage node shaping

Semiconductor structure formation

Patents Applicationslast 30 patents

OVER-SCULPTED STORAGE NODE

DIGIT LINE AND CELL CONTACT ISOLATION

Integrated Assemblies and Methods of Forming Integrated Assemblies

Integrated Memory with Redistribution of Capacitor Connections, and...

CAPACITORS WITH ELECTRODES HAVING A PORTION OF MATERIAL REMOVED, AN...

SEMICONDUCTOR STRUCTURE PATTERNING

SEMICONDUCTOR STRUCTURE FORMATION

COLUMN FORMATION USING SACRIFICIAL MATERIAL

REDUCTION OF ROUGHNESS ON A SIDEWALL OF AN OPENING

FORMATION OF A CAPACITOR USING A HARD MASK

FORMATION OF A CAPACITOR USING A SACRIFICIAL LAYER