Devi Koty

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Albany, NY, US

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Patents Grantslast 30 patents

Information Patent Grant
Methods for etching metal films using plasma processing
- Patent number 12,057,322
- Issue date Aug 6, 2024
- Tokyo Electron Limited
- Nicholas Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma co-doping to reduce the forming voltage in resistive random...
- Patent number 11,844,290
- Issue date Dec 12, 2023
- Tokyo Electron Limited
- Devi Koty
Information Patent Grant
Oxygen-free plasma etching for contact etching of resistive random...
- Patent number 11,258,012
- Issue date Feb 22, 2022
- Tokyo Electron Limited
- Devi Koty
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
RESISTIVE MEMORY DEVICE AND METHOD OF FORMING
- Publication number 20230329127
- Publication date Oct 12, 2023
- TOKYO ELECTRON LIMITED
- Devi Koty
Information Patent Application
Plasma Co-Doping To Reduce The Forming Voltage In Resistive Random...
- Publication number 20220393107
- Publication date Dec 8, 2022
- TOKYO ELECTRON LIMITED
- Devi KOTY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS FOR ETCHING METAL FILMS USING PLASMA PROCESSING
- Publication number 20210118693
- Publication date Apr 22, 2021
- TOKYO ELECTRON LIMITED
- Nicholas Joy
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Oxygen-Free Plasma Etching For Contact Etching of Resistive Random...
- Publication number 20200203607
- Publication date Jun 25, 2020
- TOKYO ELECTRON LIMITED
- Devi Koty
- H01 - BASIC ELECTRIC ELEMENTS