Deyun Wang

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Shanghai, CN

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Patents Grantslast 30 patents

Information Patent Grant
Method and apparatus for removing particles or photoresist on subst...
- Patent number 12,334,367
- Issue date Jun 17, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Xiaoyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and method for cleaning semiconductor wafers
- Patent number 12,068,149
- Issue date Aug 20, 2024
- ACM Research (Shanghai) Inc.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
COATING AND DEVELOPING DEVICE
- Publication number 20250130511
- Publication date Apr 24, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Mark Lee
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
WAFER BACKSIDE CLEANING METHOD
- Publication number 20250046598
- Publication date Feb 6, 2025
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DRYING APPARATUS AND METHOD BASED ON SUPERCRITICAL FLUID
- Publication number 20240363370
- Publication date Oct 31, 2024
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- B08 - CLEANING
Information Patent Application
APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS
- Publication number 20240355614
- Publication date Oct 24, 2024
- ACM RESEARCH (SHANGHAI), INC.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD AND APPARATUS FOR REMOVING PARTICLES OR PHOTORESIST ON SUBST...
- Publication number 20230143401
- Publication date May 11, 2023
- ACM RESEARCH (SHANGHAI), INC.
- Xiaoyan Zhang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS AND METHOD FOR CLEANING SEMICONDUCTOR WAFERS
- Publication number 20210249257
- Publication date Aug 12, 2021
- ACM Research (Shanghai) Inc.
- Hui Wang
- H01 - BASIC ELECTRIC ELEMENTS