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Diana URICH
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Munich, DE
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Patents Grants
last 30 patents
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Patent Grant
Projection exposure system for semiconductor lithography, comprisin...
Patent number
10,712,677
Issue date
Jul 14, 2020
Carl Zeiss SMT GmbH
Irene Ament
B08 - CLEANING
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Patent Grant
Reflective optical element for EUV lithography
Patent number
10,649,340
Issue date
May 12, 2020
Carl Zeiss SMT GmbH
Dirk Heinrich Ehm
G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Patents Applications
last 30 patents
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Patent Application
PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...
Publication number
20190243258
Publication date
Aug 8, 2019
Carl Zeiss SMT GMBH
Irene AMENT
B08 - CLEANING
Information
Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
Publication number
20190171108
Publication date
Jun 6, 2019
Carl Zeiss SMT GMBH
Dirk Heinrich EHM
G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY