Diane Scott

Person

Portland, OR, US

People

Patents Grantslast 30 patents

Information Patent Grant
Coated compressive subpad for chemical mechanical polishing
- Patent number 11,440,158
- Issue date Sep 13, 2022
- CMC Materials, Inc.
- Diane Scott
- B24 - GRINDING POLISHING
Information Patent Grant
Low density polishing pad
- Patent number 10,946,495
- Issue date Mar 16, 2021
- CMC Materials, Inc.
- Ping Huang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions
- Patent number 10,293,459
- Issue date May 21, 2019
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions...
- Patent number 10,160,092
- Issue date Dec 25, 2018
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and polishing surface layer
- Patent number 9,931,728
- Issue date Apr 3, 2018
- Cabot Microelectronics Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooved foundation layer and polishing surface l...
- Patent number 9,931,729
- Issue date Apr 3, 2018
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and window attached thereto
- Patent number 9,868,185
- Issue date Jan 16, 2018
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad having polishing surface with continuous protrusions
- Patent number 9,649,742
- Issue date May 16, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Method of fabricating a polishing
- Patent number 9,597,770
- Issue date Mar 21, 2017
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with polishing surface layer having an aperture or op...
- Patent number 9,597,769
- Issue date Mar 21, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Homogeneous polishing pad for eddy current end-point detection
- Patent number 9,597,777
- Issue date Mar 21, 2017
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with multi-modal distribution of pore diameters
- Patent number 9,555,518
- Issue date Jan 31, 2017
- NexPlanar Corporation
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved CMP pads
- Patent number 9,375,823
- Issue date Jun 28, 2016
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with homogeneous body having discrete protrusions the...
- Patent number 9,296,085
- Issue date Mar 29, 2016
- NexPlanar Corporation
- Rajeev Bajaj
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with alignment feature
- Patent number 9,249,273
- Issue date Feb 2, 2016
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with concentric or approximately concentric polygon g...
- Patent number 9,211,628
- Issue date Dec 15, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Grooved CMP pad
- Patent number 9,180,570
- Issue date Nov 10, 2015
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Soft polishing pad for polishing a semiconductor substrate
- Patent number 9,156,124
- Issue date Oct 13, 2015
- NexPlanar Corporation
- William Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with foundation layer and polishing surface layer
- Patent number 9,067,297
- Issue date Jun 30, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with grooved foundation layer and polishing surface l...
- Patent number 9,067,298
- Issue date Jun 30, 2015
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for eddy current end-point detection
- Patent number 9,028,302
- Issue date May 12, 2015
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
CMP pad with local area transparency
- Patent number 9,017,140
- Issue date Apr 28, 2015
- NexPlanar Corporation
- William Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with alignment feature
- Patent number 8,968,058
- Issue date Mar 3, 2015
- NexPlanar Corporation
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with alignment aperture
- Patent number 8,920,219
- Issue date Dec 30, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad with multi-modal distribution of pore diameters
- Patent number 8,702,479
- Issue date Apr 22, 2014
- NexPlanar Corporation
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Grant
Homogeneous polishing pad for eddy current end-point detection
- Patent number 8,657,653
- Issue date Feb 25, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Polishing pad for eddy current end-point detection
- Patent number 8,628,384
- Issue date Jan 14, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Method of fabricating a polishing pad with an end-point detection r...
- Patent number 8,439,994
- Issue date May 14, 2013
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Grant
Base-pad for a polishing pad
- Patent number 6,623,337
- Issue date Sep 23, 2003
- Rodel Holdings, Inc.
- Diane B. Scott
- B24 - GRINDING POLISHING

Patents Applicationslast 30 patents

Information Patent Application
COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20180141183
- Publication date May 24, 2018
- Cabot Microelectronics Corporation
- Diane SCOTT
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20170203409
- Publication date Jul 20, 2017
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND WINDOW ATTACHED THERETO
- Publication number 20170120417
- Publication date May 4, 2017
- Cabot Microelectronics Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
LOW DENSITY POLISHING PAD
- Publication number 20160221145
- Publication date Aug 4, 2016
- Ping Huang
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING
- Publication number 20160144477
- Publication date May 26, 2016
- Diane Scott
- B24 - GRINDING POLISHING
Information Patent Application
GROOVED CMP PADS
- Publication number 20160023321
- Publication date Jan 28, 2016
- Robert Kerprich
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...
- Publication number 20160023322
- Publication date Jan 28, 2016
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
SOFT POLISHING PAD FOR POLISHING A SEMICONDUCTOR SUBSTRATE
- Publication number 20150343595
- Publication date Dec 3, 2015
- William C. Allison
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20150273656
- Publication date Oct 1, 2015
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20150273655
- Publication date Oct 1, 2015
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...
- Publication number 20150266160
- Publication date Sep 24, 2015
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH ALIGNMENT FEATURE
- Publication number 20150152236
- Publication date Jun 4, 2015
- Robert Kerprich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD WITH APERTURE
- Publication number 20150079878
- Publication date Mar 19, 2015
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH HOMOGENEOUS BODY HAVING DISCRETE PROTRUSIONS THE...
- Publication number 20150056900
- Publication date Feb 26, 2015
- Rajeev Bajaj
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
LOW DENSITY POLISHING PAD
- Publication number 20150038066
- Publication date Feb 5, 2015
- NexPlanar Corporation
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...
- Publication number 20140273777
- Publication date Sep 18, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS
- Publication number 20140206268
- Publication date Jul 24, 2014
- NexPlanar Corporation
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH MULTI-MODAL DISTRIBUTION OF PORE DIAMETERS
- Publication number 20140167305
- Publication date Jun 19, 2014
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Application
HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION
- Publication number 20140123563
- Publication date May 8, 2014
- NexPlanar Corporation
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
Polishing Pad for Eddy Current End-Point Detection
- Publication number 20140102010
- Publication date Apr 17, 2014
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OP...
- Publication number 20130324020
- Publication date Dec 5, 2013
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER
- Publication number 20130137350
- Publication date May 30, 2013
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...
- Publication number 20130137349
- Publication date May 30, 2013
- Paul Andre Lefevre
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH APERTURE
- Publication number 20130017764
- Publication date Jan 17, 2013
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH HOMOGENEOUS BODY HAVING DISCRETE PROTRUSIONS THE...
- Publication number 20120302148
- Publication date Nov 29, 2012
- Rajeev Bajaj
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
POLISHING PAD WITH ALIGNMENT FEATURE
- Publication number 20120282849
- Publication date Nov 8, 2012
- Robert Kerprich
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Application
POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...
- Publication number 20120190281
- Publication date Jul 26, 2012
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD WITH MULTI-MODAL DISTRIBUTION OF PORE DIAMETERS
- Publication number 20120094586
- Publication date Apr 19, 2012
- Ping Huang
- B24 - GRINDING POLISHING
Information Patent Application
POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION
- Publication number 20120083191
- Publication date Apr 5, 2012
- William C. Allison
- B24 - GRINDING POLISHING
Information Patent Application
HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION
- Publication number 20120083192
- Publication date Apr 5, 2012
- William C. Allison
- B24 - GRINDING POLISHING

Diane Scott

Person

Patents Grantslast 30 patents

Coated compressive subpad for chemical mechanical polishing

Low density polishing pad

Polishing pad having polishing surface with continuous protrusions

Polishing pad having polishing surface with continuous protrusions...

Polishing pad with foundation layer and polishing surface layer

Polishing pad with grooved foundation layer and polishing surface l...

Polishing pad with foundation layer and window attached thereto

Polishing pad having polishing surface with continuous protrusions

Method of fabricating a polishing

Polishing pad with polishing surface layer having an aperture or op...

Homogeneous polishing pad for eddy current end-point detection

Polishing pad with multi-modal distribution of pore diameters

Grooved CMP pads

Polishing pad with homogeneous body having discrete protrusions the...

Polishing pad with alignment feature

Polishing pad with concentric or approximately concentric polygon g...

Grooved CMP pad

Soft polishing pad for polishing a semiconductor substrate

Polishing pad with foundation layer and polishing surface layer

Polishing pad with grooved foundation layer and polishing surface l...

Polishing pad for eddy current end-point detection

CMP pad with local area transparency

Polishing pad with alignment feature

Polishing pad with alignment aperture

Polishing pad with multi-modal distribution of pore diameters

Homogeneous polishing pad for eddy current end-point detection

Polishing pad for eddy current end-point detection

Method of fabricating a polishing pad with an end-point detection r...

Base-pad for a polishing pad

Patents Applicationslast 30 patents

COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

POLISHING PAD WITH FOUNDATION LAYER AND WINDOW ATTACHED THERETO

LOW DENSITY POLISHING PAD

COATED COMPRESSIVE SUBPAD FOR CHEMICAL MECHANICAL POLISHING

GROOVED CMP PADS

POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...

SOFT POLISHING PAD FOR POLISHING A SEMICONDUCTOR SUBSTRATE

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...

POLISHING PAD WITH ALIGNMENT FEATURE

POLISHING PAD WITH APERTURE

POLISHING PAD WITH HOMOGENEOUS BODY HAVING DISCRETE PROTRUSIONS THE...

LOW DENSITY POLISHING PAD

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS...

POLISHING PAD HAVING POLISHING SURFACE WITH CONTINUOUS PROTRUSIONS

POLISHING PAD WITH MULTI-MODAL DISTRIBUTION OF PORE DIAMETERS

HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION

Polishing Pad for Eddy Current End-Point Detection

POLISHING PAD WITH POLISHING SURFACE LAYER HAVING AN APERTURE OR OP...

POLISHING PAD WITH FOUNDATION LAYER AND POLISHING SURFACE LAYER

POLISHING PAD WITH GROOVED FOUNDATION LAYER AND POLISHING SURFACE L...

POLISHING PAD WITH APERTURE

POLISHING PAD WITH HOMOGENEOUS BODY HAVING DISCRETE PROTRUSIONS THE...

POLISHING PAD WITH ALIGNMENT FEATURE

POLISHING PAD WITH CONCENTRIC OR APPROXIMATELY CONCENTRIC POLYGON G...

POLISHING PAD WITH MULTI-MODAL DISTRIBUTION OF PORE DIAMETERS

POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION

HOMOGENEOUS POLISHING PAD FOR EDDY CURRENT END-POINT DETECTION