Dieter Kraus

Person

Oberkochen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Cleaning module, EUV lithography device and method for the cleaning...
- Patent number 9,046,794
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Detection of contaminating substances in an EUV lithography apparatus
- Patent number 8,953,145
- Issue date Feb 10, 2015
- Carl Zeiss SMT GmbH
- Dieter Kraus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
EUV lithography device and method for processing an optical element
- Patent number 8,885,141
- Issue date Nov 11, 2014
- Carl Zeiss SMT GmbH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for guiding a radiation bundle
- Patent number 8,717,531
- Issue date May 6, 2014
- Carl Zeiss SMT GmbH
- Severin Waldis
- G02 - OPTICS
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,585,224
- Issue date Nov 19, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,382,301
- Issue date Feb 26, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV lithography apparatus and method for determining the contaminat...
- Patent number 8,054,446
- Issue date Nov 8, 2011
- Carl Zeiss SMT GmbH
- Dieter Kraus
- G01 - MEASURING TESTING
Information Patent Grant
Method for cleaning an EUV lithography device, method for measuring...
- Patent number 7,911,598
- Issue date Mar 22, 2011
- Carl Zeiss SMT AG
- Dieter Kraus
- G01 - MEASURING TESTING

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20130148200
- Publication date Jun 13, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM
- Publication number 20120086925
- Publication date Apr 12, 2012
- Carl Zeiss SMT GMBH
- Dieter KRAUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
EUV Lithography Device and Method For Processing An Optical Element
- Publication number 20110279799
- Publication date Nov 17, 2011
- Carl Zeiss SMT GMBH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS
- Publication number 20110211179
- Publication date Sep 1, 2011
- Carl Zeiss SMT GMBH
- Dieter KRAUS
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE
- Publication number 20110058147
- Publication date Mar 10, 2011
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...
- Publication number 20110043774
- Publication date Feb 24, 2011
- Carl Zeiss SMT AG
- Stefan HEMBACHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR FOR GUIDING A RADIATION BUNDLE
- Publication number 20100261120
- Publication date Oct 14, 2010
- Carl Zeiss SMT AG
- Severin Waldis
- G02 - OPTICS
Information Patent Application
APPARATUS AND METHOD FOR MEASURING THE OUTGASSING AND EUV LITHOGRAP...
- Publication number 20100112494
- Publication date May 6, 2010
- Carl Zeiss SMT AG
- Dieter Kraus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE
- Publication number 20100071720
- Publication date Mar 25, 2010
- Carl Zeiss SMT AG
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING THE CONTAMINAT...
- Publication number 20100045948
- Publication date Feb 25, 2010
- Carl Zeiss SMT AG
- Dieter KRAUS
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING...
- Publication number 20100034349
- Publication date Feb 11, 2010
- Carl Zeiss SMT AG
- Dieter KRAUS
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20090231707
- Publication date Sep 17, 2009
- Carl Zeiss SMT AG
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY

Dieter Kraus

Person

Patents Grantslast 30 patents

Cleaning module, EUV lithography device and method for the cleaning...

Detection of contaminating substances in an EUV lithography apparatus

EUV lithography device and method for processing an optical element

Mirror for guiding a radiation bundle

Optical arrangement, in particular projection exposure apparatus fo...

Optical arrangement, in particular projection exposure apparatus fo...

EUV lithography apparatus and method for determining the contaminat...

Method for cleaning an EUV lithography device, method for measuring...

Patents Applicationslast 30 patents

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...

METHOD FOR AVOIDING CONTAMINATION AND EUV-LITHOGRAPHY-SYSTEM

EUV Lithography Device and Method For Processing An Optical Element

DETECTION OF CONTAMINATING SUBSTANCES IN AN EUV LITHOGRAPHY APPARATUS

CLEANING MODULE AND EUV LITHOGRAPHY DEVICE WITH CLEANING MODULE

CLEANING MODULE, EUV LITHOGRAPHY DEVICE AND METHOD FOR THE CLEANING...

MIRROR FOR GUIDING A RADIATION BUNDLE

APPARATUS AND METHOD FOR MEASURING THE OUTGASSING AND EUV LITHOGRAP...

METHOD AND SYSTEM FOR REMOVING CONTAMINANTS FROM A SURFACE

EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETERMINING THE CONTAMINAT...

METHOD FOR CLEANING AN EUV LITHOGRAPHY DEVICE, METHOD FOR MEASURING...

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...