Dinesh N. Khanna

Person

West Warwick, Kent, RI, US

People

Patents Grantslast 30 patents

Information Patent Grant
Composition for stripping photoresist and organic materials from su...
- Patent number 6,368,421
- Issue date Apr 9, 2002
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for synthesizing polymeric AZO dyes
- Patent number 6,346,361
- Issue date Feb 12, 2002
- Clariant Finance (BVI) Limited
- Jianhui Shan
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating for photoresist compositions
- Patent number 6,187,506
- Issue date Feb 13, 2001
- Clariant Finance (BVI) Limited
- Shuji Ding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating material for photoresists
- Patent number 6,106,995
- Issue date Aug 22, 2000
- Clariant Finance (BVI) Limited
- Sunit S. Dixit
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Antireflective coating compositions for photoresist compositions an...
- Patent number 5,994,430
- Issue date Nov 30, 1999
- Clariant Finance BVI) Limited
- Shuji Ding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light absorbing polymers
- Patent number 5,981,145
- Issue date Nov 9, 1999
- Clariant Finance (BVI) Limited
- Shuji Ding
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Fractionation of phenol formaldehyde condensate and photoresist com...
- Patent number 5,976,761
- Issue date Nov 2, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Positive photoresists containing novel photoactive compounds
- Patent number 5,876,897
- Issue date Mar 2, 1999
- Clariant Finance (BVI) Limited
- Dana L. Durham
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Photosensitive quinolone compounds and a process of preparation
- Patent number 5,866,295
- Issue date Feb 2, 1999
- Clariant Finance (BVI) Limited
- Joseph E. Oberlander
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Image formation utilizing photosensitive compositions containing lo...
- Patent number 5,858,627
- Issue date Jan 12, 1999
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinonediazide positive photoresist utilizing mixed solvent consist...
- Patent number 5,853,947
- Issue date Dec 29, 1998
- Clariant Finance (BVI) Limited
- Stanley F. Wanat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Quinone diazide compositions containing low metals p-cresol oligome...
- Patent number 5,837,417
- Issue date Nov 17, 1998
- Clariant Finance (BVI) Limited
- M. Dalil Rahman
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Light sensitive composition containing an arylhydrazo dye
- Patent number 5,763,135
- Issue date Jun 9, 1998
- Clariant Finance (BVI) Limited
- Shuji Ding
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fractionation of phenol formaldehyde condensate and photoresist com...
- Patent number 5,739,265
- Issue date Apr 14, 1998
- Clariant Finance (BVI) Ltd.
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Antireflective coating for photoresist compositions
- Patent number 5,733,714
- Issue date Mar 31, 1998
- Clariant Finance (BVI) Limited
- Iain McCulloch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Fractionation of phenol formaldehyde condensate and photoresist com...
- Patent number 5,693,749
- Issue date Dec 2, 1997
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Aqueous antireflective coatings for photoresist compositions
- Patent number 5,652,297
- Issue date Jul 29, 1997
- Hoechst Celanese Corporation
- Iain McCulloch
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Metal ion reduction in novolak resin using an ion exchange catalyst...
- Patent number 5,521,052
- Issue date May 28, 1996
- Hoechst Celanese Corporation
- M. Dalil Rahman
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Process of making a stable solution of poly(hydroxystyrene) functio...
- Patent number 5,395,871
- Issue date Mar 7, 1995
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Novolak resin mixtures
- Patent number 5,371,169
- Issue date Dec 6, 1994
- Hoechst Celanese Corporation
- Ping H. Lu
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Method for producing positive photoresist image utilizing diazo est...
- Patent number 5,348,842
- Issue date Sep 20, 1994
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Process of making naphthoquinone diazide esters using lactone solvents
- Patent number 5,300,396
- Issue date Apr 5, 1994
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Photosensitizer compositions containing diazo fluorinated esters of...
- Patent number 5,260,162
- Issue date Nov 9, 1993
- Dinesh N. Khanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Polyamide containing the hexafluoroisopropylidene group and process...
- Patent number 5,240,819
- Issue date Aug 31, 1993
- Hoechst Celanese Corporation
- Werner H. Mueller
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Diazo ester of a benzolactone ring compound and positive photoresis...
- Patent number 5,221,592
- Issue date Jun 22, 1993
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Bis-N,N' nitro or amino benzoyl amino phenols
- Patent number 5,130,481
- Issue date Jul 14, 1992
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- C07 - ORGANIC CHEMISTRY
Information Patent Grant
Base developable negative acting photoresists
- Patent number 5,106,720
- Issue date Apr 21, 1992
- Hoechst Celanese Corporation
- Werner H. Mueller
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Crosslinkable polyimides from bis (aminophenoxy) benzonitriles
- Patent number 5,101,005
- Issue date Mar 31, 1992
- Hoechst Celanese Corp.
- Rohitkumar H. Vora
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyamide containing the hexafluoroisopropylidene group
- Patent number 5,077,378
- Issue date Dec 31, 1991
- Hoechst Celanese Corporation
- Werner H. Mueller
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...
Information Patent Grant
Polyamide-polyimide and polybenzoxazole-polyimide polymer
- Patent number 5,071,948
- Issue date Dec 10, 1991
- Hoechst Celanese Corporation
- Dinesh N. Khanna
- C08 - ORGANIC MACROMOLECULAR COMPOUNDS THEIR PREPARATION OR CHEMICAL WORKING-...

Patents Applicationslast 30 patents

Information Patent Application
Method for synthesizing polymeric azo dyes
- Publication number 20020061473
- Publication date May 23, 2002
- Jianhui Shan
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Dinesh N. Khanna

Person

Patents Grantslast 30 patents

Composition for stripping photoresist and organic materials from su...

Method for synthesizing polymeric AZO dyes

Antireflective coating for photoresist compositions

Antireflective coating material for photoresists

Antireflective coating compositions for photoresist compositions an...

Light absorbing polymers

Fractionation of phenol formaldehyde condensate and photoresist com...

Positive photoresists containing novel photoactive compounds

Photosensitive quinolone compounds and a process of preparation

Image formation utilizing photosensitive compositions containing lo...

Quinonediazide positive photoresist utilizing mixed solvent consist...

Quinone diazide compositions containing low metals p-cresol oligome...

Light sensitive composition containing an arylhydrazo dye

Fractionation of phenol formaldehyde condensate and photoresist com...

Antireflective coating for photoresist compositions

Fractionation of phenol formaldehyde condensate and photoresist com...

Aqueous antireflective coatings for photoresist compositions

Metal ion reduction in novolak resin using an ion exchange catalyst...

Process of making a stable solution of poly(hydroxystyrene) functio...

Novolak resin mixtures

Method for producing positive photoresist image utilizing diazo est...

Process of making naphthoquinone diazide esters using lactone solvents

Photosensitizer compositions containing diazo fluorinated esters of...

Polyamide containing the hexafluoroisopropylidene group and process...

Diazo ester of a benzolactone ring compound and positive photoresis...

Bis-N,N' nitro or amino benzoyl amino phenols

Base developable negative acting photoresists

Crosslinkable polyimides from bis (aminophenoxy) benzonitriles

Polyamide containing the hexafluoroisopropylidene group

Polyamide-polyimide and polybenzoxazole-polyimide polymer

Patents Applicationslast 30 patents

Method for synthesizing polymeric azo dyes