Dirk Beyer

Person

Weimar, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for measuring photomasks
- Patent number 11,899,358
- Issue date Feb 13, 2024
- Carl Zeiss SMT GmbH
- Dmitry Simakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Pattern inspection apparatus, pattern position measurement apparatu...
- Patent number 10,572,990
- Issue date Feb 25, 2020
- NuFlare Technology, Inc.
- Shusuke Yoshitake
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
Method and apparatus for correcting errors on a wafer processed by...
- Patent number 10,061,192
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Dirk Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method and apparatus for correcting errors on a wafer processed by...
- Patent number 9,436,080
- Issue date Sep 6, 2016
- Carl Zeiss SMS GmbH
- Dirk Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining the performance of a photolithographic mask
- Patent number 9,431,212
- Issue date Aug 30, 2016
- Carl Zeiss SMS GmbH
- Markus Waiblinger
- G01 - MEASURING TESTING
Information Patent Grant
Method and device for measuring the relative local position error o...
- Patent number 8,731,273
- Issue date May 20, 2014
- Carl Zeiss SMS GmbH
- Michael Arnz
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for reducing the fogging effect
- Patent number 7,435,517
- Issue date Oct 14, 2008
- Vistec Electron Beam GmbH
- Peter Hudek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process for controlling the proximity effect correction
- Patent number 7,241,542
- Issue date Jul 10, 2007
- Leica Microsystems Lithography GmbH
- Peter Hudek
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method and device for exposing a substrate to light
- Patent number 6,600,162
- Issue date Jul 29, 2003
- Leica Microsystems Lithography GmbH
- Peter Hahmann
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR MEASURING PHOTOMASKS
- Publication number 20210255541
- Publication date Aug 19, 2021
- Carl Zeiss SMT GMBH
- Dmitry Simakov
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PATTERN INSPECTION APPARATUS, PATTERN POSITION MEASUREMENT APPARATU...
- Publication number 20180293720
- Publication date Oct 11, 2018
- NuFlare Technology, Inc.
- Shusuke YOSHITAKE
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY...
- Publication number 20160342080
- Publication date Nov 24, 2016
- Carl Zeiss SMT GMBH
- Dirk Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY...
- Publication number 20140036243
- Publication date Feb 6, 2014
- CARL ZEISS SMS LTD.
- Dirk Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING THE PERFORMANCE OF A PHOTOLITHOGRAPHIC MASK
- Publication number 20130126728
- Publication date May 23, 2013
- CARL ZEISS SMS GMBH
- Markus Waiblinger
- G01 - MEASURING TESTING
Information Patent Application
METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY...
- Publication number 20120154773
- Publication date Jun 21, 2012
- Carl Zeiss SMS GmbH
- Dirk Beyer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD AND DEVICE FOR MEASURING THE RELATIVE LOCAL POSITION ERROR O...
- Publication number 20110229010
- Publication date Sep 22, 2011
- CARL ZEISS SMS GMBH
- Michael Arnz
- B82 - NANO-TECHNOLOGY
Information Patent Application
Process for controlling the proximity effect correction
- Publication number 20050287450
- Publication date Dec 29, 2005
- Leica Microsystems Lithography GmbH
- Peter Hudek
- B82 - NANO-TECHNOLOGY
Information Patent Application
Method for reducing the fogging effect
- Publication number 20050287451
- Publication date Dec 29, 2005
- Leica Microsystems Lithography GmbH
- Peter Hudek
- B82 - NANO-TECHNOLOGY

Person

Patents Grantslast 30 patents

Method for measuring photomasks

Pattern inspection apparatus, pattern position measurement apparatu...

Method and apparatus for correcting errors on a wafer processed by...

Method and apparatus for correcting errors on a wafer processed by...

Method for determining the performance of a photolithographic mask

Method and device for measuring the relative local position error o...

Method for reducing the fogging effect

Process for controlling the proximity effect correction

Method and device for exposing a substrate to light

Patents Applicationslast 30 patents

METHOD FOR MEASURING PHOTOMASKS

PATTERN INSPECTION APPARATUS, PATTERN POSITION MEASUREMENT APPARATU...

METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY...

METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY...

METHOD FOR DETERMINING THE PERFORMANCE OF A PHOTOLITHOGRAPHIC MASK

METHOD AND APPARATUS FOR CORRECTING ERRORS ON A WAFER PROCESSED BY...

METHOD AND DEVICE FOR MEASURING THE RELATIVE LOCAL POSITION ERROR O...

Process for controlling the proximity effect correction

Method for reducing the fogging effect