Dirk Heinrich EHM

Person

Beckingen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for avoiding a degradation of an optical element, projection...
- Patent number 12,140,877
- Issue date Nov 12, 2024
- Carl Zeiss SMT GmbH
- Dirk Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing a contamination layer by an atomic layer etchin...
- Patent number 11,199,363
- Issue date Dec 14, 2021
- Carl Zeiss SMT GmbH
- Fred Roozeboom
- F28 - HEAT EXCHANGE IN GENERAL
Information Patent Grant
Optical assembly with a protective element and optical arrangement...
- Patent number 11,022,893
- Issue date Jun 1, 2021
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Projection exposure system for semiconductor lithography, comprisin...
- Patent number 10,712,677
- Issue date Jul 14, 2020
- Carl Zeiss SMT GmbH
- Irene Ament
- B08 - CLEANING
Information Patent Grant
Optical element and optical system for EUV lithography, and method...
- Patent number 10,690,812
- Issue date Jun 23, 2020
- Carl Zeiss SMT GmbH
- Hermanus Hendricus Petrus Theodorus Bekman
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Reflective optical element for EUV lithography
- Patent number 10,649,340
- Issue date May 12, 2020
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Grant
EUV lithography system and operating method
- Patent number 10,073,361
- Issue date Sep 11, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Reflective optical element
- Patent number 10,061,205
- Issue date Aug 28, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Grant
Reflective optical element and optical system for EUV lithography
- Patent number 9,996,005
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for producing a capping layer composed of silicon oxide on a...
- Patent number 9,880,476
- Issue date Jan 30, 2018
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical assembly with suppression of degradation
- Patent number 9,632,436
- Issue date Apr 25, 2017
- Carl Zeiss SMT GmbH
- Stefan-Wolfgang Schmidt
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Arrangement for use in a projection exposure tool for microlithogra...
- Patent number 9,354,529
- Issue date May 31, 2016
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G01 - MEASURING TESTING
Information Patent Grant
Method for correcting the surface form of a mirror
- Patent number 9,341,756
- Issue date May 17, 2016
- Carl Zeiss SMT GmbH
- Juergen Mueller
- B82 - NANO-TECHNOLOGY
Information Patent Grant
EUV lithography apparatus and method for detecting particles in an...
- Patent number 9,298,109
- Issue date Mar 29, 2016
- Carl Zeiss SMT GmbH
- Vera Butscher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Surface correction on coated mirrors
- Patent number 9,249,501
- Issue date Feb 2, 2016
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
EUV mirror comprising an oxynitride capping layer having a stable c...
- Patent number 9,229,331
- Issue date Jan 5, 2016
- Carl Zeiss SMT GmbH
- Gisela von Blanckenhagen
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Cleaning module, EUV lithography device and method for the cleaning...
- Patent number 9,046,794
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Stefan Hembacher
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement, in particular in a projection exposure apparat...
- Patent number 9,041,905
- Issue date May 26, 2015
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for removing a contamination layer from an optical surface a...
- Patent number 8,980,009
- Issue date Mar 17, 2015
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Grant
Detection of contaminating substances in an EUV lithography apparatus
- Patent number 8,953,145
- Issue date Feb 10, 2015
- Carl Zeiss SMT GmbH
- Dieter Kraus
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Lithographic apparatus comprising an internal sensor and a mini-rea...
- Patent number 8,928,855
- Issue date Jan 6, 2015
- ASML Netherlands B.V.
- Johannes Hubertus Josephina Moors
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Grant
EUV lithography device and method for processing an optical element
- Patent number 8,885,141
- Issue date Nov 11, 2014
- Carl Zeiss SMT GmbH
- Wolfgang Singer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror for guiding a radiation bundle
- Patent number 8,717,531
- Issue date May 6, 2014
- Carl Zeiss SMT GmbH
- Severin Waldis
- G02 - OPTICS
Information Patent Grant
Protection module for EUV lithography apparatus, and EUV lithograph...
- Patent number 8,698,999
- Issue date Apr 15, 2014
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,585,224
- Issue date Nov 19, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Optical element with at least one electrically conductive region, a...
- Patent number 8,553,200
- Issue date Oct 8, 2013
- Carl Zeiss SMT GmbH
- Bastiaan Theodoor Wolschrijn
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system for EUV lithography with a charged-particle source
- Patent number 8,546,776
- Issue date Oct 1, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Particle cleaning of optical elements for microlithography
- Patent number 8,477,285
- Issue date Jul 2, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Grant
Method for removing a contamination layer from an optical surface a...
- Patent number 8,419,862
- Issue date Apr 16, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Grant
Optical arrangement, in particular projection exposure apparatus fo...
- Patent number 8,382,301
- Issue date Feb 26, 2013
- Carl Zeiss SMT GmbH
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY

Patents Applicationslast 30 patents

Information Patent Application
MULTI-MIRROR ARRAY
- Publication number 20240248408
- Publication date Jul 25, 2024
- Carl Zeiss SMT GMBH
- Moritz Becker
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROCESS FOR DEPOSITION OF AN OUTER LAYER, REFLECTIVE OPTICAL ELEMEN...
- Publication number 20240111216
- Publication date Apr 4, 2024
- Carl Zeiss SMT GMBH
- Dirk EHM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RESIDUAL GAS ANALYSER, AND EUV LITHOGRAPHY SYSTEM HAVING A RESIDUAL...
- Publication number 20230162967
- Publication date May 25, 2023
- Carl Zeiss SMT GMBH
- Achim SCHOELL
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MOD...
- Publication number 20230072843
- Publication date Mar 9, 2023
- Carl Zeiss SMT GMBH
- Dirk Heinrich Ehm
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...
- Publication number 20230041588
- Publication date Feb 9, 2023
- Carl Zeiss SMT GMBH
- Moritz BECKER
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
PROJECTION EXPOSURE APPARATUS HAVING A DEVICE FOR DETERMINING THE C...
- Publication number 20220308457
- Publication date Sep 29, 2022
- Carl Zeiss SMT GMBH
- Dirk EHM
- G01 - MEASURING TESTING
Information Patent Application
METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL ELEMENT, PROJECTION...
- Publication number 20220308463
- Publication date Sep 29, 2022
- Carl Zeiss SMT GMBH
- Dirk EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CHARACTERISING AT LEAST ONE OPTICAL COMPONENT OF A PROJE...
- Publication number 20200218160
- Publication date Jul 9, 2020
- Carl Zeiss SMT GMBH
- Wilbert KRUITHOF
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING A CONTAMINATION LAYER BY AN ATOMIC LAYER ETCHIN...
- Publication number 20200142327
- Publication date May 7, 2020
- Carl Zeiss SMT GMBH
- Fred ROOZEBOOM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...
- Publication number 20190243258
- Publication date Aug 8, 2019
- Carl Zeiss SMT GMBH
- Irene AMENT
- B08 - CLEANING
Information Patent Application
REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY
- Publication number 20190171108
- Publication date Jun 6, 2019
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT...
- Publication number 20180246413
- Publication date Aug 30, 2018
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
EUV Lithography System And Operating Method
- Publication number 20170212433
- Publication date Jul 27, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT
- Publication number 20170160639
- Publication date Jun 8, 2017
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS
Information Patent Application
METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR
- Publication number 20160299268
- Publication date Oct 13, 2016
- Carl Zeiss SMT GMBH
- Juergen MUELLER
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...
- Publication number 20160187543
- Publication date Jun 30, 2016
- Carl Zeiss SMT GMBH
- Hermanus Hendricus Petrus Theodorus BEKMAN
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
EUV MIRROR COMPRISING AN OXYNITRIDE CAPPING LAYER HAVING A STABLE C...
- Publication number 20140211179
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Gisela von BLANCKENHAGEN
- B82 - NANO-TECHNOLOGY
Information Patent Application
METHOD FOR PRODUCING A CAPPING LAYER COMPOSED OF SILICON OXIDE ON A...
- Publication number 20140211178
- Publication date Jul 31, 2014
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY
- Publication number 20140199543
- Publication date Jul 17, 2014
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION
- Publication number 20140176921
- Publication date Jun 26, 2014
- Carl Zeiss SMT GMBH
- Stefan-Wolfgang SCHMIDT
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR
- Publication number 20140078481
- Publication date Mar 20, 2014
- Carl Zeiss SMT GMBH
- Juergen MUELLER
- B82 - NANO-TECHNOLOGY
Information Patent Application
EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETECTING PARTICLES IN AN...
- Publication number 20140028989
- Publication date Jan 30, 2014
- Vera BUTSCHER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...
- Publication number 20130186430
- Publication date Jul 25, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B08 - CLEANING
Information Patent Application
PROJECTION EXPOSURE APPARATUS
- Publication number 20130176545
- Publication date Jul 11, 2013
- Carl Zeiss SMT GMBH
- Dirk Heinrich Ehm
- H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...
- Publication number 20130148200
- Publication date Jun 13, 2013
- ASML NETHERLANDS B.V.
- Dirk Heinrich Ehm
- B82 - NANO-TECHNOLOGY
Information Patent Application
OPTICAL SYSTEM FOR EUV LITHOGRAPHY WITH A CHARGED-PARTICLE SOURCE
- Publication number 20130099132
- Publication date Apr 25, 2013
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G21 - NUCLEAR PHYSICS NUCLEAR ENGINEERING
Information Patent Application
ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRA...
- Publication number 20130077064
- Publication date Mar 28, 2013
- Dirk Heinrich Ehm
- G02 - OPTICS
Information Patent Application
SURFACE CORRECTION ON COATED MIRRORS
- Publication number 20120300184
- Publication date Nov 29, 2012
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20120281196
- Publication date Nov 8, 2012
- Carl Zeiss SMT GMBH
- Ulrich Loering
- G02 - OPTICS
Information Patent Application
REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRA...
- Publication number 20120250144
- Publication date Oct 4, 2012
- Carl Zeiss SMT GMBH
- Dirk Heinrich EHM
- G02 - OPTICS

Dirk Heinrich EHM

Person

Patents Grantslast 30 patents

Method for avoiding a degradation of an optical element, projection...

Method for removing a contamination layer by an atomic layer etchin...

Optical assembly with a protective element and optical arrangement...

Projection exposure system for semiconductor lithography, comprisin...

Optical element and optical system for EUV lithography, and method...

Reflective optical element for EUV lithography

EUV lithography system and operating method

Reflective optical element

Reflective optical element and optical system for EUV lithography

Method for producing a capping layer composed of silicon oxide on a...

Optical assembly with suppression of degradation

Arrangement for use in a projection exposure tool for microlithogra...

Method for correcting the surface form of a mirror

EUV lithography apparatus and method for detecting particles in an...

Surface correction on coated mirrors

EUV mirror comprising an oxynitride capping layer having a stable c...

Cleaning module, EUV lithography device and method for the cleaning...

Optical arrangement, in particular in a projection exposure apparat...

Method for removing a contamination layer from an optical surface a...

Detection of contaminating substances in an EUV lithography apparatus

Lithographic apparatus comprising an internal sensor and a mini-rea...

EUV lithography device and method for processing an optical element

Mirror for guiding a radiation bundle

Protection module for EUV lithography apparatus, and EUV lithograph...

Optical arrangement, in particular projection exposure apparatus fo...

Optical element with at least one electrically conductive region, a...

Optical system for EUV lithography with a charged-particle source

Particle cleaning of optical elements for microlithography

Method for removing a contamination layer from an optical surface a...

Optical arrangement, in particular projection exposure apparatus fo...

Patents Applicationslast 30 patents

MULTI-MIRROR ARRAY

PROCESS FOR DEPOSITION OF AN OUTER LAYER, REFLECTIVE OPTICAL ELEMEN...

RESIDUAL GAS ANALYSER, AND EUV LITHOGRAPHY SYSTEM HAVING A RESIDUAL...

METHOD FOR MAINTAINING A PROJECTION EXPOSURE APPARATUS, SERVICE MOD...

METHOD FOR OPERATING AN EUV LITHOGRAPHTY APPARATUS, AND EUV LITHOGR...

PROJECTION EXPOSURE APPARATUS HAVING A DEVICE FOR DETERMINING THE C...

METHOD FOR AVOIDING A DEGRADATION OF AN OPTICAL ELEMENT, PROJECTION...

METHOD FOR CHARACTERISING AT LEAST ONE OPTICAL COMPONENT OF A PROJE...

METHOD FOR REMOVING A CONTAMINATION LAYER BY AN ATOMIC LAYER ETCHIN...

PROJECTION EXPOSURE SYSTEM FOR SEMICONDUCTOR LITHOGRAPHY, COMPRISIN...

REFLECTIVE OPTICAL ELEMENT FOR EUV LITHOGRAPHY

OPTICAL ASSEMBLY WITH A PROTECTIVE ELEMENT AND OPTICAL ARRANGEMENT...

EUV Lithography System And Operating Method

REFLECTIVE OPTICAL ELEMENT

METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR

OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY, AND METHOD...

EUV MIRROR COMPRISING AN OXYNITRIDE CAPPING LAYER HAVING A STABLE C...

METHOD FOR PRODUCING A CAPPING LAYER COMPOSED OF SILICON OXIDE ON A...

REFLECTIVE OPTICAL ELEMENT AND OPTICAL SYSTEM FOR EUV LITHOGRAPHY

OPTICAL ASSEMBLY WITH SUPPRESSION OF DEGRADATION

METHOD FOR CORRECTING THE SURFACE FORM OF A MIRROR

EUV LITHOGRAPHY APPARATUS AND METHOD FOR DETECTING PARTICLES IN AN...

METHOD FOR REMOVING A CONTAMINATION LAYER FROM AN OPTICAL SURFACE A...

PROJECTION EXPOSURE APPARATUS

OPTICAL ARRANGEMENT, IN PARTICULAR PROJECTION EXPOSURE APPARATUS FO...

OPTICAL SYSTEM FOR EUV LITHOGRAPHY WITH A CHARGED-PARTICLE SOURCE

ARRANGEMENT FOR USE IN A PROJECTION EXPOSURE TOOL FOR MICROLITHOGRA...

SURFACE CORRECTION ON COATED MIRRORS

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...

REFLECTIVE OPTICAL ELEMENT AND METHOD FOR OPERATING AN EUV LITHOGRA...