Dirk HELLWEG

Person

Aalen, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Method for the qualification of a mask for microlithography
- Patent number 11,460,785
- Issue date Oct 4, 2022
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic mask, method for determining edge positions of th...
- Patent number 11,256,178
- Issue date Feb 22, 2022
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a structure-independent contribution of a li...
- Patent number 11,061,331
- Issue date Jul 13, 2021
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Metrology system having an EUV optical unit
- Patent number 10,948,637
- Issue date Mar 16, 2021
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G01 - MEASURING TESTING
Information Patent Grant
Method for examining photolithographic masks and mask metrology app...
- Patent number 10,775,691
- Issue date Sep 15, 2020
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Microlithographic mask, method for determining edge positions of th...
- Patent number 10,761,420
- Issue date Sep 1, 2020
- Carl Zeiss SMT GmbH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining a focus position of a lithography mask and m...
- Patent number 10,564,551
- Issue date Feb 18, 2020
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for determining an imaging aberration contribution of an ima...
- Patent number 10,481,505
- Issue date Nov 19, 2019
- Carl Zeiss SMT GmbH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring an angularly resolved intensity distribution a...
- Patent number 9,915,871
- Issue date Mar 13, 2018
- Carl Zeiss SMT GmbH
- Wolfgang Emer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical system of a microlithographic projection exposure apparatus...
- Patent number 9,785,052
- Issue date Oct 10, 2017
- Carl Zeiss SMT GmbH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for measuring an angularly resolved intensity distribution a...
- Patent number 9,081,294
- Issue date Jul 14, 2015
- Carl Zeiss SMT GmbH
- Wolfgang Emer
- G01 - MEASURING TESTING
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,659,745
- Issue date Feb 25, 2014
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Optical system with an exchangeable, manipulable correction arrange...
- Patent number 8,542,346
- Issue date Sep 24, 2013
- Carl Zeiss SMT GmbH
- Guido Limbach
- G02 - OPTICS
Information Patent Grant
Optical correction device
- Patent number 8,325,322
- Issue date Dec 4, 2012
- Carl Zeiss SMT GmbH
- Markus Hauf
- G02 - OPTICS

Patents Applicationslast 30 patents

Information Patent Application
METHOD FOR HEATING AN OPTICAL ELEMENT IN A MICROLITHO-GRAPHIC PROJE...
- Publication number 20230350312
- Publication date Nov 2, 2023
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...
- Publication number 20220236648
- Publication date Jul 28, 2022
- Carl Zeiss SMT GMBH
- Renzo Capelli
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR APPROXIMATING IMAGING PROPERTIES OF AN OPTICAL PRODUCTIO...
- Publication number 20220057709
- Publication date Feb 24, 2022
- Carl Zeiss SMT GMBH
- Markus Koch
- G06 - COMPUTING CALCULATING COUNTING
Information Patent Application
MICROLITHOGRAPHIC MASK, METHOD FOR DETERMINING EDGE POSITIONS OF TH...
- Publication number 20200393751
- Publication date Dec 17, 2020
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR THE QUALIFICATION OF A MASK FOR MICROLITHOGRAPHY
- Publication number 20200285158
- Publication date Sep 10, 2020
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING AN IMAGING ABERRATION CONTRIBUTION OF AN IMA...
- Publication number 20190258170
- Publication date Aug 22, 2019
- Carl Zeiss SMT GMBH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A STRUCTURE-INDEPENDENT CONTRIBUTION OF A LI...
- Publication number 20190258176
- Publication date Aug 22, 2019
- Carl Zeiss SMT GMBH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR DETERMINING A FOCUS POSITION OF A LITHOGRAPHY MASK AND M...
- Publication number 20190258180
- Publication date Aug 22, 2019
- Carl Zeiss SMT GMBH
- Markus Koch
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MICROLITHOGRAPHIC MASK, METHOD FOR DETERMINING EDGE POSITIONS OF TH...
- Publication number 20190129320
- Publication date May 2, 2019
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR EXAMINING PHOTOLITHOGRAPHIC MASKS AND MASK METROLOGY APP...
- Publication number 20190079381
- Publication date Mar 14, 2019
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METROLOGY SYSTEM HAVING AN EUV OPTICAL UNIT
- Publication number 20190011615
- Publication date Jan 10, 2019
- Carl Zeiss SMT GMBH
- Dirk Hellweg
- G02 - OPTICS
Information Patent Application
METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION A...
- Publication number 20180299787
- Publication date Oct 18, 2018
- Carl Zeiss SMT GMBH
- Wolfgang EMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION A...
- Publication number 20160011520
- Publication date Jan 14, 2016
- Carl Zeiss SMT GMBH
- Wolfgang EMER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION A...
- Publication number 20140009764
- Publication date Jan 9, 2014
- Wolfgang EMER
- G01 - MEASURING TESTING
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20130278911
- Publication date Oct 24, 2013
- Guido Limbach
- G02 - OPTICS
Information Patent Application
Optical System of a Microlithographic Projection Exposure Apparatus...
- Publication number 20130188160
- Publication date Jul 25, 2013
- Carl Zeiss SMT GMBH
- Johannes Ruoff
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL CORRECTION DEVICE
- Publication number 20100201958
- Publication date Aug 12, 2010
- Carl Zeiss SMT AG
- Markus Hauf
- G02 - OPTICS
Information Patent Application
OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...
- Publication number 20090244509
- Publication date Oct 1, 2009
- Carl Zeiss SMT AG
- Guido Limbach
- G02 - OPTICS
Information Patent Application
PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...
- Publication number 20080316455
- Publication date Dec 25, 2008
- Carl Zeiss SMT AG
- Dirk Hellweg
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Dirk HELLWEG

Person

Patents Grantslast 30 patents

Method for the qualification of a mask for microlithography

Microlithographic mask, method for determining edge positions of th...

Method for determining a structure-independent contribution of a li...

Metrology system having an EUV optical unit

Method for examining photolithographic masks and mask metrology app...

Microlithographic mask, method for determining edge positions of th...

Method for determining a focus position of a lithography mask and m...

Method for determining an imaging aberration contribution of an ima...

Method for measuring an angularly resolved intensity distribution a...

Optical system of a microlithographic projection exposure apparatus...

Method for measuring an angularly resolved intensity distribution a...

Optical system with an exchangeable, manipulable correction arrange...

Optical system with an exchangeable, manipulable correction arrange...

Optical correction device

Patents Applicationslast 30 patents

METHOD FOR HEATING AN OPTICAL ELEMENT IN A MICROLITHO-GRAPHIC PROJE...

METHOD FOR MEASURING A REFLECTIVITY OF AN OBJECT FOR MEASUREMENT LI...

METHOD FOR APPROXIMATING IMAGING PROPERTIES OF AN OPTICAL PRODUCTIO...

MICROLITHOGRAPHIC MASK, METHOD FOR DETERMINING EDGE POSITIONS OF TH...

METHOD FOR THE QUALIFICATION OF A MASK FOR MICROLITHOGRAPHY

METHOD FOR DETERMINING AN IMAGING ABERRATION CONTRIBUTION OF AN IMA...

METHOD FOR DETERMINING A STRUCTURE-INDEPENDENT CONTRIBUTION OF A LI...

METHOD FOR DETERMINING A FOCUS POSITION OF A LITHOGRAPHY MASK AND M...

MICROLITHOGRAPHIC MASK, METHOD FOR DETERMINING EDGE POSITIONS OF TH...

METHOD FOR EXAMINING PHOTOLITHOGRAPHIC MASKS AND MASK METROLOGY APP...

METROLOGY SYSTEM HAVING AN EUV OPTICAL UNIT

METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION A...

METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION A...

METHOD FOR MEASURING AN ANGULARLY RESOLVED INTENSITY DISTRIBUTION A...

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

Optical System of a Microlithographic Projection Exposure Apparatus...

OPTICAL CORRECTION DEVICE

OPTICAL SYSTEM WITH AN EXCHANGEABLE, MANIPULABLE CORRECTION ARRANGE...

PROJECTION OBJECTIVE OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APP...