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Dirk Rohde
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Berlin, DE
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Patents Grants
last 30 patents
Information
Patent Grant
Acidic aqueous composition for electrolytic copper plating
Patent number
12,071,702
Issue date
Aug 27, 2024
Atotech Deutschland GmbH
Kun Si
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Bath and method for filling a vertical interconnect access or trenc...
Patent number
11,091,849
Issue date
Aug 17, 2021
Atotech Deutschland GmbH
Josef Gaida
C07 - ORGANIC CHEMISTRY
Information
Patent Grant
Acidic aqueous composition for electrolytic copper plating
Patent number
11,035,051
Issue date
Jun 15, 2021
Atotech Deutschland GmbH
Kun Si
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Aqueous indium or indium alloy plating bath and process for deposit...
Patent number
10,793,962
Issue date
Oct 6, 2020
Atotech Deutschland GmbH
Jan Sperling
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Process for indium or indium alloy deposition and article
Patent number
10,753,007
Issue date
Aug 25, 2020
Atotech Deutschland GmbH
Grigory Vazhenin
C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information
Patent Grant
Copper plating bath composition and method for deposition of copper
Patent number
10,633,755
Issue date
Apr 28, 2020
Atotech Deutschland GmbH
Dirk Rohde
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Electrolytic copper plating bath compositions and a method for thei...
Patent number
10,538,850
Issue date
Jan 21, 2020
Atotech Deutschland GmbH
Heiko Brunner
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Copper plating bath composition
Patent number
9,551,080
Issue date
Jan 24, 2017
Atotech Deutschland GmbH
Heiko Brunner
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Method for copper plating
Patent number
9,506,158
Issue date
Nov 29, 2016
Atotech Deutschland GmbH
Dirk Rohde
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Grant
Aqueous, acid bath and method for the electrolytic deposition of co...
Patent number
8,679,316
Issue date
Mar 25, 2014
Atotech Deutschland GmbH
Heiko Brunner
H05 - ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
Patents Applications
last 30 patents
Information
Patent Application
ACIDIC AQUEOUS COMPOSITION FOR ELECTROLYTIC COPPER PLATING
Publication number
20210262105
Publication date
Aug 26, 2021
Atotech Deutschland GmbH
Kun SI
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
AQUEOUS INDIUM OR INDIUM ALLOY PLATING BATH AND PROCESS FOR DEPOSIT...
Publication number
20200392637
Publication date
Dec 17, 2020
Atotech Deutschland GmbH
Jan SPERLING
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
A BATH AND METHOD FOR FILLING A VERTICAL INTERCONNECT ACCESS OR TRE...
Publication number
20200199766
Publication date
Jun 25, 2020
Atotech Deutschland GmbH
Josef GAIDA
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
ACIDIC AQUEOUS COMPOSITION FOR ELECTROLYTIC COPPER PLATING
Publication number
20190203369
Publication date
Jul 4, 2019
Atotech Deutschland GmbH
Kun SI
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
AQUEOUS INDIUM OR INDIUM ALLOY PLATING BATH AND PROCESS FOR DEPOSIT...
Publication number
20180355500
Publication date
Dec 13, 2018
Atotech Deutschland GmbH
Jan SPERLING
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
PROCESS FOR INDIUM OR INDIUM ALLOY DEPOSITION AND ARTICLE
Publication number
20180298511
Publication date
Oct 18, 2018
Atotech Deutschland GmbH
Grigory VAZHENIN
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
COPPER PLATING BATH COMPOSITION AND METHOD FOR DEPOSITION OF COPPER
Publication number
20180237932
Publication date
Aug 23, 2018
Atotech Deutschland GmbH
Dirk ROHDE
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
ELECTROLYTIC COPPER PLATING BATH COMPOSITIONS AND A METHOD FOR THEI...
Publication number
20180112320
Publication date
Apr 26, 2018
Atotech Deutschland GmbH
Heiko BRUNNER
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
COPPER PLATING BATH COMPOSITION
Publication number
20150299883
Publication date
Oct 22, 2015
Atotech Deutschland GmbH
Heiko BRUNNER
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
METHOD FOR COPPER PLATING
Publication number
20140102910
Publication date
Apr 17, 2014
Atotech Deutschland GmbH
Dirk Rohde
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information
Patent Application
Aqueous, Acid Bath and Method for the Electrolytic Deposition of Co...
Publication number
20110011746
Publication date
Jan 20, 2011
Atotech Deutschland GmbH
Heiko Brunner
C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR