Dirk Schaffer

Person

Jena, DE

People

Patents Grantslast 30 patents

Information Patent Grant
Optical element for the beam guidance of imaging light in projectio...
- Patent number 11,029,606
- Issue date Jun 8, 2021
- Carl Zeiss SMT GmbH
- Jens Prochnau
- G02 - OPTICS
Information Patent Grant
Mounting arrangement for an optical imaging arrangement
- Patent number 10,520,838
- Issue date Dec 31, 2019
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element module with minimized parasitic loads
- Patent number 10,215,948
- Issue date Feb 26, 2019
- Carl Zeiss SMT GmbH
- Jens Kugler
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Optical element unit for exposure processes
- Patent number 10,203,607
- Issue date Feb 12, 2019
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G02 - OPTICS
Information Patent Grant
Moveably mounted component of projection exposure system, as well a...
- Patent number 10,095,126
- Issue date Oct 9, 2018
- Carl Zeiss SMT GmbH
- Jens Prochnau
- G02 - OPTICS
Information Patent Grant
Optical arrangement of a microlithographic projection exposure appa...
- Patent number 10,007,186
- Issue date Jun 26, 2018
- Carl Zeiss SMT GmbH
- Jens Prochnau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror module, in particular for a microlithographic projection exp...
- Patent number 9,996,015
- Issue date Jun 12, 2018
- Carl Zeiss SMT GmbH
- Jens Prochnau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Mirror arrangement for a lithography apparatus and method for produ...
- Patent number 9,869,937
- Issue date Jan 16, 2018
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Grant
Lithography apparatus and method for producing a mirror arrangement
- Patent number 9,459,538
- Issue date Oct 4, 2016
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Grant
Optical arrangement in a microlithographic projection exposure appa...
- Patent number 9,250,417
- Issue date Feb 2, 2016
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Grant
Optical element unit and method of supporting an optical element
- Patent number 9,134,501
- Issue date Sep 15, 2015
- Carl Zeiss SMT GmbH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Grant
Optical element unit for exposure processes having sealing element
- Patent number 9,046,795
- Issue date Jun 2, 2015
- Carl Zeiss SMT GmbH
- Tilman Schwertner
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Method for bonding bodies and composite body
- Patent number 8,927,090
- Issue date Jan 6, 2015
- Carl Zeiss SMT GmbH
- Hin Yiu Anthony Chung
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Grant
Optical element for UV or EUV lithography with coatings having opti...
- Patent number 8,848,167
- Issue date Sep 30, 2014
- Carl Zeiss SMT GmbH
- Johannes Lippert
- G02 - OPTICS
Information Patent Grant
Device for the low-deformation replaceable mounting of an optical e...
- Patent number 8,582,081
- Issue date Nov 12, 2013
- Carl Zeiss SMT GmbH
- Franz Sorg
- G02 - OPTICS
Information Patent Grant
Optical element module with minimized parasitic loads
- Patent number 8,351,139
- Issue date Jan 8, 2013
- Carl Zeiss SMT GmbH
- Jens Kugler
- G02 - OPTICS
Information Patent Grant
Device for the low-deformation replaceable mounting of an optical e...
- Patent number 7,471,469
- Issue date Dec 30, 2008
- Carl Zeiss SMT AG
- Franz Sorg
- G02 - OPTICS
Information Patent Grant
Low-deformation support device of an optical element
- Patent number 7,085,080
- Issue date Aug 1, 2006
- Carl Zeiss SMT AG
- Dirk Schaffer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Patents Applicationslast 30 patents

Information Patent Application
OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS
- Publication number 20230221646
- Publication date Jul 13, 2023
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT FOR THE BEAM GUIDANCE OF IMAGING LIGHT IN PROJECTIO...
- Publication number 20200150544
- Publication date May 14, 2020
- Carl Zeiss SMT GMBH
- Jens Prochnau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MOUNTING ARRANGEMENT FOR AN OPTICAL IMAGING ARRANGEMENT
- Publication number 20190086823
- Publication date Mar 21, 2019
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
MOVEABLY MOUNTED COMPONENT OF PROJECTION EXPOSURE SYSTEM, AS WELL A...
- Publication number 20170357164
- Publication date Dec 14, 2017
- Carl Zeiss SMT GMBH
- Jens Prochnau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
OPTICAL ARRANGEMENT OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20170192360
- Publication date Jul 6, 2017
- Carl Zeiss SMT GMBH
- Jens Prochnau
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
MIRROR MODULE, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXP...
- Publication number 20170153552
- Publication date Jun 1, 2017
- Carl Zeiss SMT GMBH
- Jens Prochnau
- G02 - OPTICS
Information Patent Application
Optical Element Unit And Method Of Supporting An Optical Element
- Publication number 20160109679
- Publication date Apr 21, 2016
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
MIRROR ARRANGEMENT FOR A LITHOGRAPHY APPARATUS AND METHOD FOR PRODU...
- Publication number 20150168844
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- B23 - MACHINE TOOLS METAL-WORKING NOT OTHERWISE PROVIDED FOR
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20150168846
- Publication date Jun 18, 2015
- Carl Zeiss SMT GMBH
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT
- Publication number 20150055112
- Publication date Feb 26, 2015
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL E...
- Publication number 20140063628
- Publication date Mar 6, 2014
- Carl Zeiss SMT GMBH
- Franz Sorg
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT MODULE WITH MINIMIZED PARASITIC LOADS
- Publication number 20130100547
- Publication date Apr 25, 2013
- CARL ZEISS SMT GMBH
- Jens Kugler
- G02 - OPTICS
Information Patent Application
OPTICAL ARRANGEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...
- Publication number 20120300183
- Publication date Nov 29, 2012
- Carl Zeiss SMT GMBH
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
METHOD FOR BONDING BODIES AND COMPOSITE BODY
- Publication number 20120082823
- Publication date Apr 5, 2012
- Carl Zeiss SMT GMBH
- Hin Yiu Anthony CHUNG
- B29 - WORKING OF PLASTICS WORKING OF SUBSTANCES IN A PLASTIC STATE, IN GENERAL
Information Patent Application
OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY
- Publication number 20120044473
- Publication date Feb 23, 2012
- Carl Zeiss SMT GMBH
- Johannes LIPPERT
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT MODULE WITH MINIMIZED PARASITIC LOADS
- Publication number 20100214675
- Publication date Aug 26, 2010
- Carl Zeiss SMT AG
- Jens Kugler
- G02 - OPTICS
Information Patent Application
Optical element unit and method of supporting an optical element
- Publication number 20090147229
- Publication date Jun 11, 2009
- Carl Zeiss SMT AG
- Dirk Schaffer
- G02 - OPTICS
Information Patent Application
DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL E...
- Publication number 20090122288
- Publication date May 14, 2009
- Carl Zeiss SMT AG
- Franz Sorg
- G02 - OPTICS
Information Patent Application
OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES
- Publication number 20080225247
- Publication date Sep 18, 2008
- Carl Zeiss SMT AG
- Tilman Schwertner
- G02 - OPTICS
Information Patent Application
Device for the low-deformation replaceable mounting of an optical e...
- Publication number 20060158749
- Publication date Jul 20, 2006
- Franz Sorg
- G02 - OPTICS
Information Patent Application
Low-deformation support device of an optical element
- Publication number 20050128607
- Publication date Jun 16, 2005
- Dirk Schaffer
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY

Dirk Schaffer

Person

Patents Grantslast 30 patents

Optical element for the beam guidance of imaging light in projectio...

Mounting arrangement for an optical imaging arrangement

Optical element module with minimized parasitic loads

Optical element unit for exposure processes

Moveably mounted component of projection exposure system, as well a...

Optical arrangement of a microlithographic projection exposure appa...

Mirror module, in particular for a microlithographic projection exp...

Mirror arrangement for a lithography apparatus and method for produ...

Lithography apparatus and method for producing a mirror arrangement

Optical arrangement in a microlithographic projection exposure appa...

Optical element unit and method of supporting an optical element

Optical element unit for exposure processes having sealing element

Method for bonding bodies and composite body

Optical element for UV or EUV lithography with coatings having opti...

Device for the low-deformation replaceable mounting of an optical e...

Optical element module with minimized parasitic loads

Device for the low-deformation replaceable mounting of an optical e...

Low-deformation support device of an optical element

Patents Applicationslast 30 patents

OPTICAL SYSTEM AND LITHOGRAPHY APPARATUS

OPTICAL ELEMENT FOR THE BEAM GUIDANCE OF IMAGING LIGHT IN PROJECTIO...

MOUNTING ARRANGEMENT FOR AN OPTICAL IMAGING ARRANGEMENT

MOVEABLY MOUNTED COMPONENT OF PROJECTION EXPOSURE SYSTEM, AS WELL A...

OPTICAL ARRANGEMENT OF A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

MIRROR MODULE, IN PARTICULAR FOR A MICROLITHOGRAPHIC PROJECTION EXP...

Optical Element Unit And Method Of Supporting An Optical Element

MIRROR ARRANGEMENT FOR A LITHOGRAPHY APPARATUS AND METHOD FOR PRODU...

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

LITHOGRAPHY APPARATUS AND METHOD FOR PRODUCING A MIRROR ARRANGEMENT

DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL E...

OPTICAL ELEMENT MODULE WITH MINIMIZED PARASITIC LOADS

OPTICAL ARRANGEMENT IN A MICROLITHOGRAPHIC PROJECTION EXPOSURE APPA...

METHOD FOR BONDING BODIES AND COMPOSITE BODY

OPTICAL ELEMENT FOR UV OR EUV LITHOGRAPHY

OPTICAL ELEMENT MODULE WITH MINIMIZED PARASITIC LOADS

Optical element unit and method of supporting an optical element

DEVICE FOR THE LOW-DEFORMATION REPLACEABLE MOUNTING OF AN OPTICAL E...

OPTICAL ELEMENT UNIT FOR EXPOSURE PROCESSES

Device for the low-deformation replaceable mounting of an optical e...

Low-deformation support device of an optical element