Dmitry A. DZILNO

Person

Sunnyvale, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Magnetically coupled RF filter for substrate processing chambers
- Patent number 12,198,908
- Issue date Jan 14, 2025
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Bipolar esc with balanced RF impedance
- Patent number 12,094,748
- Issue date Sep 17, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Real time bias detection and correction for electrostatic chuck
- Patent number 12,080,584
- Issue date Sep 3, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Bipolar electrostatic chuck to limit DC discharge
- Patent number 12,057,339
- Issue date Aug 6, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-pressure bipolar electrostatic chucking
- Patent number 12,040,210
- Issue date Jul 16, 2024
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,956,883
- Issue date Apr 9, 2024
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Paired dynamic parallel plate capacitively coupled plasmas
- Patent number 11,923,172
- Issue date Mar 5, 2024
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
High temperature bipolar electrostatic chuck
- Patent number 11,901,209
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Microwave plasma source for spatial plasma enhanced atomic layer de...
- Patent number 11,823,871
- Issue date Nov 21, 2023
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Power supply signal conditioning for an electrostatic chuck
- Patent number 11,776,835
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma source with ceramic electrode plate
- Patent number 11,776,793
- Issue date Oct 3, 2023
- Applied Materials, Inc.
- Robert B. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Vertically adjustable plasma source
- Patent number 11,705,312
- Issue date Jul 18, 2023
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power source operation in plasma enhanced processes
- Patent number 11,631,583
- Issue date Apr 18, 2023
- Applied Materials, Inc.
- Farhad Moghadam
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
RF power delivery architecture with switchable match and frequency...
- Patent number 11,626,853
- Issue date Apr 11, 2023
- Applied Materials, Inc.
- Edward P. Hammond
- G05 - CONTROLLING REGULATING
Information Patent Grant
Real time bias detection and correction for electrostatic chuck
- Patent number 11,594,440
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
High temperature bipolar electrostatic chuck
- Patent number 11,587,817
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for controlling RF parameters at multiple fre...
- Patent number 11,570,879
- Issue date Jan 31, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position and temperature monitoring of ALD platen susceptor
- Patent number 11,430,680
- Issue date Aug 30, 2022
- Applied Materials, Inc.
- Abraham Ravid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped electrodes for improved plasma exposure from vertical plasma...
- Patent number 11,315,763
- Issue date Apr 26, 2022
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Paired dynamic parallel plate capacitively coupled plasmas
- Patent number 11,282,676
- Issue date Mar 22, 2022
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Substrate transfer structure
- Patent number D938373
- Issue date Dec 14, 2021
- Applied Materials, Inc.
- Jason M. Schaller
- D13 - Equipment for production, distribution, or transformation of energy
Information Patent Grant
Phased array modular high-frequency source
- Patent number 11,114,282
- Issue date Sep 7, 2021
- Applied Materials, Inc.
- Philip Allan Kraus
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Geometrically selective deposition of dielectric films utilizing lo...
- Patent number 11,081,318
- Issue date Aug 3, 2021
- Applied Materials, Inc.
- Kenichi Ohno
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Spatial atomic layer deposition chamber with plasma pulsing to prev...
- Patent number 10,854,428
- Issue date Dec 1, 2020
- Applied Materials, Inc.
- Tsutomu Tanaka
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Shaped electrodes for improved plasma exposure from vertical plasma...
- Patent number 10,763,085
- Issue date Sep 1, 2020
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Phased array modular high-frequency source
- Patent number 10,720,311
- Issue date Jul 21, 2020
- Applied Materials, Inc.
- Philip Allan Kraus
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Grant
Phased array modular high-frequency source
- Patent number 10,504,699
- Issue date Dec 10, 2019
- Applied Materials, Inc.
- Philip Allan Kraus
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Position and temperature monitoring of ALD platen susceptor
- Patent number 10,312,120
- Issue date Jun 4, 2019
- Applied Materials, Inc.
- Abraham Ravid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Fast and continuous eddy-current metrology of a conductive film
- Patent number 10,234,261
- Issue date Mar 19, 2019
- Applied Materials, Inc.
- Edward W. Budiarto
- C25 - ELECTROLYTIC OR ELECTROPHORETIC PROCESSES APPARATUS THEREFOR
Information Patent Grant
Temperature control apparatus including groove-routed optical fiber...
- Patent number 9,986,598
- Issue date May 29, 2018
- Applied Materials, Inc.
- Matthew Busche
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE
- Publication number 20250014934
- Publication date Jan 9, 2025
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS
- Publication number 20240249924
- Publication date Jul 25, 2024
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20230307213
- Publication date Sep 28, 2023
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
REAL TIME BIAS DETECTION AND CORRECTION FOR ELECTROSTATIC CHUCK
- Publication number 20230207372
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK
- Publication number 20230207371
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Methods and Apparatus for Controlling RF Parameters at Multiple Fre...
- Publication number 20230131809
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR ESC WITH BALANCED RF IMPEDANCE
- Publication number 20230054444
- Publication date Feb 23, 2023
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MAGNETICALLY COUPLED RF FILTER FOR SUBSTRATE PROCESSING CHAMBERS
- Publication number 20220364233
- Publication date Nov 17, 2022
- Applied Materials, Inc.
- Edward P. Hammond
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
RF POWER DELIVERY ARCHITECTURE WITH SWITCHABLE MATCH AND FREQUENCY...
- Publication number 20220255525
- Publication date Aug 11, 2022
- Applied Materials, Inc.
- Edward P. HAMMOND
- G05 - CONTROLLING REGULATING
Information Patent Application
MULTI-ZONE HEATER CONTROL FOR WAFER PROCESSING EQUIPMENT
- Publication number 20220248500
- Publication date Aug 4, 2022
- Applied Materials, Inc.
- Uwe P. Haller
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
VERTICALLY ADJUSTABLE PLASMA SOURCE
- Publication number 20220208531
- Publication date Jun 30, 2022
- Applied Materials, Inc.
- Tsutomu Tanaka
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PAIRED DYNAMIC PARALLEL PLATE CAPACITIVELY COUPLED PLASMAS
- Publication number 20220165540
- Publication date May 26, 2022
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Plasma Source With Ceramic Electrode Plate
- Publication number 20220157569
- Publication date May 19, 2022
- Applied Materials, Inc.
- Robert B. Moore
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE
- Publication number 20220130704
- Publication date Apr 28, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK
- Publication number 20220122875
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-PRESSURE BIPOLAR ELECTROSTATIC CHUCKING
- Publication number 20220122873
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jian Li
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
REAL TIME BIAS DETECTION AND CORRECTION FOR ELECTROSTATIC CHUCK
- Publication number 20220122874
- Publication date Apr 21, 2022
- Applied Materials, Inc.
- Jian Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK
- Publication number 20220102179
- Publication date Mar 31, 2022
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PLASMA SOURCE WITH FLOATING ELECTRODES
- Publication number 20220084796
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Quoc Truong
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210327686
- Publication date Oct 21, 2021
- Applied Materials, Inc.
- Xiaopu Li
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
RF Power Source Operation In Plasma Enhanced Processes
- Publication number 20210125820
- Publication date Apr 29, 2021
- Applied Materials, Inc.
- Farhad Moghadam
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Methods and Apparatus for Controlling RF Parameters at Multiple Fre...
- Publication number 20210059037
- Publication date Feb 25, 2021
- Applied Materials, Inc.
- Zheng John Ye
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...
- Publication number 20210050187
- Publication date Feb 18, 2021
- Applied Materials, Inc.
- Jozef Kudela
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...
- Publication number 20200395194
- Publication date Dec 17, 2020
- Applied Materials, Inc.
- Kallol Bera
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASED ARRAY MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20200303167
- Publication date Sep 24, 2020
- Applied Materials, Inc.
- PHILIP ALLAN KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PHASED ARRAY MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20200066490
- Publication date Feb 27, 2020
- Applied Materials, Inc.
- PHILIP ALLAN KRAUS
- H03 - BASIC ELECTRONIC CIRCUITRY
Information Patent Application
Paired Dynamic Parallel Plate Capacitively Coupled Plasmas
- Publication number 20190385819
- Publication date Dec 19, 2019
- Applied Materials, Inc.
- Hari Ponnekanti
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
PHASED ARRAY MODULAR HIGH-FREQUENCY SOURCE
- Publication number 20190326096
- Publication date Oct 24, 2019
- Applied Materials, Inc.
- PHILIP ALLAN KRAUS
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
Microwave Plasma Source With Split Window
- Publication number 20190311886
- Publication date Oct 10, 2019
- Applied Materials, Inc.
- Siva Chandrasekar
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
Position And Temperature Monitoring Of ALD Platen Susceptor
- Publication number 20190244842
- Publication date Aug 8, 2019
- Applied Materials, Inc.
- Abraham Ravid
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...

Dmitry A. DZILNO

Person

Patents Grantslast 30 patents

Magnetically coupled RF filter for substrate processing chambers

Bipolar esc with balanced RF impedance

Real time bias detection and correction for electrostatic chuck

Bipolar electrostatic chuck to limit DC discharge

Multi-pressure bipolar electrostatic chucking

Methods and apparatus for controlling RF parameters at multiple fre...

Paired dynamic parallel plate capacitively coupled plasmas

High temperature bipolar electrostatic chuck

Microwave plasma source for spatial plasma enhanced atomic layer de...

Power supply signal conditioning for an electrostatic chuck

Plasma source with ceramic electrode plate

Vertically adjustable plasma source

RF power source operation in plasma enhanced processes

RF power delivery architecture with switchable match and frequency...

Real time bias detection and correction for electrostatic chuck

High temperature bipolar electrostatic chuck

Methods and apparatus for controlling RF parameters at multiple fre...

Position and temperature monitoring of ALD platen susceptor

Shaped electrodes for improved plasma exposure from vertical plasma...

Paired dynamic parallel plate capacitively coupled plasmas

Substrate transfer structure

Phased array modular high-frequency source

Geometrically selective deposition of dielectric films utilizing lo...

Spatial atomic layer deposition chamber with plasma pulsing to prev...

Shaped electrodes for improved plasma exposure from vertical plasma...

Phased array modular high-frequency source

Phased array modular high-frequency source

Position and temperature monitoring of ALD platen susceptor

Fast and continuous eddy-current metrology of a conductive film

Temperature control apparatus including groove-routed optical fiber...

Patents Applicationslast 30 patents

BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE

BIPOLAR ELECTROSTATIC CHUCK ELECTRODE DESIGNS

VERTICALLY ADJUSTABLE PLASMA SOURCE

REAL TIME BIAS DETECTION AND CORRECTION FOR ELECTROSTATIC CHUCK

HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK

Methods and Apparatus for Controlling RF Parameters at Multiple Fre...

BIPOLAR ESC WITH BALANCED RF IMPEDANCE

MAGNETICALLY COUPLED RF FILTER FOR SUBSTRATE PROCESSING CHAMBERS

RF POWER DELIVERY ARCHITECTURE WITH SWITCHABLE MATCH AND FREQUENCY...

MULTI-ZONE HEATER CONTROL FOR WAFER PROCESSING EQUIPMENT

VERTICALLY ADJUSTABLE PLASMA SOURCE

PAIRED DYNAMIC PARALLEL PLATE CAPACITIVELY COUPLED PLASMAS

Plasma Source With Ceramic Electrode Plate

BIPOLAR ELECTROSTATIC CHUCK TO LIMIT DC DISCHARGE

HIGH TEMPERATURE BIPOLAR ELECTROSTATIC CHUCK

MULTI-PRESSURE BIPOLAR ELECTROSTATIC CHUCKING

REAL TIME BIAS DETECTION AND CORRECTION FOR ELECTROSTATIC CHUCK

POWER SUPPLY SIGNAL CONDITIONING FOR AN ELECTROSTATIC CHUCK

PLASMA SOURCE WITH FLOATING ELECTRODES

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

RF Power Source Operation In Plasma Enhanced Processes

Methods and Apparatus for Controlling RF Parameters at Multiple Fre...

Microwave Plasma Source For Spatial Plasma Enhanced Atomic Layer De...

Shaped Electrodes For Improved Plasma Exposure From Vertical Plasma...

PHASED ARRAY MODULAR HIGH-FREQUENCY SOURCE

PHASED ARRAY MODULAR HIGH-FREQUENCY SOURCE

Paired Dynamic Parallel Plate Capacitively Coupled Plasmas

PHASED ARRAY MODULAR HIGH-FREQUENCY SOURCE

Microwave Plasma Source With Split Window

Position And Temperature Monitoring Of ALD Platen Susceptor