DMITRY LUBOMIRSKY

Person

Cupertino, CA, US

People

Patents Grantslast 30 patents

Information Patent Grant
Flow control features of CVD chambers
- Patent number 12,146,219
- Issue date Nov 19, 2024
- Applied Materials, Inc.
- Kien N. Chuc
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Ion extraction assembly having variable electrode thickness for bea...
- Patent number 12,125,680
- Issue date Oct 22, 2024
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Rotating biasable pedestal and electrostatic chuck in semiconductor...
- Patent number 12,112,972
- Issue date Oct 8, 2024
- Applied Materials, Inc.
- Qiwei Liang
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 12,009,228
- Issue date Jun 11, 2024
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Cylindrical cavity with impedance shifting by irises in a power-sup...
- Patent number 11,972,930
- Issue date Apr 30, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus for post exposure bake of photoresist
- Patent number 11,934,103
- Issue date Mar 19, 2024
- Applied Materials, Inc.
- Douglas A Buchberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Two piece electrode assembly with gap for plasma control
- Patent number 11,915,911
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Multi-zone semiconductor substrate supports
- Patent number 11,915,950
- Issue date Feb 27, 2024
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for symmetrical hollow cathode electrode and...
- Patent number 11,901,161
- Issue date Feb 13, 2024
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,834,744
- Issue date Dec 5, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Apparatus for post exposure bake of photoresist
- Patent number 11,815,816
- Issue date Nov 14, 2023
- Applied Materials, Inc.
- Douglas A Buchberger
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Grant
Systems and methods for improved semiconductor etching and componen...
- Patent number 11,735,441
- Issue date Aug 22, 2023
- Applied Materials, Inc.
- Tien Fak Tan
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for cyclic and selective material removal and etching
- Patent number 11,728,139
- Issue date Aug 15, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber
- Patent number 11,715,625
- Issue date Aug 1, 2023
- Applied Materials, Inc.
- Greg Toland
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and systems to enhance process uniformity
- Patent number 11,637,002
- Issue date Apr 25, 2023
- Applied Materials, Inc.
- Saravjeet Singh
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Apparatus and methods for verification and re-use of process fluids
- Patent number 11,609,505
- Issue date Mar 21, 2023
- Applied Materials, Inc.
- Mangesh Ashok Bangar
- G01 - MEASURING TESTING
Information Patent Grant
Low temperature chuck for plasma processing systems
- Patent number 11,594,428
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Ceramic showerheads with conductive electrodes
- Patent number 11,591,693
- Issue date Feb 28, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Chemistry compatible coating material for advanced device on-wafer...
- Patent number 11,587,771
- Issue date Feb 21, 2023
- Applied Materials, Inc.
- Jennifer Y. Sun
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Corrosion resistant ground shield of processing chamber
- Patent number 11,562,890
- Issue date Jan 24, 2023
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Semiconductor chamber coatings and processes
- Patent number 11,557,464
- Issue date Jan 17, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Multi-zone heater model-based control in semiconductor manufacturing
- Patent number 11,533,783
- Issue date Dec 20, 2022
- Applied Materials, Inc.
- Mauro Cimino
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma etching systems and methods with secondary plasma injection
- Patent number 11,476,093
- Issue date Oct 18, 2022
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Process chamber for etching low k and other dielectric films
- Patent number 11,410,860
- Issue date Aug 9, 2022
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for symmetrical hollow cathode electrode and...
- Patent number 11,373,845
- Issue date Jun 28, 2022
- Applied Materials, Inc.
- Tae Seung Cho
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for processing a substrate
- Patent number 11,361,941
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Junghoon Kim
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Semiconductor processing chamber for multiple precursor flow
- Patent number 11,361,939
- Issue date Jun 14, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Grant
Methods and apparatus for dynamical control of radial uniformity in...
- Patent number 11,355,317
- Issue date Jun 7, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Methods and apparatus for dynamical control of radial uniformity wi...
- Patent number 11,348,783
- Issue date May 31, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Plasma processing system workpiece carrier with thermally isolated...
- Patent number 11,322,337
- Issue date May 3, 2022
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS

Patents Applicationslast 30 patents

Information Patent Application
ION EXTRACTION OPTICS HAVING NON UNIFORM GRID ASSEMBLY
- Publication number 20240412956
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Costel BILOIU
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...
- Publication number 20240412957
- Publication date Dec 12, 2024
- Applied Materials, Inc.
- Gautam PISHARODY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
DEPOSITION OR ETCH CHAMBER WITH COMPLETE SYMMETRY AND HIGH TEMPERAT...
- Publication number 20240290638
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
TWO LEVEL VACUUM WAFER TRANSFER SYSTEM WITH ROBOTS ON EACH LEVEL
- Publication number 20240290644
- Publication date Aug 29, 2024
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
BIASABLE ELECTROSTATIC CHUCK
- Publication number 20240234108
- Publication date Jul 11, 2024
- Applied Materials, Inc.
- Paneendra Prakash Bhat
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20240222084
- Publication date Jul 4, 2024
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS
- Publication number 20240160117
- Publication date May 16, 2024
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
VACUUM BAKE FOR EUV LITHOGRAPHY
- Publication number 20240085810
- Publication date Mar 14, 2024
- Applied Materials, Inc.
- Huixiong DAI
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS
- Publication number 20230223281
- Publication date Jul 13, 2023
- Applied Materials, Inc.
- Toan Q. Tran
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES
- Publication number 20230203657
- Publication date Jun 29, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING
- Publication number 20230161260
- Publication date May 25, 2023
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...
- Publication number 20230125435
- Publication date Apr 27, 2023
- Applied Materials, Inc.
- Alexandre Likhanskii
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER
- Publication number 20230122695
- Publication date Apr 20, 2023
- Applied Materials, Inc.
- Dmitry Lubomirsky
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES
- Publication number 20230116437
- Publication date Apr 13, 2023
- Applied Materials, Inc.
- Laksheswar Kalita
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METAL OXIDE RESIST PATTERNING WITH ELECTRICAL FIELD GUIDED POST-EXP...
- Publication number 20220390847
- Publication date Dec 8, 2022
- Applied Materials, Inc.
- Huixiong DAI
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
CHAMBER AND METHODS OF TREATING A SUBSTRATE AFTER EXPOSURE TO RADIA...
- Publication number 20220350251
- Publication date Nov 3, 2022
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
SYSTEM ARCHITECTURE OF MANUFACTURING OF SEMICONDUCTOR WAFERS
- Publication number 20220326618
- Publication date Oct 13, 2022
- Applied Materials, Inc.
- Dmitry LUBOMIRSKY
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS
- Publication number 20220317579
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Mangesh Ashok BANGAR
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
ROTATING BIASABLE PEDESTAL AND ELECTROSTATIC CHUCK IN SEMICONDUCTOR...
- Publication number 20220319896
- Publication date Oct 6, 2022
- Applied Materials, Inc.
- Qiwei LIANG
- C23 - COATING METALLIC MATERIAL COATING MATERIAL WITH METALLIC MATERIAL CHEMI...
Information Patent Application
METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...
- Publication number 20220293396
- Publication date Sep 15, 2022
- Applied Materials, Inc.
- Tae Seung CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220269179
- Publication date Aug 25, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220269180
- Publication date Aug 25, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220260917
- Publication date Aug 18, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- G03 - PHOTOGRAPHY CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY
Information Patent Application
APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST
- Publication number 20220199414
- Publication date Jun 23, 2022
- Applied Materials, Inc.
- Douglas A. BUCHBERGER
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS
- Publication number 20220148894
- Publication date May 12, 2022
- Applied Materials, Inc.
- Mehmet Tugrul Samir
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...
- Publication number 20220093364
- Publication date Mar 24, 2022
- Applied Materials, Inc.
- Satoru Kobayashi
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
HIGH CONDUCTANCE PROCESS KIT
- Publication number 20220084845
- Publication date Mar 17, 2022
- Applied Materials, Inc.
- Samartha Subramanya
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE
- Publication number 20210398778
- Publication date Dec 23, 2021
- Applied Materials, Inc.
- Junghoon KIM
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...
- Publication number 20210384011
- Publication date Dec 9, 2021
- Applied Materials, Inc.
- Tae Seung CHO
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Application
CONDITIONED SEMICONDUCTOR SYSTEM PARTS
- Publication number 20210343509
- Publication date Nov 4, 2021
- Applied Materials, Inc.
- Dmitry Lubomirsky
- H01 - BASIC ELECTRIC ELEMENTS

DMITRY LUBOMIRSKY

Person

Patents Grantslast 30 patents

Flow control features of CVD chambers

Ion extraction assembly having variable electrode thickness for bea...

Rotating biasable pedestal and electrostatic chuck in semiconductor...

Low temperature chuck for plasma processing systems

Cylindrical cavity with impedance shifting by irises in a power-sup...

Apparatus for post exposure bake of photoresist

Two piece electrode assembly with gap for plasma control

Multi-zone semiconductor substrate supports

Methods and apparatus for symmetrical hollow cathode electrode and...

Ceramic showerheads with conductive electrodes

Apparatus for post exposure bake of photoresist

Systems and methods for improved semiconductor etching and componen...

Process chamber for cyclic and selective material removal and etching

Semiconductor processing chamber

Methods and systems to enhance process uniformity

Apparatus and methods for verification and re-use of process fluids

Low temperature chuck for plasma processing systems

Ceramic showerheads with conductive electrodes

Chemistry compatible coating material for advanced device on-wafer...

Corrosion resistant ground shield of processing chamber

Semiconductor chamber coatings and processes

Multi-zone heater model-based control in semiconductor manufacturing

Plasma etching systems and methods with secondary plasma injection

Process chamber for etching low k and other dielectric films

Methods and apparatus for symmetrical hollow cathode electrode and...

Methods and apparatus for processing a substrate

Semiconductor processing chamber for multiple precursor flow

Methods and apparatus for dynamical control of radial uniformity in...

Methods and apparatus for dynamical control of radial uniformity wi...

Plasma processing system workpiece carrier with thermally isolated...

Patents Applicationslast 30 patents

ION EXTRACTION OPTICS HAVING NON UNIFORM GRID ASSEMBLY

HIGH TEMPERATURE BIASABLE HEATER WITH ADVANCED FAR EDGE ELECTRODE,...

DEPOSITION OR ETCH CHAMBER WITH COMPLETE SYMMETRY AND HIGH TEMPERAT...

TWO LEVEL VACUUM WAFER TRANSFER SYSTEM WITH ROBOTS ON EACH LEVEL

BIASABLE ELECTROSTATIC CHUCK

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

PROCESS CELL FOR FILED GUIDED POST EXPOSURE BAKE PROCESS

VACUUM BAKE FOR EUV LITHOGRAPHY

LOW TEMPERATURE CHUCK FOR PLASMA PROCESSING SYSTEMS

CERAMIC SHOWERHEADS WITH CONDUCTIVE ELECTRODES

CHAMBER AND METHODS OF COOLING A SUBSTRATE AFTER BAKING

ION EXTRACTION ASSEMBLY HAVING VARIABLE ELECTRODE THICKNESS FOR BEA...

CORROSION RESISTANT GROUND SHIELD OF PROCESSING CHAMBER

SEMICONDUCTOR CHAMBER COATINGS AND PROCESSES

METAL OXIDE RESIST PATTERNING WITH ELECTRICAL FIELD GUIDED POST-EXP...

CHAMBER AND METHODS OF TREATING A SUBSTRATE AFTER EXPOSURE TO RADIA...

SYSTEM ARCHITECTURE OF MANUFACTURING OF SEMICONDUCTOR WAFERS

APPARATUS AND METHODS FOR VERIFICATION AND RE-USE OF PROCESS FLUIDS

ROTATING BIASABLE PEDESTAL AND ELECTROSTATIC CHUCK IN SEMICONDUCTOR...

METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

APPARATUS FOR POST EXPOSURE BAKE OF PHOTORESIST

MULTI-ZONE SEMICONDUCTOR SUBSTRATE SUPPORTS

CYLINDRICAL CAVITY WITH IMPEDANCE SHIFTING BY IRISES IN A POWER-SUP...

HIGH CONDUCTANCE PROCESS KIT

METHODS AND APPARATUS FOR PROCESSING A SUBSTRATE

METHODS AND APPARATUS FOR SYMMETRICAL HOLLOW CATHODE ELECTRODE AND...

CONDITIONED SEMICONDUCTOR SYSTEM PARTS