Doerthe Groteloh

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Regeusburg, DE

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Patents Grantslast 30 patents

Information Patent Grant
Method for forming of a silicon oxide layer on a topography
- Patent number 5,780,103
- Issue date Jul 14, 1998
- Siemens Aktiengesellschaft
- Dirk Toebben
- H01 - BASIC ELECTRIC ELEMENTS