Don D. Eisenhour

Person

Grayslake, IL, US

People

Patents Grantslast 30 patents

Information Patent Grant
Chemical-mechanical polishing (CMP) slurry and method of planarizin...
- Patent number 7,267,784
- Issue date Sep 11, 2007
- AMCOL International Corporation
- Mingming Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method chemical-mechanical polishing and planarizing corundum, GaAs...
- Patent number 7,223,156
- Issue date May 29, 2007
- AMCOL International Corporation
- Mingming Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Chemical-mechanical polishing (CMP) slurry containing clay and CeO2...
- Patent number 7,112,123
- Issue date Sep 26, 2006
- AMCOL International Corporation
- Mingming Fang
- C03 - GLASS MINERAL OR SLAG WOOL
Information Patent Grant
Chemical-mechanical polishing (CMP) slurry and method of planarizin...
- Patent number 7,087,529
- Issue date Aug 8, 2006
- AMCOL International Corporation
- Mingming Fang
- H01 - BASIC ELECTRIC ELEMENTS
Information Patent Grant
Method of determining the composition of clay deposit
- Patent number 6,235,533
- Issue date May 22, 2001
- AMCOL International Corporation
- Semeon J. Tsipursky
- G01 - MEASURING TESTING
Information Patent Grant
Process for purifying clay by the hydrothermal conversion of silica...
- Patent number 6,090,734
- Issue date Jul 18, 2000
- AMCOL International Corporation
- Semeon J. Tsipursky
- C01 - INORGANIC CHEMISTRY
Information Patent Grant
Method of manufacturing polymer-grade clay for use in nanocomposites
- Patent number 6,050,509
- Issue date Apr 18, 2000
- AMCOL International Corporation
- Mark Clarey
- C01 - INORGANIC CHEMISTRY

Patents Applicationslast 30 patents

Information Patent Application
Chemical-mechanical polishing (CMP) slurry containing clay and CeO2...
- Publication number 20070011952
- Publication date Jan 18, 2007
- AMCOL INTERNATIONAL
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing (CMP) slurry and method of planarizin...
- Publication number 20060226125
- Publication date Oct 12, 2006
- AMCOL INTERNATIONAL CORPORATION
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing (CMP) slurry containing clay and CeO2...
- Publication number 20050277367
- Publication date Dec 15, 2005
- AMCOL INTERNATIONAL CORPORATION
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Method chemical-mechanical polishing and planarizing corundum, GaAs...
- Publication number 20050233680
- Publication date Oct 20, 2005
- AMCOL INTERNATIONAL CORPORATION
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing (CMP) slurry and method of planarizin...
- Publication number 20050072054
- Publication date Apr 7, 2005
- AMCOL INTERNATIONAL CORPORATION, a Delaware corporation
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...
Information Patent Application
Chemical-mechanical polishing (CMP) slurry and method of planarizin...
- Publication number 20050074975
- Publication date Apr 7, 2005
- AMERICAN COLLOID COMPANY
- Mingming Fang
- C09 - DYES PAINTS POLISHES NATURAL RESINS ADHESIVES MISCELLANEOUS COMPOSITION...

Don D. Eisenhour

Person

Patents Grantslast 30 patents

Chemical-mechanical polishing (CMP) slurry and method of planarizin...

Method chemical-mechanical polishing and planarizing corundum, GaAs...

Chemical-mechanical polishing (CMP) slurry containing clay and CeO2...

Chemical-mechanical polishing (CMP) slurry and method of planarizin...

Method of determining the composition of clay deposit

Process for purifying clay by the hydrothermal conversion of silica...

Method of manufacturing polymer-grade clay for use in nanocomposites

Patents Applicationslast 30 patents

Chemical-mechanical polishing (CMP) slurry containing clay and CeO2...

Chemical-mechanical polishing (CMP) slurry and method of planarizin...

Chemical-mechanical polishing (CMP) slurry containing clay and CeO2...

Method chemical-mechanical polishing and planarizing corundum, GaAs...

Chemical-mechanical polishing (CMP) slurry and method of planarizin...

Chemical-mechanical polishing (CMP) slurry and method of planarizin...